Plasma Chemistry and Plasma Processing

55.0k citations
2.3k papers · indexed · active since 1950

Plasma Chemistry and Plasma Processing

2.2k papers receiving 52.8k citations

Peers

Plasma Chemistry and Plasma Processing
Comparison fields: 5 of 190
  • Electrical and Electronic Engineering 27.4k
  • Radiology, Nuclear Medicine and Imaging 26.2k
  • Materials Chemistry 19.6k
  • Mechanics of Materials 8.1k
  • Atomic and Molecular Physics, and Optics 7.7k
Replace Plasma Processes and Polymers with:
Plasma Processes and Polymers Germany
Plasma Sources Science and Technology United States
Journal of Synchrotron Radiation United States
Journal of Electrostatics United States
Current Applied Physics South Korea
Infrared Physics & Technology China
European Journal of Pharmaceutics and Biopharmaceutics Germany
International Journal of Mass Spectrometry United States
Nano Today China
Journal of Magnetic Resonance United States
Plasma Chemistry and Plasma Processing relative to Plasma Processes and Polymers Germany Plasma Processes and Polymers's profile →
Citations per field
00.5×3.4×
Plasma Processes and Polymers · 1×
Citations per year

Countries where authors publish in Plasma Chemistry and Plasma Processing

Since Specialization
Citations

This map shows the geographic impact of research published in Plasma Chemistry and Plasma Processing. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Plasma Chemistry and Plasma Processing with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Plasma Chemistry and Plasma Processing more than expected).

Fields of papers published in Plasma Chemistry and Plasma Processing

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers published in Plasma Chemistry and Plasma Processing. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Plasma Chemistry and Plasma Processing.

About Plasma Chemistry and Plasma Processing

The 2.3k papers published in Plasma Chemistry and Plasma Processing in the last decades have received a total of 55.0k indexed citations . Papers published in Plasma Chemistry and Plasma Processing usually cover Radiology, Nuclear Medicine and Imaging (1.1k papers), Surfaces, Coatings and Films (207 papers) and Electrical and Electronic Engineering (1.3k papers) specifically the topics of Plasma Applications and Diagnostics (1.1k papers), Plasma Diagnostics and Applications (753 papers) and Catalytic Processes in Materials Science (481 papers). The most active scholars publishing in Plasma Chemistry and Plasma Processing are U. Kogelschatz, E. Pfender, Anthony B. Murphy, Muhammad Arif Malik, K. R. Ryan, I. C. Plumb, Maher I. Boulos, J. Mostaghimi, Junhong Chen and P. Fauchais.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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