M. Záhoran
- Materials Chemistry
- Electrical and Electronic Engineering
- Biomedical Engineering
- Mechanics of Materials top 10%
- Radiology, Nuclear Medicine and Imaging top 10%
- Topics
- Plasma Diagnostics and Applications (8 papers)Metal and Thin Film Mechanics (7 papers)Plasma Applications and Diagnostics (5 papers)
- Journals
- Applied Physics LettersJournal of Colloid and Interface ScienceJournal of Materials Science
- Partner nations
- SlovakiaCzechiaUnited Kingdom
In The Last Decade
M. Záhoran
40 papers receiving 749 citations
Peers
Comparison fields: 5 of 78
- Materials Chemistry 351
- Electrical and Electronic Engineering 284
- Biomedical Engineering 147
- Mechanics of Materials 143
- Radiology, Nuclear Medicine and Imaging 114
Countries citing papers authored by M. Záhoran
This map shows the geographic impact of M. Záhoran's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Záhoran with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Záhoran more than expected).
Fields of papers citing papers by M. Záhoran
This network shows the impact of papers produced by M. Záhoran. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Záhoran. The network helps show where M. Záhoran may publish in the future.
Co-authorship network of co-authors of M. Záhoran
This figure shows the co-authorship network connecting the top 25 collaborators of M. Záhoran. A scholar is included among the top collaborators of M. Záhoran based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. Záhoran. M. Záhoran is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 0 | |
| 2 | 13 | |
| 3 | 33 | |
| 4 | 3 | |
| 5 | 9 | |
| 6 | 44 | |
| 7 | 5 | |
| 8 | 40 | |
| 9 | 7 | |
| 10 | 12 | |
| 11 | 5 | |
| 12 | 17 | |
| 13 | 15 | |
| 14 | Aluminium Surface Activation Using Atmospheric-pressure Plasma | 1 |
| 15 | REMOVAL OF COPPER METAL IONS FROM AQUEOUS SOLUTIONS BY PLASMA MADE CHITOSAN FILTER | 6 |
| 16 | 14 | |
| 17 | 2 | |
| 18 | NEGATIVE CORONA CURRENT PULSES IN ARGON AND IN MIXTURE ARGON WITH SF6 1 | 0 |
| 19 | 0 | |
| 20 | 1 |
About M. Záhoran
M. Záhoran is a scholar working on Surfaces, Coatings and Films, Bioengineering and Electrical and Electronic Engineering, having authored 43 papers that have together received 768 indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (8 papers), Metal and Thin Film Mechanics (7 papers) and Plasma Applications and Diagnostics (5 papers). The work is most often cited by research in Bioengineering (78 citations), Materials Chemistry (351 citations) and Surfaces, Coatings and Films (52 citations). M. Záhoran has collaborated with scholars based in Slovakia, Czechia and United Kingdom. Frequent co-authors include P. Kúš, Т. Роч, A. Plecenı́k, T. Pleceník, Anna Zahoranová, N. J. Mason, G. Horváth, Marián Mikula, G. Plesch and Štefan Matejčík. Their work appears in journals such as Applied Physics Letters, Journal of Colloid and Interface Science and Journal of Materials Science.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.