Olof C. Hellman
- Metals and Alloys top 2%
- Biomedical Engineering top 5%
- Advanced Materials Characterization Techniques 14
- Mechanical Engineering top 5%
- Materials Chemistry top 5%
- Diamond and Carbon-based Materials Research 4
- Aerospace Engineering top 5%
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- Semiconductor materials and devices 12
- Integrated Circuits and Semiconductor Failure Analysis 8
- Thin-Film Transistor Technologies 7
- Chalcogenide Semiconductor Thin Films 4
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- Ion-surface interactions and analysis 11
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- Surface and Thin Film Phenomena 4
Olof C. Hellman
37 papers receiving 1.4k citations
Hit Papers
Peers
Comparison fields: 5 of 43
- Metals and Alloys 239
- Biomedical Engineering 907
- Mechanical Engineering 625
- Materials Chemistry 761
- Aerospace Engineering 241
Countries citing papers authored by Olof C. Hellman
This map shows the geographic impact of Olof C. Hellman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Olof C. Hellman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Olof C. Hellman more than expected).
Fields of papers citing papers by Olof C. Hellman
This network shows the impact of papers produced by Olof C. Hellman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Olof C. Hellman. The network helps show where Olof C. Hellman may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Olof C. Hellman, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2003 | 139 | |
| 2 | 2002 | 92 | |
| 3 | 2001 | 10 | |
| 4 | 2000 | 15 | |
| 5 | Analysis of Three-dimensional Atom-probe Data by the Proximity Histogrambreakdown → | 2000 | 689 |
| 6 | 1999 | 15 | |
| 7 | 1997 | 3 | |
| 8 | 1996 | 11 | |
| 9 | 1996 | 15 | |
| 10 | 1996 | 2 | |
| 11 | 1994 | 3 | |
| 12 | 1993 | 6 | |
| 13 | 1992 | 4 | |
| 14 | 1992 | 8 | |
| 15 | 1992 | 21 | |
| 16 | 1992 | 9 | |
| 17 | 1991 | 6 | |
| 18 | 1991 | 1 | |
| 19 | 1989 | 2 | |
| 20 | 1988 | 3 |
About Olof C. Hellman
Olof C. Hellman is a scholar working on Metals and Alloys, Computational Mechanics and Electrical and Electronic Engineering, having authored 37 papers that have together received 1.4k indexed citations. Recurring topics across this work include Advanced Materials Characterization Techniques (14 papers), Semiconductor materials and devices (12 papers), Ion-surface interactions and analysis (11 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers), Thin-Film Transistor Technologies (7 papers), Diamond and Carbon-based Materials Research (4 papers), Chalcogenide Semiconductor Thin Films (4 papers) and Surface and Thin Film Phenomena (4 papers). The work is most often cited by research in Metals and Alloys (239 citations), Biomedical Engineering (907 citations) and Mechanical Engineering (625 citations). Olof C. Hellman has collaborated with scholars based in United States, Japan and France. Frequent co-authors include David N. Seidman, Dieter Isheim, Nicole Herbots, J. Vandenbroucke, Kevin E. Yoon, Ronald D. Noebe, Y. Makita, A. Yamada, Paul Fons and Shigeru Niki. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Materials Science and Engineering A.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.