Countries where authors publish in Plasma Chemistry and Plasma Processing
Since Specialization
Citations
This map shows the geographic impact of research published in Plasma Chemistry and Plasma Processing. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Plasma Chemistry and Plasma Processing with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Plasma Chemistry and Plasma Processing more than expected).
Fields of papers published in Plasma Chemistry and Plasma Processing
This network shows the impact of papers published in Plasma Chemistry and Plasma Processing. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Plasma Chemistry and Plasma Processing.
About Plasma Chemistry and Plasma Processing
The 2.3k papers published in Plasma Chemistry and Plasma Processing in the last decades have received a total of 55.0k indexed citations . Papers published in Plasma Chemistry and Plasma Processing usually cover Radiology, Nuclear Medicine and Imaging (1.1k papers), Surfaces, Coatings and Films (207 papers) and Electrical and Electronic Engineering (1.3k papers) specifically the topics of Plasma Applications and Diagnostics (1.1k papers), Plasma Diagnostics and Applications (753 papers), Catalytic Processes in Materials Science (481 papers), Electrohydrodynamics and Fluid Dynamics (385 papers), Metal and Thin Film Mechanics (241 papers), Vacuum and Plasma Arcs (215 papers), Surface Modification and Superhydrophobicity (197 papers) and Diamond and Carbon-based Materials Research (195 papers). The most active scholars publishing in Plasma Chemistry and Plasma Processing are U. Kogelschatz, E. Pfender, Anthony B. Murphy, Muhammad Arif Malik, K. R. Ryan, I. C. Plumb, Maher I. Boulos, J. Mostaghimi, Junhong Chen and P. Fauchais.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive
bibliographic database. While OpenAlex provides broad and valuable coverage of the global
research landscape, it—like all bibliographic datasets—has inherent limitations. These include
incomplete records, variations in author disambiguation, differences in journal indexing, and
delays in data updates. As a result, some metrics and network relationships displayed in
Rankless may not fully capture the entirety of a scholar's output or impact.