Robert D. Larrabee

1.2k total citations
57 papers, 773 citations indexed

About

Robert D. Larrabee is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Robert D. Larrabee has authored 57 papers receiving a total of 773 indexed citations (citations by other indexed papers that have themselves been cited), including 40 papers in Electrical and Electronic Engineering, 21 papers in Surfaces, Coatings and Films and 20 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Robert D. Larrabee's work include Advancements in Photolithography Techniques (19 papers), Electron and X-Ray Spectroscopy Techniques (13 papers) and Surface Roughness and Optical Measurements (9 papers). Robert D. Larrabee is often cited by papers focused on Advancements in Photolithography Techniques (19 papers), Electron and X-Ray Spectroscopy Techniques (13 papers) and Surface Roughness and Optical Measurements (9 papers). Robert D. Larrabee collaborates with scholars based in United States, Netherlands and Germany. Robert D. Larrabee's co-authors include M. C. Steele, Michael T. Postek, Diana Nyyssonen, W. R. Thurber, András Vládar, Jeremiah R. Lowney, Ravikiran Attota, Richard M. Silver, Fred Moses and Samuel N. Jones and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Robert D. Larrabee

55 papers receiving 697 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Robert D. Larrabee United States 16 366 301 155 125 92 57 773
Richard A. Allen United States 18 490 1.3× 441 1.5× 166 1.1× 234 1.9× 156 1.7× 117 947
D L Misell United Kingdom 15 212 0.6× 317 1.1× 371 2.4× 76 0.6× 48 0.5× 52 912
Marija S. Scholl Mexico 16 176 0.5× 170 0.6× 36 0.2× 151 1.2× 130 1.4× 63 577
Maria Luisa Rastello Italy 18 196 0.5× 342 1.1× 58 0.4× 143 1.1× 46 0.5× 69 866
A. F. Milton United States 18 1.0k 2.8× 526 1.7× 65 0.4× 101 0.8× 84 0.9× 44 1.4k
Bill D. Cook United States 15 272 0.7× 492 1.6× 43 0.3× 383 3.1× 40 0.4× 47 897
Roland V. Shack United States 13 321 0.9× 688 2.3× 95 0.6× 421 3.4× 65 0.7× 38 1.1k
C.J. Bouwkamp Netherlands 8 349 1.0× 374 1.2× 132 0.9× 468 3.7× 21 0.2× 30 792
Timothy A. Brunner United States 22 919 2.5× 629 2.1× 255 1.6× 412 3.3× 79 0.9× 104 1.7k
A. Lakhtakia United States 11 246 0.7× 560 1.9× 123 0.8× 238 1.9× 33 0.4× 22 844

Countries citing papers authored by Robert D. Larrabee

Since Specialization
Citations

This map shows the geographic impact of Robert D. Larrabee's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Robert D. Larrabee with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Robert D. Larrabee more than expected).

Fields of papers citing papers by Robert D. Larrabee

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Robert D. Larrabee. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Robert D. Larrabee. The network helps show where Robert D. Larrabee may publish in the future.

Co-authorship network of co-authors of Robert D. Larrabee

This figure shows the co-authorship network connecting the top 25 collaborators of Robert D. Larrabee. A scholar is included among the top collaborators of Robert D. Larrabee based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Robert D. Larrabee. Robert D. Larrabee is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Attota, Ravikiran, et al.. (2005). Application of through-focus focus-metric analysis in high resolution optical metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5752. 1441–1441. 19 indexed citations
2.
Attota, Ravikiran, et al.. (2005). Application of through-focus focus-metric analysis in high resolution optical metrology, ed. by R.M. Silver. 5752. 1 indexed citations
3.
Silver, Richard M., Ravikiran Attota, Michael Bishop, et al.. (2003). Calibration strategies for overlay and registration metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5038. 103–103. 2 indexed citations
4.
Silver, Richard M., et al.. (2002). Comparison of measured optical image profiles of silicon lines with two different theoretical models. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4689. 409–409. 10 indexed citations
5.
Postek, Michael T., et al.. (1999). Image sharpness measurement in the scanning electron microscope—Part III. Scanning. 21(4). 246–252. 46 indexed citations
6.
Postek, Michael T., et al.. (1997). Statistical models for estimating the measurement of pitch in metrology instruments. Metrologia. 34(6). 467–477. 3 indexed citations
7.
Silver, Richard M., et al.. (1995). Overlay measurements and standards. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2439. 262–262. 1 indexed citations
8.
Postek, Michael T., et al.. (1994). Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology | NIST. Scanning. 16. 1 indexed citations
9.
Postek, Michael T., et al.. (1993). X-ray-lithography mask metrology: Use of transmitted electrons in an SEM for linewidth measurement. Journal of Research of the National Institute of Standards and Technology. 98(4). 415–415. 17 indexed citations
10.
Postek, Michael T., et al.. (1993). <title>X-ray mask metrology: the development of linewidth standards for x-ray lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1924. 435–449. 2 indexed citations
11.
Postek, Michael T., et al.. (1989). Specimen biasing to enhance or suppress secondary electron emission from charging specimens at low accelerating voltages,. Scanning. 11(3). 111–121. 11 indexed citations
12.
Postek, Michael T., et al.. (1989). A new approach to accurate X-ray mask measurements in a scanning electron microscope. IEEE Transactions on Electron Devices. 36(11). 2452–2457. 7 indexed citations
13.
Postek, Michael T., et al.. (1988). The relationship between accelerating voltage and electron detection modes to linewidth measurement in an SEM. Scanning. 10(1). 10–18. 20 indexed citations
14.
Nyyssonen, Diana & Robert D. Larrabee. (1987). Submicrometer linewidth metrology in the optical microscope. Journal of Research of the National Bureau of Standards. 92(3). 187–187. 36 indexed citations
15.
Postek, Michael T., et al.. (1987). Scanning Electron Microscope Linewidth Measurement Standards Programat the National Bureau of Standards | NIST. 1 indexed citations
16.
Larrabee, Robert D.. (1978). Approximate stochastic analysis of combined loading. 10 indexed citations
17.
Larrabee, Robert D.. (1963). Conditions Existing at the Onset of Oscillistor Action. Journal of Applied Physics. 34(4). 880–890. 13 indexed citations
18.
Larrabee, Robert D.. (1961). Current-Voltage Characteristics of Forward Biased Longp−i−nStructures. Physical Review. 121(1). 37–39. 39 indexed citations
19.
Larrabee, Robert D.. (1959). Theory and Application of a Minority Carrier Sweep-Out Effect. Journal of Applied Physics. 30(10). 1535–1538. 1 indexed citations
20.
Larrabee, Robert D.. (1959). Spectral Emissivity of Tungsten†. Journal of the Optical Society of America. 49(6). 619–619. 139 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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