K. V. Rudenko

726 total citations
136 papers, 499 citations indexed

About

K. V. Rudenko is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, K. V. Rudenko has authored 136 papers receiving a total of 499 indexed citations (citations by other indexed papers that have themselves been cited), including 105 papers in Electrical and Electronic Engineering, 33 papers in Materials Chemistry and 27 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in K. V. Rudenko's work include Semiconductor materials and devices (66 papers), Plasma Diagnostics and Applications (33 papers) and Metal and Thin Film Mechanics (21 papers). K. V. Rudenko is often cited by papers focused on Semiconductor materials and devices (66 papers), Plasma Diagnostics and Applications (33 papers) and Metal and Thin Film Mechanics (21 papers). K. V. Rudenko collaborates with scholars based in Russia, Belarus and Singapore. K. V. Rudenko's co-authors include Andrey Miakonkikh, А. В. Фадеев, V. P. Popov, В. Ф. Лукичев, Alexey S. Vishnevskiy, Mikhaı̈l R. Baklanov, В. А. Шувалов, I. E. Tyschenko, A. A. Lomov and V M Petnikova and has published in prestigious journals such as SHILAP Revista de lepidopterología, Journal of the American College of Cardiology and Molecules.

In The Last Decade

K. V. Rudenko

112 papers receiving 474 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
K. V. Rudenko Russia 12 401 137 94 85 67 136 499
Nathan Marchack United States 11 315 0.8× 95 0.7× 32 0.3× 80 0.9× 54 0.8× 33 363
Christian Tolentino Dominguez Brazil 13 109 0.3× 121 0.9× 130 1.4× 197 2.3× 20 0.3× 28 477
Hong Jing Chung Singapore 13 329 0.8× 163 1.2× 370 3.9× 437 5.1× 39 0.6× 39 700
Dušan Hemzal Czechia 9 153 0.4× 174 1.3× 177 1.9× 79 0.9× 28 0.4× 29 428
Jürgen Daniel United States 12 420 1.0× 115 0.8× 284 3.0× 39 0.5× 14 0.2× 32 604
Kyujin Choi South Korea 12 227 0.6× 142 1.0× 132 1.4× 86 1.0× 15 0.2× 30 439
Hangbo Zhou Singapore 19 273 0.7× 761 5.6× 49 0.5× 87 1.0× 19 0.3× 31 908
Oleksandr I. Datsenko Ukraine 14 389 1.0× 448 3.3× 165 1.8× 125 1.5× 9 0.1× 47 678

Countries citing papers authored by K. V. Rudenko

Since Specialization
Citations

This map shows the geographic impact of K. V. Rudenko's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. V. Rudenko with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. V. Rudenko more than expected).

Fields of papers citing papers by K. V. Rudenko

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. V. Rudenko. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. V. Rudenko. The network helps show where K. V. Rudenko may publish in the future.

Co-authorship network of co-authors of K. V. Rudenko

This figure shows the co-authorship network connecting the top 25 collaborators of K. V. Rudenko. A scholar is included among the top collaborators of K. V. Rudenko based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K. V. Rudenko. K. V. Rudenko is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
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Miakonkikh, Andrey, et al.. (2025). On relationships between gas-phase and heterogeneous process kinetics in CF4 + H2 + Ar plasma. Vacuum. 234. 114044–114044. 1 indexed citations
3.
Miakonkikh, Andrey, et al.. (2025). PLASMA PARAMETERS AND FLUORINE ATOM DENSITY IN SF6 + Ar + He GAS MIXTURE: EFFECTS OF Ar/He MIXING RATIO, PRESSURE AND INPUT POWER. IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENIY KHIMIYA KHIMICHESKAYA TEKHNOLOGIYA. 68(3). 42–49. 1 indexed citations
4.
Efremov, Alexander, et al.. (2024). Gas Phase Composition and Kinetics of Fluorine Atoms in SF6 Plasma. Russian Microelectronics. 53(6). 582–591.
5.
Rudenko, K. V., et al.. (2024). Gravity-Inertial Laser Detector of Astro-Geophysical Disturbances in the Underground Laboratory of the BNO INR RAS. Physics of Atomic Nuclei. 87(12). 1836–1842.
6.
Rudenko, K. V., et al.. (2024). Low Resistance State Degradation during Endurance Measurements in HfO2/HfOXNY-Based Structures. Semiconductors. 58(3). 250–253. 1 indexed citations
7.
Miakonkikh, Andrey, et al.. (2023). Investigation of Fluorocarbon Film Deposition from Ar/CF4/H2 Plasma for the Implementation of the Atomic Layer Etching Process. High Energy Chemistry. 57(S1). S100–S104. 2 indexed citations
8.
Miakonkikh, Andrey, et al.. (2023). Transition between resistive switching modes in asymmetric HfO2-based structures. Microelectronic Engineering. 275. 111983–111983. 10 indexed citations
9.
Miakonkikh, Andrey, et al.. (2023). Cryo Plasma Etching of Porous Low-k Dielectrics. High Energy Chemistry. 57(S1). S115–S118. 2 indexed citations
10.
Miakonkikh, Andrey, et al.. (2022). A comparison of CF4, CBrF3 and C2Br2F4 plasmas: Physical parameters and densities of atomic species. Vacuum. 200. 110991–110991. 6 indexed citations
11.
Miakonkikh, Andrey, et al.. (2022). Selective atomic layer etching of Al2O3, AlNx and HfO2 in conventional ICP etching tool. Vacuum. 207. 111585–111585. 11 indexed citations
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Miakonkikh, Andrey, et al.. (2022). Cobalt subtractive etch for advanced interconnects. 55–55. 3 indexed citations
14.
Miakonkikh, Andrey, et al.. (2021). Plasma Enhanced Atomic Layer Deposition of Ruthenium Films Using Ru(EtCp)2 Precursor. Coatings. 11(2). 117–117. 6 indexed citations
15.
16.
Popov, V. P., А. К. Гутаковский, I. E. Tyschenko, et al.. (2021). Robust semiconductor-on-ferroelectric structures with hafnia–zirconia–alumina UTBOX stacks compatible with CMOS technology. Journal of Physics D Applied Physics. 54(22). 225101–225101. 7 indexed citations
17.
Malsagova, Kristina A., Tatyana O. Pleshakova, Andrey F. Kozlov, et al.. (2018). Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection. Biosensors. 8(3). 72–72. 15 indexed citations
18.
Rudenko, K. V., et al.. (2016). Perspective Method of Betavoltaic Converter Creation. Journal of Nano- and Electronic Physics. 8(2). 2022–1. 1 indexed citations
19.
Miakonkikh, Andrey, et al.. (2016). Low-damage plasma etching of porous low-k films in CF3Br and CF4 plasmas under low-temperature conditions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10224. 1022420–1022420. 1 indexed citations
20.
Rudenko, K. V., et al.. (2015). TCT-746 Transcatheter Alcohol Septal Ablation in Patient with Hypertrophic Obstructive Cardiomyopathy: the Immediate and Long-Term Results. Journal of the American College of Cardiology. 66(15). B304–B305. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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