K.F. Poole

623 total citations
59 papers, 465 citations indexed

About

K.F. Poole is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, K.F. Poole has authored 59 papers receiving a total of 465 indexed citations (citations by other indexed papers that have themselves been cited), including 54 papers in Electrical and Electronic Engineering, 15 papers in Electronic, Optical and Magnetic Materials and 10 papers in Materials Chemistry. Recurrent topics in K.F. Poole's work include Semiconductor materials and devices (27 papers), Integrated Circuits and Semiconductor Failure Analysis (22 papers) and Copper Interconnects and Reliability (15 papers). K.F. Poole is often cited by papers focused on Semiconductor materials and devices (27 papers), Integrated Circuits and Semiconductor Failure Analysis (22 papers) and Copper Interconnects and Reliability (15 papers). K.F. Poole collaborates with scholars based in United States, South Africa and Greece. K.F. Poole's co-authors include Rajendra Singh, G. F. Alapatt, Ramakrishna Podila, William R. Harrell, Colin D. McMillen, Jingyan Zhang, P.J. McNulty, Rajendra Singh, J. Narayan and Thomas Hawkins and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

K.F. Poole

57 papers receiving 429 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
K.F. Poole United States 12 357 129 75 53 32 59 465
Chun‐An Lu Taiwan 13 358 1.0× 209 1.6× 78 1.0× 70 1.3× 80 2.5× 33 480
Wenting Hou United States 13 322 0.9× 207 1.6× 129 1.7× 100 1.9× 82 2.6× 31 609
J. F. Webb Malaysia 11 329 0.9× 371 2.9× 118 1.6× 41 0.8× 134 4.2× 51 596
Xin Guo China 14 200 0.6× 277 2.1× 57 0.8× 102 1.9× 92 2.9× 58 474
Jinhyun Noh United States 13 288 0.8× 199 1.5× 173 2.3× 16 0.3× 46 1.4× 23 449
Shijie Pan China 11 228 0.6× 64 0.5× 42 0.6× 22 0.4× 12 0.4× 51 333
W. Li United States 8 182 0.5× 133 1.0× 39 0.5× 33 0.6× 15 0.5× 15 370
Liyang Zhang United States 12 503 1.4× 119 0.9× 110 1.5× 33 0.6× 28 0.9× 26 709
T. Furukawa Japan 11 488 1.4× 147 1.1× 39 0.5× 84 1.6× 42 1.3× 44 690
Yuansheng Ma United States 12 377 1.1× 75 0.6× 26 0.3× 49 0.9× 158 4.9× 41 436

Countries citing papers authored by K.F. Poole

Since Specialization
Citations

This map shows the geographic impact of K.F. Poole's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K.F. Poole with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K.F. Poole more than expected).

Fields of papers citing papers by K.F. Poole

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K.F. Poole. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K.F. Poole. The network helps show where K.F. Poole may publish in the future.

Co-authorship network of co-authors of K.F. Poole

This figure shows the co-authorship network connecting the top 25 collaborators of K.F. Poole. A scholar is included among the top collaborators of K.F. Poole based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K.F. Poole. K.F. Poole is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
McNulty, P.J., et al.. (2022). DIME-2 Flown as Part of NASA’s SET-1 on the DSX Satellite. IEEE Transactions on Nuclear Science. 69(5). 1072–1078. 2 indexed citations
2.
McMillen, Colin D., Rajendra Singh, Ramakrishna Podila, et al.. (2012). Annealing of Semiconductor Core Optical Fibers. STu1D.2–STu1D.2. 1 indexed citations
3.
McNulty, P.J., et al.. (2011). Role of Process Variation in the Radiation Response of FGMOS Devices. IEEE Transactions on Nuclear Science. 58(6). 2673–2679. 1 indexed citations
4.
McMillen, Colin D., Rajendra Singh, Ramakrishna Podila, et al.. (2011). Annealing of silicon optical fibers. Journal of Applied Physics. 110(9). 37 indexed citations
5.
McNulty, P.J., K.F. Poole, G. Cellere, et al.. (2006). Sensitivity and dynamic range of FGMOS dosemeters. Radiation Protection Dosimetry. 122(1-4). 460–462. 5 indexed citations
6.
Harrell, William R., et al.. (2006). Implications of Non-Linear Poole-Frenkel Plots on High-k Dielectric Leakage. ECS Transactions. 1(5). 705–716. 5 indexed citations
7.
Singh, Rajendra, et al.. (2004). The Effect of Interfacial Layers on High-Performance Gate Dielectrics Processed by RTP-ALD. Journal of The Electrochemical Society. 151(8). G507–G507. 5 indexed citations
10.
Singh, Rajendra, et al.. (2002). Fundamental Device Design Considerations in the Development of Disruptive Nanoelectronics. Journal of Nanoscience and Nanotechnology. 2(3). 363–368. 8 indexed citations
11.
Harrell, William R., Jingyan Zhang, & K.F. Poole. (2002). Aluminum schottky contacts to n-type 4H-SiC. Journal of Electronic Materials. 31(10). 1090–1095. 15 indexed citations
12.
Poole, K.F., et al.. (2002). An investigation of VLSI interconnect failure due to subtractive metal defects. 20. 383–387. 4 indexed citations
13.
Singh, Rajendra, et al.. (1999). Importance of rapid photothermal processing in defect reduction and process integration. IEEE Transactions on Semiconductor Manufacturing. 12(1). 36–43. 11 indexed citations
14.
Singh, Rajendra, et al.. (1998). Novel Applications of Rapid Photothermal Chemical Vapor Deposition. MRS Proceedings. 525. 2 indexed citations
15.
Singh, Rajendra, et al.. (1996). How Rapid Isothermal Processing Can be a Dominant Semiconductor Processing Technology in the 21st Century. MRS Proceedings. 429. 14 indexed citations
16.
Poole, K.F., et al.. (1995). Simulating IC reliability with emphasis on process-flaw related early failures. IEEE Transactions on Reliability. 44(4). 556–561. 6 indexed citations
17.
Poole, K.F., et al.. (1992). The effect of subtractive defects and grain size on VLSI interconnect early failure. Thin Solid Films. 220(1-2). 24–29. 9 indexed citations
18.
Poole, K.F., et al.. (1992). Influence of grain size on defect-related early failures in VLSI interconnects. 373–378. 3 indexed citations
19.
Poole, K.F.. (1981). A Novel University Approach to Teaching Microelectronics. International Journal of Electrical Engineering Education. 18(1). 67–78. 1 indexed citations
20.
Poole, K.F., et al.. (1974). Comparison of stage i of the recovery of thermal and fast neutron damage in copper, silver and platinum. Radiation Effects. 22(1). 15–27. 11 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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