R. Flitsch
- Electrical and Electronic Engineering top 5%
- Materials Chemistry top 10%
- Surfaces, Coatings and Films top 2%
- Atomic and Molecular Physics, and Optics top 10%
- Computational Mechanics top 5%
- Co-authors
- S. I. RaiderW. A. PliskinJ. A. AboafDa‐Yuan ShihS. NunesN. KlymkoJ. ParaszczakL. V. Gregor
- Topics
- Semiconductor materials and devices (5 papers)Ga2O3 and related materials (4 papers)Synthesis and properties of polymers (3 papers)
- Journals
- Journal of The Electrochemical SocietyJournal of Vacuum Science & Technology A Vacuum Surfaces and FilmsIBM Journal of Research and Development
- Partner nations
- United States
In The Last Decade
R. Flitsch
14 papers receiving 939 citations
Peers
Comparison fields: 5 of 46
- Electrical and Electronic Engineering 712
- Materials Chemistry 401
- Surfaces, Coatings and Films 292
- Atomic and Molecular Physics, and Optics 184
- Computational Mechanics 160
Countries citing papers authored by R. Flitsch
This map shows the geographic impact of R. Flitsch's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Flitsch with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Flitsch more than expected).
Fields of papers citing papers by R. Flitsch
This network shows the impact of papers produced by R. Flitsch. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Flitsch. The network helps show where R. Flitsch may publish in the future.
Co-authorship network of co-authors of R. Flitsch
This figure shows the co-authorship network connecting the top 25 collaborators of R. Flitsch. A scholar is included among the top collaborators of R. Flitsch based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. Flitsch. R. Flitsch is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 18 | |
| 2 | 45 | |
| 3 | 59 | |
| 4 | 37 | |
| 5 | 90 | |
| 6 | 12 | |
| 7 | 42 | |
| 8 | 211 | |
| 9 | 45 | |
| 10 | 161 | |
| 11 | 235 | |
| 12 | 25 | |
| 13 | 9 | |
| 14 | Preparation of NBS copper-base spectrochemical standards | 1 |
About R. Flitsch
R. Flitsch is a scholar working on Surfaces, Coatings and Films, Polymers and Plastics and Electronic, Optical and Magnetic Materials, having authored 14 papers that have together received 990 indexed citations. Recurring topics across this work include Semiconductor materials and devices (5 papers), Ga2O3 and related materials (4 papers) and Synthesis and properties of polymers (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (292 citations), Electrical and Electronic Engineering (712 citations) and Ceramics and Composites (65 citations). R. Flitsch has collaborated with scholars based in United States. Frequent co-authors include S. I. Raider, W. A. Pliskin, J. A. Aboaf, Da‐Yuan Shih, S. Nunes, N. Klymko, J. Paraszczak, L. V. Gregor, J. K. Howard and John E. Lewis. Their work appears in journals such as Journal of The Electrochemical Society, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and IBM Journal of Research and Development.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.