V. Ku

645 total citations
7 papers, 181 citations indexed

About

V. Ku is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, V. Ku has authored 7 papers receiving a total of 181 indexed citations (citations by other indexed papers that have themselves been cited), including 7 papers in Electrical and Electronic Engineering, 4 papers in Atomic and Molecular Physics, and Optics and 2 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in V. Ku's work include Semiconductor materials and devices (4 papers), Plasma Diagnostics and Applications (4 papers) and Dust and Plasma Wave Phenomena (3 papers). V. Ku is often cited by papers focused on Semiconductor materials and devices (4 papers), Plasma Diagnostics and Applications (4 papers) and Dust and Plasma Wave Phenomena (3 papers). V. Ku collaborates with scholars based in United Kingdom, United States and Germany. V. Ku's co-authors include B. M. Annaratone, J. E. Allen, D. Lea, N. Rovedo, Terence B. Hook, V. Chan, E. Nowak, R. Rengarajan, Padraic Shafer and Jia Chen and has published in prestigious journals such as Journal of Applied Physics, ECS Transactions and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

In The Last Decade

V. Ku

7 papers receiving 163 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
V. Ku United Kingdom	5	177	60	27	26	24	7	181
F.M. Lehr United States	6	64 0.4×	42 0.7×	27 1.0×	9 0.3×	5 0.2×	13	108
Seth Pree United States	5	36 0.2×	25 0.4×	13 0.5×	10 0.4×	17 0.7×	14	83
R. Korzekwa United States	8	149 0.8×	38 0.6×	19 0.7×	6 0.2×	75 3.1×	20	196
C. Lambropoulos Greece	9	145 0.8×	40 0.7×	2 0.1×	48 1.8×	23 1.0×	30	180
J. Alessi United States	6	78 0.4×	24 0.4×	8 0.3×	23 0.9×	9 0.4×	33	107
R. Pasquinelli United States	7	127 0.7×	52 0.9×	8 0.3×	52 2.0×	3 0.1×	44	159
S. Choroba Germany	7	94 0.5×	43 0.7×	3 0.1×	30 1.2×	8 0.3×	32	108
V. Spassov Bulgaria	6	35 0.2×	31 0.5×	16 0.6×	5 0.2×	6 0.3×	21	80
M. Mapes United States	6	60 0.3×	21 0.3×	18 0.7×	21 0.8×	2 0.1×	23	100
C. Hill Switzerland	7	60 0.3×	37 0.6×	15 0.6×	18 0.7×	3 0.1×	30	98

Countries citing papers authored by V. Ku

Since Specialization

Citations

This map shows the geographic impact of V. Ku's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by V. Ku with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites V. Ku more than expected).

Fields of papers citing papers by V. Ku

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by V. Ku. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by V. Ku. The network helps show where V. Ku may publish in the future.

Co-authorship network of co-authors of V. Ku

This figure shows the co-authorship network connecting the top 25 collaborators of V. Ku. A scholar is included among the top collaborators of V. Ku based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with V. Ku. V. Ku is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

7 of 7 papers shown

1.

Lee, Bongmook, et al.. (2008). Investigation of VT Shift Mechanism of High-K Dielectrics caused by Lanthanum Capping for NMOS and Tantalum Capping for PMOS Devices. ECS Transactions. 13(1). 123–130. 1 indexed citations

2.

Ahmed, Khaled, G. Conti, Steven Hung, et al.. (2008). Enabling Effective Work Function Tuning by RF-PVD Metal Oxide on High-k Gate Dielectric. ECS Transactions. 13(1). 143–150. 2 indexed citations

3.

Chan, V., R. Rengarajan, N. Rovedo, et al.. (2004). High speed 45nm gate length CMOSFETs integrated into a 90nm bulk technology incorporating strain engineering. 3.8.1–3.8.4. 58 indexed citations

4.

Ku, V., et al.. (1999). Study of the SiO2-to-Si3N4 etch selectivity mechanism in the presence of polymers in fluorocarbon plasmas. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(5). 2306–2310. 5 indexed citations

5.

Ku, V., B. M. Annaratone, & J. E. Allen. (1998). Plasma-sheath resonances and energy absorption phenomena in capacitively coupled radio frequency plasmas. Part I. Journal of Applied Physics. 84(12). 6536–6545. 45 indexed citations

6.

Ku, V., B. M. Annaratone, & J. E. Allen. (1998). Plasma-sheath resonances and energy absorption phenomena in capacitively coupled radio frequency plasmas. Part II. The Herlofson paradox. Journal of Applied Physics. 84(12). 6546–6551. 19 indexed citations

7.

Annaratone, B. M., V. Ku, & J. E. Allen. (1995). Identification of plasma-sheath resonances in a parallel-plate plasma reactor. Journal of Applied Physics. 77(10). 5455–5457. 51 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact