Matt Gordon

1.5k citations
73 papers · 653 · h-index 13

Impact in

Papers in

    • Plasma Diagnostics and Applications 13
    • Electronic Packaging and Soldering Technologies 12
    • Semiconductor materials and devices 9
    • 3D IC and TSV technologies 7
    • Metal and Thin Film Mechanics 19
    • Adhesion, Friction, and Surface Interactions 7

Matt Gordon

66 papers receiving 623 citations

Peers

Matt Gordon
Comparison fields: 5 of 102
  • Mechanics of Materials 190
  • Ceramics and Composites 34
  • Architecture 6
  • Materials Chemistry 181
  • Electrical and Electronic Engineering 203
Replace Valériy Luchnikov with:
Valériy Luchnikov France
Xiaona Huang China
Satoshi Kishimoto Japan
Xiaolei Zhu China
Zhixin Yang China
Yongfeng Li China
P. Hébraud France
Shengjun Zhang China
Anand Gupta India
V. Ya. Shevchenko Russia
Matt Gordon relative to Valériy Luchnikov France Valériy Luchnikov's profile →
Citations per field
00.5×3.4×
Valériy Luchnikov · 1×
Citations per year

Countries citing papers authored by Matt Gordon

Since Specialization
Citations

This map shows the geographic impact of Matt Gordon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Matt Gordon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Matt Gordon more than expected).

Fields of papers citing papers by Matt Gordon

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Matt Gordon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Matt Gordon. The network helps show where Matt Gordon may publish in the future.

Co-authors

The 25 scholars most cited alongside Matt Gordon, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Matt Gordon Line = papers co-authored together Matt Gordon links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 73 papers — load more, or switch the sort, to bring in the rest.

#Work
1 1974154
2 200737
3 202235
4 200434
5 199027
6 201624
7 199320
8 197618
9 200818
10 199916
11 200815
12 199315
13 200812
14 200711
15 199211
16 200111
17
CHARACTERIZING CRYSTALLINE CHROMIUM OXIDE THIN FILM GROWTH PARAMETERS
201010
18 20079
19 20238
20 20028

About Matt Gordon

Matt Gordon is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Materials Chemistry, Mechanical Engineering and Atomic and Molecular Physics, and Optics, having authored 73 papers that have together received 653 indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (19 papers), Plasma Diagnostics and Applications (13 papers), Electronic Packaging and Soldering Technologies (12 papers), Semiconductor materials and devices (9 papers), 3D IC and TSV technologies (7 papers), Adhesion, Friction, and Surface Interactions (7 papers), Advanced ceramic materials synthesis (7 papers) and Diamond and Carbon-based Materials Research (7 papers). The work is most often cited by research in Mechanics of Materials (190 citations), Ceramics and Composites (34 citations), Architecture (6 citations), Materials Chemistry (181 citations) and Electrical and Electronic Engineering (203 citations). Matt Gordon has collaborated with scholars based in United States, United Kingdom and Sweden. Frequent co-authors include C.H. Kruger, Deepak Bhat, T. G. Owano, Jonathan L. Bell, Waltraud M. Kriven, Aditya Aryasomayajula, W. F. Schmidt, John L. Shultz, Ali N. Azadani and Catherine De Wolf. Their work appears in journals such as Surface and Coatings Technology, Physics of Plasmas, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Thin Solid Films and Plasma Chemistry and Plasma Processing.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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