Spyridon Skordas

1.3k total citations
25 papers, 148 citations indexed

About

Spyridon Skordas is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Spyridon Skordas has authored 25 papers receiving a total of 148 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 8 papers in Materials Chemistry and 5 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Spyridon Skordas's work include Semiconductor materials and devices (12 papers), 3D IC and TSV technologies (9 papers) and Copper Interconnects and Reliability (5 papers). Spyridon Skordas is often cited by papers focused on Semiconductor materials and devices (12 papers), 3D IC and TSV technologies (9 papers) and Copper Interconnects and Reliability (5 papers). Spyridon Skordas collaborates with scholars based in United States, Greece and Germany. Spyridon Skordas's co-authors include M. Brause, V. Kempter, Alain E. Kaloyeros, Eric Eisenbraun, Steven Consiglio, Katsuyuki Sakuma, David Thompson, Robert G. Jones, John J. Sullivan and C.A. Papageorgopoulos and has published in prestigious journals such as Journal of The Electrochemical Society, Surface Science and Journal of Physics Condensed Matter.

In The Last Decade

Spyridon Skordas

22 papers receiving 136 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Spyridon Skordas United States 7 93 58 30 27 19 25 148
Aubrey Penn United States 7 83 0.9× 93 1.6× 57 1.9× 37 1.4× 42 2.2× 23 165
S. Petitdidier France 9 138 1.5× 80 1.4× 24 0.8× 38 1.4× 45 2.4× 34 198
Tushar K. Talukdar United States 9 116 1.2× 53 0.9× 29 1.0× 15 0.6× 22 1.2× 16 171
Judy Cha United States 3 75 0.8× 35 0.6× 45 1.5× 11 0.4× 15 0.8× 7 119
Chidozie Onwudinanti Netherlands 6 137 1.5× 115 2.0× 22 0.7× 24 0.9× 9 0.5× 9 174
Kate Reidy United States 10 90 1.0× 168 2.9× 26 0.9× 30 1.1× 41 2.2× 20 230
Bum Ki Moon Japan 8 164 1.8× 163 2.8× 53 1.8× 25 0.9× 23 1.2× 21 222
Dieter Skroblin Germany 7 78 0.8× 62 1.1× 8 0.3× 12 0.4× 16 0.8× 14 134
Masaaki Tamatani Japan 8 94 1.0× 168 2.9× 20 0.7× 23 0.9× 26 1.4× 21 208
Rusty Harris United States 10 299 3.2× 64 1.1× 19 0.6× 32 1.2× 32 1.7× 27 313

Countries citing papers authored by Spyridon Skordas

Since Specialization
Citations

This map shows the geographic impact of Spyridon Skordas's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Spyridon Skordas with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Spyridon Skordas more than expected).

Fields of papers citing papers by Spyridon Skordas

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Spyridon Skordas. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Spyridon Skordas. The network helps show where Spyridon Skordas may publish in the future.

Co-authorship network of co-authors of Spyridon Skordas

This figure shows the co-authorship network connecting the top 25 collaborators of Spyridon Skordas. A scholar is included among the top collaborators of Spyridon Skordas based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Spyridon Skordas. Spyridon Skordas is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Skordas, Spyridon. (2023). The evolution of heterogeneous integration and packaging for the age of chiplets. 2–2. 1 indexed citations
2.
Sakuma, Katsuyuki, Michael Belyansky, Spyridon Skordas, et al.. (2022). Surface Energy Characterization for Die-Level Cu Hybrid Bonding. 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC). 312–316. 12 indexed citations
3.
Sikka, Kamal, et al.. (2022). A Laser Dicing Method for Plus-Shaped Dies for Heterogenous Integration Applications. 2022 IEEE 72nd Electronic Components and Technology Conference (ECTC). 24–29. 2 indexed citations
4.
Varghese, Alex C., P. Montanini, Spyridon Skordas, et al.. (2018). Gas cluster ion beam processing for improved self aligned contact yield at 7 nm node FinFET: MJ: MOL and junction interfaces. 208–210. 1 indexed citations
5.
6.
Washington, Joseph R., D.L. Rath, Spyridon Skordas, et al.. (2014). Copper-to-dielectric heterogeneous bonding for 3D integration. 6–6.
7.
Lin, Wei‐Hung, Leathen Shi, Yiping Yao, et al.. (2014). Low-Temperature Oxide Wafer Bonding for 3-D Integration: Chemistry of Bulk Oxide Matters. IEEE Transactions on Semiconductor Manufacturing. 27(3). 426–430. 6 indexed citations
8.
Sakuma, Katsuyuki, Spyridon Skordas, Jeffrey A. Zitz, et al.. (2014). Bonding technologies for chip level and wafer level 3D integration. 647–654. 7 indexed citations
9.
Nguyen, S., A. Grill, S. A. Cohen, et al.. (2012). Robust Ultrathin (20-25 nm)Trilayer Dielectric Low k Cu Damascene Cap for Sub-30 nm Nanoelectric Devices. ECS Transactions. 41(43). 3–9. 4 indexed citations
10.
Skordas, Spyridon, Douglas Charles La Tulipe, Deepika Priyadarshini, et al.. (2012). Wafer-scale oxide fusion bonding and wafer thinning development for 3D systems integration: Oxide fusion wafer bonding and wafer thinning development for TSV-last integration. 203–208. 6 indexed citations
11.
Consiglio, Steven, et al.. (2007). A study of ruthenium ultrathin film nucleation on pretreated SiO2 and Hf–silicate dielectric surfaces. Journal of materials research/Pratt's guide to venture capital sources. 22(8). 2254–2264. 3 indexed citations
12.
Consiglio, Steven, et al.. (2006). Metallorganic Chemical Vapor Deposition of Hafnium Silicate Thin Films Using a Dual Source Dimethyl-alkylamido Approach. Journal of The Electrochemical Society. 153(11). F249–F249. 7 indexed citations
13.
Skordas, Spyridon, et al.. (2005). Electrical Properties of Ultrathin Al2O3 Films Grown by Metalorganic Chemical Vapor Deposition for Advanced Complementary Metal-oxide Semiconductor Gate Dielectric Applications. Journal of materials research/Pratt's guide to venture capital sources. 20(6). 1536–1543. 3 indexed citations
14.
Consiglio, Steven, et al.. (2004). Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications. Journal of materials research/Pratt's guide to venture capital sources. 19(10). 2947–2955. 13 indexed citations
15.
Skordas, Spyridon, Ryan L. Burns, Darı́o L. Goldfarb, et al.. (2004). Rinse additives for defect suppression in 193-nm and 248-nm lithogrophy. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 471–471. 3 indexed citations
16.
Skordas, Spyridon, et al.. (2003). Low-temperature metalorganic chemical vapor deposition of Al2O3 for advanced complementary metal-oxide semiconductor gate dielectric applications. Journal of materials research/Pratt's guide to venture capital sources. 18(8). 1868–1876. 5 indexed citations
17.
18.
19.
Brause, M., Spyridon Skordas, & V. Kempter. (2000). Study of the electronic structure of TiO2(110) and Cs/TiO2(110) with metastable impact electron spectroscopy and ultraviolet photoemission spectroscopy (HeI). Surface Science. 445(2-3). 224–234. 43 indexed citations
20.
Skordas, Spyridon, et al.. (1999). Low Temperature Thermal Chemical Vapor Deposition of Silicon Nitride Thin Films for Microelectronics Applications. MRS Proceedings. 606. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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