Robert D. Larrabee
- Electrical and Electronic Engineering top 10%
- Atomic and Molecular Physics, and Optics top 10%
- Surfaces, Coatings and Films top 5%
- Biomedical Engineering
- Computational Mechanics top 10%
- Co-authors
- M. C. SteeleMichael T. PostekDiana NyyssonenW. R. ThurberJeremiah R. LowneyAndrás VládarRichard M. SilverRavikiran Attota
- Topics
- Advancements in Photolithography Techniques (19 papers)Electron and X-Ray Spectroscopy Techniques (13 papers)Surface Roughness and Optical Measurements (9 papers)
- Partner nations
- United StatesNetherlandsGermany
In The Last Decade
Robert D. Larrabee
55 papers receiving 697 citations
Peers
Comparison fields: 5 of 71
- Electrical and Electronic Engineering 366
- Atomic and Molecular Physics, and Optics 301
- Surfaces, Coatings and Films 155
- Biomedical Engineering 125
- Computational Mechanics 92
Countries citing papers authored by Robert D. Larrabee
This map shows the geographic impact of Robert D. Larrabee's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Robert D. Larrabee with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Robert D. Larrabee more than expected).
Fields of papers citing papers by Robert D. Larrabee
This network shows the impact of papers produced by Robert D. Larrabee. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Robert D. Larrabee. The network helps show where Robert D. Larrabee may publish in the future.
Co-authorship network of co-authors of Robert D. Larrabee
This figure shows the co-authorship network connecting the top 25 collaborators of Robert D. Larrabee. A scholar is included among the top collaborators of Robert D. Larrabee based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Robert D. Larrabee. Robert D. Larrabee is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | Application of through-focus focus-metric analysis in high resolution optical metrology, ed. by R.M. Silver | 1 |
| 2 | 19 | |
| 3 | 4 | |
| 4 | 2 | |
| 5 | 10 | |
| 6 | 46 | |
| 7 | 3 | |
| 8 | 1 | |
| 9 | Electron Beam Interaction Modeling as Applied to X-Ray Lithography Mask SEM Linewidth Metrology | NIST | 1 |
| 10 | 17 | |
| 11 | 12 | |
| 12 | 11 | |
| 13 | 20 | |
| 14 | 36 | |
| 15 | Scanning Electron Microscope Linewidth Measurement Standards Programat the National Bureau of Standards | NIST | 1 |
| 16 | 1 | |
| 17 | 3 | |
| 18 | 13 | |
| 19 | 1 | |
| 20 | 139 |
About Robert D. Larrabee
Robert D. Larrabee is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics, having authored 57 papers that have together received 773 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (19 papers), Electron and X-Ray Spectroscopy Techniques (13 papers) and Surface Roughness and Optical Measurements (9 papers). The work is most often cited by research in Surfaces, Coatings and Films (155 citations), Structural Biology (21 citations) and Atomic and Molecular Physics, and Optics (301 citations). Robert D. Larrabee has collaborated with scholars based in United States, Netherlands and Germany. Frequent co-authors include M. C. Steele, Michael T. Postek, Diana Nyyssonen, W. R. Thurber, Jeremiah R. Lowney, András Vládar, Richard M. Silver, Ravikiran Attota, Fred Moses and Samuel N. Jones. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.