Licheng M. Han
- Electrical and Electronic Engineering
- Surfaces, Coatings and Films top 5%
- Materials Chemistry
- Electronic, Optical and Magnetic Materials
- Mechanics of Materials top 10%
- Co-authors
- Richard B. TimmonsDariusz BogdałJan PielichowskiZhibing HuShoumian ChenJisheng PanP.D. FooN. Balasubramanian
- Topics
- Silicone and Siloxane Chemistry (4 papers)Metal and Thin Film Mechanics (4 papers)Surface Modification and Superhydrophobicity (3 papers)
- Cited by
- Surfaces, Coatings and FilmsElectronic, Optical and Magnetic MaterialsPolymers and Plastics
- Partner nations
- United StatesPolandSingapore
In The Last Decade
Licheng M. Han
9 papers receiving 331 citations
Peers
Comparison fields: 5 of 39
- Electrical and Electronic Engineering 181
- Surfaces, Coatings and Films 118
- Materials Chemistry 117
- Electronic, Optical and Magnetic Materials 101
- Mechanics of Materials 96
Countries citing papers authored by Licheng M. Han
This map shows the geographic impact of Licheng M. Han's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Licheng M. Han with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Licheng M. Han more than expected).
Fields of papers citing papers by Licheng M. Han
This network shows the impact of papers produced by Licheng M. Han. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Licheng M. Han. The network helps show where Licheng M. Han may publish in the future.
Co-authorship network of co-authors of Licheng M. Han
This figure shows the co-authorship network connecting the top 25 collaborators of Licheng M. Han. A scholar is included among the top collaborators of Licheng M. Han based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Licheng M. Han. Licheng M. Han is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 88 | |
| 2 | 49 | |
| 3 | Pulsed plasma polymerization of pentafluorostyrene : Synthesis of low dielectric constant films | 1 |
| 4 | 6 | |
| 5 | 30 | |
| 6 | 64 | |
| 7 | 7 | |
| 8 | 76 | |
| 9 | 35 |
About Licheng M. Han
Licheng M. Han is a scholar working on Surfaces, Coatings and Films, Polymers and Plastics and Mechanics of Materials, having authored 9 papers that have together received 356 indexed citations. Recurring topics across this work include Silicone and Siloxane Chemistry (4 papers), Metal and Thin Film Mechanics (4 papers) and Surface Modification and Superhydrophobicity (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (118 citations), Electronic, Optical and Magnetic Materials (101 citations) and Polymers and Plastics (62 citations). Licheng M. Han has collaborated with scholars based in United States, Poland and Singapore. Frequent co-authors include Richard B. Timmons, Dariusz Bogdał, Jan Pielichowski, Zhibing Hu, Shoumian Chen, Jisheng Pan, P.D. Foo, N. Balasubramanian, Krishnan Rajeshwar and Yuliang Wu. Their work appears in journals such as Journal of Applied Physics, Chemistry of Materials and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.