R.W. Vook
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- Copper Interconnects and Reliability 57
- Surfaces, Coatings and Films top 5%
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- Surface and Thin Film Phenomena 36
- Advanced Chemical Physics Studies 13
- Mechanics of Materials top 2%
- Metal and Thin Film Mechanics 24
- Atmospheric Science top 5%
- nanoparticles nucleation surface interactions 31
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- Semiconductor materials and devices 18
- Electronic Packaging and Soldering Technologies 16
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- Electrical Contact Performance and Analysis 13
- Co-authors
- F. WittChih‐Yung ChangYoshikatsu NambaS. S. ChaoJackson HoByung-Ho JoC. A. WertFrank-Thomas Koch
- Cited by
- Electronic, Optical and Magnetic MaterialsSurfaces, Coatings and FilmsAtomic and Molecular Physics, and Optics
- Journals
- Thin Solid Films (23 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (14 papers)Journal of Applied Physics (13 papers)
- Partner nations
- United StatesChinaJapan
In The Last Decade
R.W. Vook
131 papers receiving 1.7k citations
Peers
Comparison fields: 5 of 57
- Electronic, Optical and Magnetic Materials 657
- Surfaces, Coatings and Films 202
- Atomic and Molecular Physics, and Optics 652
- Mechanics of Materials 471
- Atmospheric Science 307
Countries citing papers authored by R.W. Vook
This map shows the geographic impact of R.W. Vook's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R.W. Vook with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R.W. Vook more than expected).
Fields of papers citing papers by R.W. Vook
This network shows the impact of papers produced by R.W. Vook. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R.W. Vook. The network helps show where R.W. Vook may publish in the future.
Co-authorship network
The 25 scholars most cited alongside R.W. Vook, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2003 | 1 | |
| 2 | 1997 | 11 | |
| 3 | 1991 | 30 | |
| 4 | 1991 | 5 | |
| 5 | 1990 | 5 | |
| 6 | 1990 | 2 | |
| 7 | 1989 | 6 | |
| 8 | 1988 | 4 | |
| 9 | 1988 | 7 | |
| 10 | 1986 | 1 | |
| 11 | 1982 | 14 | |
| 12 | 1980 | 7 | |
| 13 | 1980 | 22 | |
| 14 | 1979 | 7 | |
| 15 | 1978 | 38 | |
| 16 | 1975 | 24 | |
| 17 | 1972 | 15 | |
| 18 | 1969 | 8 | |
| 19 | 1968 | 28 | |
| 20 | 1958 | 43 |
About R.W. Vook
R.W. Vook is a scholar working on Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics, and Optics, Atmospheric Science, Surfaces, Coatings and Films and Metals and Alloys, having authored 133 papers that have together received 1.9k indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (57 papers), Surface and Thin Film Phenomena (36 papers), nanoparticles nucleation surface interactions (31 papers), Metal and Thin Film Mechanics (24 papers), Semiconductor materials and devices (18 papers), Electronic Packaging and Soldering Technologies (16 papers), Electrical Contact Performance and Analysis (13 papers) and Advanced Chemical Physics Studies (13 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (657 citations), Surfaces, Coatings and Films (202 citations), Atomic and Molecular Physics, and Optics (652 citations), Mechanics of Materials (471 citations) and Atmospheric Science (307 citations). R.W. Vook has collaborated with scholars based in United States, China and Japan. Frequent co-authors include F. Witt, Chih‐Yung Chang, Yoshikatsu Namba, S. S. Chao, Jackson Ho, Byung-Ho Jo, C. A. Wert, Frank-Thomas Koch, Masanori Murakami and Bruno C. De Cooman. Their work appears in journals such as Thin Solid Films, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Applied Physics, Applied Surface Science and Surface Science.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.