G. Sauvé

724 total citations
15 papers, 573 citations indexed

About

G. Sauvé is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Aerospace Engineering. According to data from OpenAlex, G. Sauvé has authored 15 papers receiving a total of 573 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 7 papers in Atomic and Molecular Physics, and Optics and 5 papers in Aerospace Engineering. Recurrent topics in G. Sauvé's work include Plasma Diagnostics and Applications (13 papers), Copper Interconnects and Reliability (5 papers) and Particle accelerators and beam dynamics (5 papers). G. Sauvé is often cited by papers focused on Plasma Diagnostics and Applications (13 papers), Copper Interconnects and Reliability (5 papers) and Particle accelerators and beam dynamics (5 papers). G. Sauvé collaborates with scholars based in Canada, United States and Poland. G. Sauvé's co-authors include Michel Moisan, Z. Zakrzewski, Jan Hubert, J. Paraszczak, M. Moisan, J. Heidenreich, C. Barbeau, J. Margot, V. Glaude and M. R. Wertheimer and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and IEEE Transactions on Antennas and Propagation.

In The Last Decade

G. Sauvé

15 papers receiving 528 citations

Peers

G. Sauvé
Comparison fields: 5 of 39
  • Electrical and Electronic Engineering 486
  • Atomic and Molecular Physics, and Optics 225
  • Radiology, Nuclear Medicine and Imaging 216
  • Aerospace Engineering 122
  • Mechanics of Materials 121
M. Moisan Canada
Hiroharu Fujita Japan
P. Leprince France
M. Šı́cha Czechia
Toshiki Nakano Japan
Sumio Ashida Japan
C. Boisse-Laporte France
R. Boswell Australia
Mark A. Sobolewski United States
S. J. Whitehair United States
M. Moisan Canada View profile →
Citations per field, relative to G. Sauvé
G. Sauvé · 1×
Citations per year, relative to G. Sauvé
G. Sauvé · 1×

Countries citing papers authored by G. Sauvé

Since Specialization
Citations

This map shows the geographic impact of G. Sauvé's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by G. Sauvé with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites G. Sauvé more than expected).

Fields of papers citing papers by G. Sauvé

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by G. Sauvé. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by G. Sauvé. The network helps show where G. Sauvé may publish in the future.

Co-authorship network of co-authors of G. Sauvé

This figure shows the co-authorship network connecting the top 25 collaborators of G. Sauvé. A scholar is included among the top collaborators of G. Sauvé based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with G. Sauvé. G. Sauvé is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

15 of 15 papers shown
# Title Journal Authors Indexed citations
1 Sustaining long linear uniform plasmas with microwaves using a leaky-wave (troughguide) field applicator IEEE Transactions on Antennas and Propagation G. Sauvé, M. Moisan et al. 10
2 Large Diameter Plasma Generation Using a Waveguide-Based Field Applicator at 2.45 GHz Journal of Microwave Power and Electromagnetic Energy M. Moisan, Z. Zakrzewski et al. 23
3 An atmospheric pressure waveguide-fed microwave plasma torch: the TIA design Plasma Sources Science and Technology Michel Moisan, G. Sauvé et al. 167
4 Slotted Waveguide Field Applicator for the Generation of Long Uniform Plasmas Journal of Microwave Power and Electromagnetic Energy G. Sauvé, M. Moisan et al. 22
5 Influence of the frequency of a periodic biasing voltage upon the etching of polymers Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena M. Moisan, G. Sauvé et al. 2
6 Spatial distributions of electron density and electric field in discharges sustained within microwave circuits Plasma Sources Science and Technology Z. Zakrzewski, Michel Moisan et al. 5
7 Radio frequency or microwave plasma reactors? Factors determining the optimum frequency of operation Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Michel Moisan, C. Barbeau et al. 135
8 Tube diameter and wave frequency limitations when using the electro magnetic surface wave in the m=1 (dipolar) mode to sustain a plasma column Journal of Applied Physics Michel Moisan, Mohamed Chaker et al. 71
9 Using surface wave produced plasmas to determine the frequency effect upon etching of polyimide in RF and microwave sustained plasmas Microelectronic Engineering G. Sauvé, Michel Moisan et al. 2
10 Electron energy distributions in oxygen microwave plasmas Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena J. Heidenreich, J. Paraszczak et al. 19
11 Phase sensitive methods to determine the wavelength of electromagnetic waves in lossy nonuniform media: The case of surface waves along plasma columns Radio Science Michel Moisan, Z. Zakrzewski et al. 28
12 Production of metastable and resonant atoms in rare-gas (He, Ne, Ar) radio-frequency and microwave-sustained discharges Canadian Journal of Physics A. Ricard, C. Barbeau et al. 29
13 Influence of the applied field frequency (27–2450 MHz) in high-frequency sustained plasmas used to etch polyimide Applied Physics Letters G. Sauvé, Michel Moisan et al. 17
14 Electrostatic probe analysis of microwave plasmas used for polymer etching Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena J. Heidenreich, J. Paraszczak et al. 25
15 Ion energy and anisotropy in microwave plasma etching of polymers Microelectronic Engineering J. Heidenreich, J. Paraszczak et al. 18

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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