U. Kwon

590 citations

21 papers · 193 indexed · h-index 9

Impact in

Electronic, Optical and Magnetic Materials
- Magnetic Properties and Applications
- Copper Interconnects and Reliability
Atomic and Molecular Physics, and Optics
- Magnetic properties of thin films

Papers in ⓘ

Electrical and Electronic Engineering 15
- Semiconductor materials and devices 11
- Advancements in Semiconductor Devices and Circuit Design 9
- Integrated Circuits and Semiconductor Failure Analysis 4
- Ferroelectric and Negative Capacitance Devices 4
Atomic and Molecular Physics, and Optics 8
- Magnetic properties of thin films 8

Co-authors: G. Bertero (6 shared papers)E. Vélu (6 shared papers)S. S. Malhotra (6 shared papers)Vijay Narayanan (7 shared papers)H. S. Jung (5 shared papers)Robert Sinclair (3 shared papers)Siddarth Krishnan (7 shared papers)K. V. R. M. Murali (1 shared paper)
Journals: IEEE Transactions on Magnetics (4 papers)IEEE Electron Device Letters (1 paper)Materials Chemistry and Physics (1 paper)Journal of Magnetism and Magnetic Materials (1 paper)Journal of Applied Physics (1 paper)
Partner nations: United States South Korea Switzerland

In The Last Decade

U. Kwon

20 papers receiving 182 citations

Peers

Countries citing papers authored by U. Kwon

Since Specialization

Citations

This map shows the geographic impact of U. Kwon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by U. Kwon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites U. Kwon more than expected).

Fields of papers citing papers by U. Kwon

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by U. Kwon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by U. Kwon. The network helps show where U. Kwon may publish in the future.

Co-authors

The 25 scholars most cited alongside U. Kwon, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with U. Kwon Line = papers co-authored together U. Kwon links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 21 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Ru/Ru-oxide interlayers for CoCrPtO perpendicular recording media IEEE Transactions on Magnetics ·U. Kwon, Robert Sinclair, E. Vélu, S. S. Malhotra, G. Bertero	2005	32
2	Role of point defects and HfO2/TiN interface stoichiometry on effective work function modulation in ultra-scaled complementary metal–oxide–semiconductor devices Journal of Applied Physics ·R. K. Pandey, Rajesh Sathiyanarayanan, U. Kwon, Vijay Narayanan, K. V. R. M. Murali	2013	23
3	Effect of Oxygen Incorporation on Microstructure and Media Performance in CoCrPt–SiO$_{2}$ Perpendicular Recording Media IEEE Transactions on Magnetics ·H. S. Jung, U. Kwon, Mao‐Kuen Kuo, E. Vélu, S. S. Malhotra, Wen Jiang, G. Bertero	2007	19
4	Bias temperature instability in High-κ/metal gate transistors - Gate stack scaling trends Siddarth Krishnan, Vijay Narayanan, E. Cartier, Dimitris P. Ioannou, Kai Zhao, Takashi Ando, U. Kwon, B.P. Linder, J. H. Stathis, M. Chudzik, A. Kerber, Kisik Choi	2012	18
5	CoCrPtO-Based Granular Composite Perpendicular Recording Media IEEE Transactions on Magnetics ·H. S. Jung, E. Vélu, S. S. Malhotra, U. Kwon, Dieter Suess, G. Bertero	2007	16
6	Simple Gate Metal Anneal (SIGMA) stack for FinFET Replacement Metal Gate toward 14nm and beyond Takashi Ando, Balaji Kannan, U. Kwon, W. Lai, B.P. Linder, E. Cartier, Richard Haight, M. Copel, J. Bruley, Siddarth Krishnan, Vijay Narayanan	2014	12
7	Process optimizations for NBTI/PBTI for future replacement metal gate technologies B.P. Linder, Arunima Dasgupta, Takashi Ando, E. Cartier, U. Kwon, Richard G. Southwick, M. Wang, Siddarth Krishnan, Marinus Hopstaken, Mohit Bajaj, R. K. Pandey, Wen-Hsin Chang, T. Yamashita, Oleg Gluschenkov, Vijay Narayanan, J. H. Stathis, S. K. Ray, J. Liu	2016	12
8	Intrinsic dielectric stack reliability of a high performance bulk planar 20nm replacement gate high-k metal gate technology and comparison to 28nm gate first high-k metal gate process William E. McMahon, C. Tian, Suresh Uppal, H. Kothari, Minjung Jin, G. LaRosa, T. Nigam, A. Kerber, B.P. Linder, E. Cartier, W. Lai, Y. Liu, Rahul Ramachandran, U. Kwon, B. Parameshwaran, Siddarth Krishnan, Vijay Narayanan	2013	9
9	An Analytical Metal Resistance Model and Its Application for Sub-22-nm Metal-Gate CMOS IEEE Electron Device Letters ·Xin Miao, Ruqiang Bao, U. Kwon, Keith H.K. Wong, W. Rausch, Weihao Weng, R. Wachnik, Stephan Grunow, Vijay Narayanan, Xiuling Li, Siddarth Krishnan	2015	8
10	Comparison of media properties between hard/soft stacked composite and capping layer perpendicular recording media Journal of Magnetism and Magnetic Materials ·H. S. Jung, E. Vélu, S. S. Malhotra, G. Bertero, U. Kwon	2008	6
11	A novel atomic layer oxidation technique for EOT scaling in gate-last high-к/metal gate CMOS technology Min Dai, Jinping Liu, Dechao Guo, Siddarth Krishnan, J. Shepard, Paul Ronsheim, U. Kwon, S. Siddiqui, R. Krishnan, Zhengwen Li, Kai Zhao, J. Sudijono, M. Chudzik	2011	6
12	Electron Beam Induced Resistance Change for Device Characterization and Defect Localization Proceedings - International Symposium for Testing and Failure Analysis ·G. Johnson, Christopher D’Aleo, Ziyan Xu, U. Kwon, Harvey E. Berman, Yi Feng, Scott Christian Darling, Brian Yates, Yun Wang, Markus Kagerer, R. H. C. Newton	2016	6
13	(Keynote) Atomic Layer Deposition Trends and Challenges in High-k/Metal Gate and Alternative Channel CMOS Processing ECS Transactions ·M. Chudzik, Sitaraman Krishnan, Min Dai, S. Siddiqui, J. Shepard, U. Kwon	2014	6
14	Effect of Magnetic Recording Layer Thickness on Media Performance in CoCrPt-Oxide Perpendicular Media IEEE Transactions on Magnetics ·U. Kwon, H. S. Jung, Mao‐Kuen Kuo, E. Vélu, S. S. Malhotra, Wen Jiang, G. Bertero, Robert Sinclair	2006	5
15	Effect of Magnetic Recording Layer Thickness on Media Performance in CoCrPtO Perpendicular Media U. Kwon, H. S. Jung, Mao‐Kuen Kuo, E. Vélu, S. S. Malhotra, G. Bertero, Robert Sinclair	2006	5
16	Mechanism of VFB/VTH shift in Dysprosium incorporated HfO2 gate dielectric n-Type Metal-Oxide-Semiconductor devices Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Tackhwi Lee, Kisik Choi, Takashi Ando, Dae-Gyu Park, M. Gribelyuk, U. Kwon, S. Banerjee	2011	3
17	Al CMP for Low Resistance Gate Fill for 20nm and Beyond Replacement Metal Gate MRS Proceedings ·Laertis Economikos, Xing Zhang, Haigou Hwang, U. Kwon, Keith H.K. Wong, Y. Escarabajal, Uma Rames Krishna Lagudu, Ashwin Chockalingam, S. V. Babu	2013	3
18	Transmission electron microscopy analysis of computer hard disc, magnetic thin films Materials Chemistry and Physics ·J. D. Risner, U. Kwon, D.W. Park, Rodney Sinclair	2003	2
19	Replacement metal gate resistance in FinFET architecture modelling, validation and extendibility Ruqiang Bao, B. Greene, U. Kwon, Sungjae Lee, J. Bruley, Weike Wang, Kai Zhao, Patrick W. DeHaven, Zhengwen Li, Keith H.K. Wong, Stephan Grunow, R. Divakaruni, Chung-Hsun Lin, Siddarth Krishnan, Vijay Narayanan	2015	1
20	Structural Characterization of 2.5D System in Package Combined with High Bandwidth Memory for Enhanced Quality and Reliability Byoungdo Lee, Jin-Woo Choi, Sang-Yong Lee, Jinwoo Park, Ji-Hoon Kang, U. Kwon, Gyujei Lee, Kangwook Lee	2024	1

About U. Kwon

U. Kwon is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Materials Chemistry and Condensed Matter Physics, having authored 21 papers that have together received 193 indexed citations. Recurring topics across this work include Semiconductor materials and devices (11 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers), Magnetic properties of thin films (8 papers), ZnO doping and properties (4 papers), Copper Interconnects and Reliability (4 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers), Ferroelectric and Negative Capacitance Devices (4 papers) and Physics of Superconductivity and Magnetism (2 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (59 citations), Atomic and Molecular Physics, and Optics (87 citations), Electrical and Electronic Engineering (121 citations), Condensed Matter Physics (20 citations) and Mechanics of Materials (19 citations). U. Kwon has collaborated with scholars based in United States, South Korea and Switzerland. Frequent co-authors include G. Bertero, E. Vélu, S. S. Malhotra, Vijay Narayanan, H. S. Jung, Robert Sinclair, Siddarth Krishnan, K. V. R. M. Murali, R. K. Pandey and Takashi Ando. Their work appears in journals such as IEEE Transactions on Magnetics, IEEE Electron Device Letters, Materials Chemistry and Physics, Journal of Magnetism and Magnetic Materials and Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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