Nobuhiro Hata

1.4k total citations
115 papers, 1.2k citations indexed

About

Nobuhiro Hata is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Nobuhiro Hata has authored 115 papers receiving a total of 1.2k indexed citations (citations by other indexed papers that have themselves been cited), including 82 papers in Electrical and Electronic Engineering, 71 papers in Materials Chemistry and 44 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Nobuhiro Hata's work include Thin-Film Transistor Technologies (48 papers), Copper Interconnects and Reliability (43 papers) and Silicon Nanostructures and Photoluminescence (32 papers). Nobuhiro Hata is often cited by papers focused on Thin-Film Transistor Technologies (48 papers), Copper Interconnects and Reliability (43 papers) and Silicon Nanostructures and Photoluminescence (32 papers). Nobuhiro Hata collaborates with scholars based in Japan, United States and Poland. Nobuhiro Hata's co-authors include Akihisa Matsuda, Takamaro Kikkawa, S. Wagner, Kazunobu Tanaka, Kazuhiro Yamada, Yutaka Seino, Yoshiaki Oku, Masao Isomura, Nobutoshi Fujii and Hirofumi Tanaka and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Nobuhiro Hata

112 papers receiving 1.1k citations

Peers

Nobuhiro Hata

EEE

EOMM

M. Holtz United States

M. Popescu Romania

C. Gómez‐Aleixandre Spain

N. J. Ianno United States

C. Jaussaud France

D. Lubben United States

W. E. Collins United States

B. Agius France

W. Richter Germany

Roland Thielsch Germany

M. Holtz United States

Nobuhiro Hata

347 ×0.4

EEE

464 ×0.7

268 ×0.8

EOMM

158 ×0.9

255 ×1.6

Citations per year, relative to Nobuhiro Hata Nobuhiro Hata (= 1×) peers M. Holtz

Countries citing papers authored by Nobuhiro Hata

Since Specialization

Citations

This map shows the geographic impact of Nobuhiro Hata's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Nobuhiro Hata with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Nobuhiro Hata more than expected).

Fields of papers citing papers by Nobuhiro Hata

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Nobuhiro Hata. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Nobuhiro Hata. The network helps show where Nobuhiro Hata may publish in the future.

Co-authorship network of co-authors of Nobuhiro Hata

This figure shows the co-authorship network connecting the top 25 collaborators of Nobuhiro Hata. A scholar is included among the top collaborators of Nobuhiro Hata based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Nobuhiro Hata. Nobuhiro Hata is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Fukuda, Hirotsugu, Yuji Kikuchi, Nobuhiro Hata, et al.. (2019). Clinically feasible method for assessing leukocyte rheology in whole blood. Heart and Vessels. 35(2). 268–277. 1 indexed citations

Kinoshita, Kentaro, Hirofumi Tanaka, Takamasa Suzuki, et al.. (2010). Ultralow-k/Cu Damascene Multilevel Interconnects Using High Porosity and High Modulus Self-Assembled Porous Silica. Journal of The Electrochemical Society. 157(5). H519–H519. 5 indexed citations

Fujii, Nobutoshi, et al.. (2009). Integration of Self-Assembled Porous Silica in Low-k/Cu Damascene Interconnects. Japanese Journal of Applied Physics. 48(9). 95002–95002. 2 indexed citations

Yoshino, Takashi, et al.. (2008). Effect of Silylation Hardening on the Electrical Characteristics of Mesoporous Pure Silica Zeolite Film. Journal of The Electrochemical Society. 156(2). H98–H98. 11 indexed citations

Hata, Nobuhiro, et al.. (2007). Plasma-Enhanced-Polymerization Thin-Film as a Drift Barrier for Cu Ions. Japanese Journal of Applied Physics. 46(4S). 1951–1951. 4 indexed citations

Kinoshita, Kentaro, Tadachika Nakayama, Hirofumi Tanaka, et al.. (2007). 32 nm node Ultralow-k(k=2.1)/Cu Damascene Multilevel Interconnect using High-Porosity (50 %) High-Modulus (9 GPa) Self-Assembled Porous Silica. 812. 969–972. 7 indexed citations

Ishikawa, Akira, T. Yamanishi, Nobuhiro Hata, et al.. (2006). Influence of CMP Chemicals on the Properties of Porous Silica Low-k Films. Journal of The Electrochemical Society. 153(7). G692–G692. 30 indexed citations

Hata, Nobuhiro, et al.. (2005). Theoretical Investigation into Effects of Pore Size and Pore Position Distributions on Dielectric Constant and Elastic Modulus of Two-Dimensional Periodic Porous Silica Films. Japanese Journal of Applied Physics. 44(3R). 1166–1166. 17 indexed citations

Hata, Nobuhiro, et al.. (2005). Skeletal silica characterization in porous-silica low-dielectric-constant films by infrared spectroscopic ellipsometry. Journal of Applied Physics. 97(11). 19 indexed citations

10.

Kawahara, J., et al.. (2004). Molecular Orbital Calculation of the Elastic Modulus and the Dielectric Constant for Ultra Low-kOrganic Polymers. Japanese Journal of Applied Physics. 43(2). 504–507. 6 indexed citations

11.

Fortmann, C.M., A. H. Mahan, Scott Ward, et al.. (2003). Hot-wire photonics: materials, science, and technology. Thin Solid Films. 430(1-2). 278–282. 2 indexed citations

12.

Fortmann, C.M., et al.. (2002). Progress in deposited refractive index engineered materials and devices. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4459. 10–10. 2 indexed citations

13.

Oku, Yoshiaki, Kazuhiro Yamada, Norikazu Nishiyama, et al.. (2002). Effect of TEOS treatment on the properties of periodic nanoporous silica low-k film.

14.

Hata, Nobuhiro, Toshihiro Kamei, H. Okamoto, & Akihisa Matsuda. (1997). Polarized Electroabsorption in Pulse and Continuous Light-Soaked a-Si:H - Structural Change other than Defect Creation. MRS Proceedings. 467. 5 indexed citations

15.

Kamei, Toshihiro, Nobuhiro Hata, & Akihisa Matsuda. (1996). A study of surface reactions during the growth of B-doped a-Si:H using the intermittent deposition technique. Journal of Non-Crystalline Solids. 198-200. 999–1002. 2 indexed citations

16.

Osborne, Ian S., Nobuhiro Hata, & Akihisa Matsuda. (1995). Plasma Deposition and Characterization of Stable a-Si:H (Cl) From a Silane-Dichlorosilane Mixture. MRS Proceedings. 377. 2 indexed citations

17.

Osborne, Ian S., Nobuhiro Hata, & Akihisa Matsuda. (1994). Comparison of Defect Annealing Kinetics of a-Si:H Prepared by Pure Silane and Helium Diluted Silane by Triode Plasma Chemical Vapour Deposition. Japanese Journal of Applied Physics. 33(12R). 6475–6475. 4 indexed citations

18.

Hata, Nobuhiro & Akihisa Matsuda. (1993). Difference in light-induced annealing behavior of deposition- and light-induced defects in hydrogenated amorphous silicon. Applied Physics Letters. 63(14). 1948–1950. 6 indexed citations

19.

Hata, Nobuhiro & K. Shimoda. (1980). Theory of optical ramsey resonance in three separated fields produced by a corner reflector. Applied Physics A. 23(2). 222–222. 1 indexed citations

20.

Hata, Nobuhiro & K. Shimoda. (1980). Theory of optical ramsey resonance in three separated fields produced by a corner reflector. Applied Physics A. 22(1). 1–9. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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