M.J. Thwaites

851 total citations
29 papers, 720 citations indexed

About

M.J. Thwaites is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, M.J. Thwaites has authored 29 papers receiving a total of 720 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 19 papers in Materials Chemistry and 7 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in M.J. Thwaites's work include ZnO doping and properties (13 papers), Thin-Film Transistor Technologies (9 papers) and Semiconductor materials and devices (8 papers). M.J. Thwaites is often cited by papers focused on ZnO doping and properties (13 papers), Thin-Film Transistor Technologies (9 papers) and Semiconductor materials and devices (8 papers). M.J. Thwaites collaborates with scholars based in United Kingdom, China and Canada. M.J. Thwaites's co-authors include K. O’Grady, P.J. Grundy, M. Vopsaroiu, R. D. Tomlinson, M.J. Hampshire, W. I. Milne, Andrew J. Flewitt, Paul Beecher, Di Wei and S.P. Speakman and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Physics D Applied Physics.

In The Last Decade

M.J. Thwaites

28 papers receiving 706 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
M.J. Thwaites United Kingdom	14	418	375	225	181	101	29	720
Hiroyoshi Momida Japan	17	456 1.1×	467 1.2×	167 0.7×	140 0.8×	116 1.1×	52	862
P. Y. Timbrell Australia	12	616 1.5×	446 1.2×	197 0.9×	120 0.7×	93 0.9×	22	782
G. G. Siu Hong Kong	13	413 1.0×	252 0.7×	166 0.7×	88 0.5×	149 1.5×	31	570
José Roberto Ribeiro Bortoleto Brazil	16	328 0.8×	301 0.8×	82 0.4×	174 1.0×	105 1.0×	57	605
F. Paumier France	16	532 1.3×	379 1.0×	137 0.6×	78 0.4×	46 0.5×	45	737
Akifumi Matsuda Japan	15	459 1.1×	296 0.8×	183 0.8×	62 0.3×	131 1.3×	76	646
Xiufeng Tang China	16	251 0.6×	413 1.1×	133 0.6×	130 0.7×	77 0.8×	46	768
М. Н. Солован Ukraine	16	513 1.2×	605 1.6×	98 0.4×	127 0.7×	112 1.1×	93	799
Wentao Qin United States	13	703 1.7×	481 1.3×	424 1.9×	72 0.4×	119 1.2×	50	1.1k
M. Eddrief France	16	516 1.2×	483 1.3×	153 0.7×	221 1.2×	47 0.5×	33	781

Countries citing papers authored by M.J. Thwaites

Since Specialization

Citations

This map shows the geographic impact of M.J. Thwaites's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M.J. Thwaites with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M.J. Thwaites more than expected).

Fields of papers citing papers by M.J. Thwaites

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M.J. Thwaites. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M.J. Thwaites. The network helps show where M.J. Thwaites may publish in the future.

Co-authorship network of co-authors of M.J. Thwaites

This figure shows the co-authorship network connecting the top 25 collaborators of M.J. Thwaites. A scholar is included among the top collaborators of M.J. Thwaites based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M.J. Thwaites. M.J. Thwaites is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Tao, Xudong, Zheng Zhang, Ruy S. Bonilla, et al.. (2024). Exceptional Performance of Room Temperature Sputtered Flexible Thermoelectric Thin Film Using High Target Utilisation Sputtering Technique. Advanced Materials Technologies. 9(6).

Thwaites, M.J., et al.. (2023). Reactive remote plasma sputtering of TiOx thin films and controlled growth of textured single-phase rutile using rf substrate biasing. Surface and Coatings Technology. 476. 130247–130247. 3 indexed citations

Guo, Meilan, et al.. (2016). Remote plasma sputtering deposited Nb-doped TiO2 with remarkable transparent conductivity. Solar Energy Materials and Solar Cells. 149. 310–319. 39 indexed citations

Tsakonas, C., et al.. (2015). Transparent and Flexible Thin Film Electroluminescent Devices Using HiTUS Deposition and Laser Processing Fabrication. IEEE Journal of the Electron Devices Society. 4(1). 22–29. 4 indexed citations

Brown, H.L., et al.. (2015). The impact of substrate bias on a remote plasma sputter coating process for conformal coverage of trenches and 3D structures. Journal of Physics D Applied Physics. 48(33). 335303–335303. 23 indexed citations

Bayer, Bernhard C., et al.. (2011). High-k (k=30) amorphous hafnium oxide films from high rate room temperature deposition. Applied Physics Letters. 98(25). 58 indexed citations

Tsakonas, C., et al.. (2011). Laser annealing of thin film electroluminescent devices deposited at a high rate using high target utilization sputtering. Semiconductor Science and Technology. 26(4). 45016–45016. 3 indexed citations

Thwaites, M.J., et al.. (2011). Remote plasma sputtering of indium tin oxide thin films for large area flexible electronics. Thin Solid Films. 520(4). 1207–1211. 12 indexed citations

Wei, Di, et al.. (2009). Transparent, flexible and solid-state supercapacitors based on room temperature ionic liquid gel. Electrochemistry Communications. 11(12). 2285–2287. 77 indexed citations

10.

Calnan, Sonya, Hari M. Upadhyaya, M.J. Thwaites, & Ayodhya N. Tiwari. (2007). Properties of indium tin oxide films deposited using High Target Utilisation Sputtering. Thin Solid Films. 515(15). 6045–6050. 25 indexed citations

11.

Vopson, Melvin M., et al.. (2005). GRAIN SIZE EFFECTS IN METALLIC THIN FILMS PREPARED USING A NEW SPUTTERING TECHNOLOGY. Journal of Optoelectronics and Advanced Materials. 7(5). 2713–2720. 22 indexed citations

12.

Vopsaroiu, M., et al.. (2005). Preparation of high moment CoFe films with controlled grain size and coercivity. Journal of Applied Physics. 97(10). 54 indexed citations

13.

Vopsaroiu, M., et al.. (2005). Growth rate effects in soft CoFe films. IEEE Transactions on Magnetics. 41(10). 3253–3255. 8 indexed citations

14.

Anguita, José V., et al.. (2005). Highly accurate coating composition control during co-sputtering, based on controlling plasma chromaticity. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 23(2). 265–269. 2 indexed citations

15.

Vopsaroiu, M., et al.. (2005). Deposition of polycrystalline thin films with controlled grain size. Journal of Physics D Applied Physics. 38(3). 490–496. 64 indexed citations

16.

Thwaites, M.J. & H.S. Reehal. (1997). Growth of single-crystal Si, Ge and SiGe layers using plasma-assisted CVD. Thin Solid Films. 294(1-2). 76–79. 4 indexed citations

17.

Reehal, H.S., M.J. Thwaites, & Tim Bruton. (1996). Thin Film Polycrystalline Silicon Solar Cells Prepared by Plasma CVD. physica status solidi (a). 154(2). 623–633. 7 indexed citations

18.

Sofield, C.J., et al.. (1983). Simultaneous boron and hydrogen profiling in gas-phase-doped hydrogenated amorphous silicon. Thin Solid Films. 110(3). 251–261. 10 indexed citations

19.

Thwaites, M.J., R. D. Tomlinson, & M.J. Hampshire. (1978). The observation of energy transitions from lower valence band states in CuGaSe2. Solid State Communications. 27(7). 727–728. 7 indexed citations

20.

Thwaites, M.J., R. D. Tomlinson, & M.J. Hampshire. (1977). The observation of a direct energy band gap for CuInTe2 single crystals using electroreflectance techniques. Solid State Communications. 23(12). 905–906. 42 indexed citations

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