Tomas Nyberg

2.6k total citations · 1 hit paper
81 papers, 2.1k citations indexed

About

Tomas Nyberg is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Materials Chemistry. According to data from OpenAlex, Tomas Nyberg has authored 81 papers receiving a total of 2.1k indexed citations (citations by other indexed papers that have themselves been cited), including 51 papers in Mechanics of Materials, 51 papers in Electrical and Electronic Engineering and 43 papers in Materials Chemistry. Recurrent topics in Tomas Nyberg's work include Metal and Thin Film Mechanics (50 papers), Semiconductor materials and devices (40 papers) and Diamond and Carbon-based Materials Research (15 papers). Tomas Nyberg is often cited by papers focused on Metal and Thin Film Mechanics (50 papers), Semiconductor materials and devices (40 papers) and Diamond and Carbon-based Materials Research (15 papers). Tomas Nyberg collaborates with scholars based in Sweden, Germany and China. Tomas Nyberg's co-authors include S. Berg, S. Berg, Tomáš Kubart, Ulf Jansson, Erik Särhammar, Oliver Kappertz, Lars Jonsson, O. Wilhelmsson, J.-P. Palmquist and Shi‐Li Zhang and has published in prestigious journals such as ACS Nano, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Tomas Nyberg

80 papers receiving 2.0k citations

Hit Papers

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What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Fundamental understanding and modeling of reactive sputtering processes

2005 552 citations S. Berg, Tomas Nyberg profile →

Peers

Countries citing papers authored by Tomas Nyberg

Since Specialization

Citations

This map shows the geographic impact of Tomas Nyberg's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tomas Nyberg with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tomas Nyberg more than expected).

Fields of papers citing papers by Tomas Nyberg

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Tomas Nyberg. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tomas Nyberg. The network helps show where Tomas Nyberg may publish in the future.

Co-authorship network of co-authors of Tomas Nyberg

This figure shows the co-authorship network connecting the top 25 collaborators of Tomas Nyberg. A scholar is included among the top collaborators of Tomas Nyberg based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Tomas Nyberg. Tomas Nyberg is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Wafer-Scale Ag2S-Based Memristive Crossbar Arrays with Ultra-Low Switching-Energies Reaching Biological Synapses 2024 ·Nano-Micro Letters ·Yuan Zhu, Tomas Nyberg, Leif Nyholm, Daniel Primetzhofer, Xun Shi, Zhen Zhang	8
2	Self-Limited Formation of Bowl-Shaped Nanopores for Directional DNA Translocation 2021 ·ACS Nano ·Ngan Hoang Pham, (unknown), Chenyu Wen, Shiyu Li, Shuangshuang Zeng, Tomas Nyberg, Tuan T. Tran, Daniel Primetzhofer, Zhen Zhang, Shi‐Li Zhang	7
3	Electronic excitation of transition metal nitrides by light ions with keV energies 2020 ·Journal of Physics Condensed Matter ·Barbara Bruckner, Marcus Hans, Tomas Nyberg, Grzegorz Greczyński, Peter Bauer‐Gottwein, Daniel Primetzhofer	1
4	On the Z1-dependence of electronic stopping in TiN 2019 ·Scientific Reports ·Maurício A. Sortica, V. Paneta, Barbara Bruckner, (unknown), Tomas Nyberg, Peter Bauer‐Gottwein, Daniel Primetzhofer	14
5	Electronic energy-loss mechanisms for H, He, and Ne in TiN 2017 ·Physical review. A ·Maurício A. Sortica, V. Paneta, Barbara Bruckner, (unknown), Marcus Hans, Tomas Nyberg, (unknown), Daniel Primetzhofer	24
6	Defect formation in graphene during low-energy ion bombardment 2016 ·APL Materials ·(unknown), Fredrik O. L. Johansson, Zhibin Zhang, Ulf Jansson, Shi‐Li Zhang, Andreas Lindblad, Tomas Nyberg	64
7	Toward synthesis of oxide films on graphene with sputtering based processes 2016 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·(unknown), Tomas Nyberg, Shi‐Li Zhang, Zhibin Zhang, Ulf Jansson	3
8	Influence of composition, structure and testing atmosphere on the tribological performance of W–S–N coatings 2014 ·Surface and Coatings Technology ·(unknown), (unknown), Erik Särhammar, Tomas Nyberg, Staffan Jacobson, Ulf Jansson	24
9	Hysteresis-free high rate reactive sputtering of niobium oxide, tantalum oxide, and aluminum oxide 2014 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Erik Särhammar, S. Berg, Tomas Nyberg	4
10	Tribochemically Active Ti–C–S Nanocomposite Coatings 2013 ·Materials Research Letters ·(unknown), (unknown), Erik Särhammar, Krisztina Kádas, Liping Wang, Olle Eriksson, Tomas Nyberg, Staffan Jacobson, Ulf Jansson	9
11	A study of the process pressure influence in reactive sputtering aiming at hysteresis elimination 2013 ·Surface and Coatings Technology ·Erik Särhammar, Koen Strijckmans, Tomas Nyberg, (unknown), S. Berg, Diederik Depla	35
12	Epitaxy of Ultrathin NiSi2 Films with Predetermined Thickness 2011 ·Electrochemical and Solid-State Letters ·(unknown), Joakim Andersson, Tomáš Kubart, Tomas Nyberg, U. Smith, Jun Lü, Lars Hultman, A. J. Kellock, Zhen Zhang, C. Lavoie, Shi‐Li Zhang	20
13	Experiments and modeling of dual reactive magnetron sputtering using two reactive gases 2008 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Tomáš Kubart, (unknown), (unknown), L. Hultman, Hans Högberg, Tomas Nyberg, S. Berg	17
14	On the high rate reactive sputtering of substoichiometric titanium oxide targets 2007 ·Tomáš Kubart, Diederik Depla, David C. Martin, Tomas Nyberg, S. Berg	1
15	Modelling of Magnetron Sputtering of Tungsten Oxide with Reactive Gas Pulsing 2007 ·Plasma Processes and Polymers ·Tomáš Kubart, Tomáš Polcar, Oliver Kappertz, (unknown), Tomas Nyberg, S. Berg, A. Cavaleiro	14
16	Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides 2006 ·Applied Physics Letters ·(unknown), Oliver Kappertz, Tomáš Kubart, Tomas Nyberg, S. Berg, Andreas Pflug, (unknown), Matthias Wuttig	43
17	The influence of the deposition angle on the composition of reactively sputtered thin films 1997 ·Surface and Coatings Technology ·Tomas Nyberg, C. Nender, Hans Högberg, S. Berg	8
18	Studies of reactive sputtering of multi-phase chromium nitride 1997 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Tomas Nyberg, P. Skytt, (unknown), C. Nender, J. Nordgren, S. Berg	20
19	Effect of the space charge sheath on properties of carbon and diamond films in the r.f. plasma jet 1994 ·Diamond and Related Materials ·Ladislav Bárdoš, Tomas Nyberg, Hana Baránková, S. Berg	5
20	Deposition of Carbonaceous Films onto Internal Walls of Tubes 1994 ·Journal of The Electrochemical Society ·Ladislav Bárdoš, Hana Baránková, Tomas Nyberg, S. Berg	6

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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