K. Goedicke

1.5k total citations
39 papers, 1.3k citations indexed

About

K. Goedicke is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Materials Chemistry. According to data from OpenAlex, K. Goedicke has authored 39 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 34 papers in Mechanics of Materials, 20 papers in Electrical and Electronic Engineering and 14 papers in Materials Chemistry. Recurrent topics in K. Goedicke's work include Metal and Thin Film Mechanics (34 papers), Diamond and Carbon-based Materials Research (13 papers) and High-Temperature Coating Behaviors (12 papers). K. Goedicke is often cited by papers focused on Metal and Thin Film Mechanics (34 papers), Diamond and Carbon-based Materials Research (13 papers) and High-Temperature Coating Behaviors (12 papers). K. Goedicke collaborates with scholars based in Germany and Russia. K. Goedicke's co-authors include Peter Frach, S. Schiller, Hagen Bartzsch, O. Zywitzki, Fred Fietzke, J. Reschke, Daniel Glöß, V. W. J. H. Kirchhoff, Susanne Schneider and U. Heisig and has published in prestigious journals such as Materials Science and Engineering A, Thin Solid Films and Surface and Coatings Technology.

In The Last Decade

K. Goedicke

37 papers receiving 1.2k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
K. Goedicke Germany 19 732 717 695 183 135 39 1.3k
S. Berg Sweden 17 745 1.0× 877 1.2× 912 1.3× 169 0.9× 209 1.5× 33 1.4k
Peter Frach Germany 22 750 1.0× 429 0.6× 600 0.9× 344 1.9× 101 0.7× 70 1.3k
O. Zywitzki Germany 18 652 0.9× 466 0.6× 494 0.7× 218 1.2× 45 0.3× 51 1.1k
Tomas Nyberg Sweden 25 1.3k 1.8× 1.2k 1.6× 1.2k 1.7× 170 0.9× 258 1.9× 81 2.1k
Michael Vergöhl Germany 14 536 0.7× 335 0.5× 459 0.7× 115 0.6× 136 1.0× 68 920
R.P. Howson United Kingdom 21 780 1.1× 516 0.7× 801 1.2× 246 1.3× 397 2.9× 72 1.5k
K.A. Pischow Portugal 17 798 1.1× 863 1.2× 491 0.7× 95 0.5× 68 0.5× 43 1.4k
Chang‐Pin Chou Taiwan 21 682 0.9× 377 0.5× 520 0.7× 339 1.9× 153 1.1× 68 1.3k
Seunghee Han South Korea 18 482 0.7× 347 0.5× 348 0.5× 143 0.8× 133 1.0× 73 930
M. Andritschky Portugal 29 1.3k 1.8× 1.1k 1.6× 729 1.0× 177 1.0× 137 1.0× 59 2.1k

Countries citing papers authored by K. Goedicke

Since Specialization
Citations

This map shows the geographic impact of K. Goedicke's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Goedicke with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Goedicke more than expected).

Fields of papers citing papers by K. Goedicke

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. Goedicke. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Goedicke. The network helps show where K. Goedicke may publish in the future.

Co-authorship network of co-authors of K. Goedicke

This figure shows the co-authorship network connecting the top 25 collaborators of K. Goedicke. A scholar is included among the top collaborators of K. Goedicke based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K. Goedicke. K. Goedicke is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Bartzsch, Hagen, et al.. (2004). Silicon oxynitride rugate filters grown by reactive pulse magnetron sputtering. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5250. 502–502. 3 indexed citations
2.
Bartzsch, Hagen, Peter Frach, & K. Goedicke. (2003). Optical, electrical and acoustic films deposited by the Double Ring Magnetron. Vakuum in Forschung und Praxis. 15(3). 122–126.
3.
Frach, Peter, Daniel Glöß, K. Goedicke, Matthias Fahland, & Wolf‐Michael Gnehr. (2003). High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications. Thin Solid Films. 445(2). 251–258. 34 indexed citations
4.
Bartzsch, Hagen, et al.. (2003). Properties of SiO2 and Al2O3 films for electrical insulation applications deposited by reactive pulse magnetron sputtering. Surface and Coatings Technology. 174-175. 774–778. 111 indexed citations
5.
Bartzsch, Hagen, et al.. (2002). Ensuring long-term stability of process and film parameters during target lifetime in reactive magnetron sputtering. Surface and Coatings Technology. 150(1). 88–94. 10 indexed citations
6.
Frach, Peter, et al.. (2001). A versatile coating tool for reactive in-line sputtering in different pulse modes. Surface and Coatings Technology. 142-144. 628–634. 20 indexed citations
7.
8.
Bartzsch, Hagen, et al.. (1999). Different pulse techniques for stationary reactive sputtering with double ring magnetron. Surface and Coatings Technology. 120-121. 723–727. 17 indexed citations
9.
Reschke, J., et al.. (1998). Transformer-free semiconductor switches for the energization of a pulsed PVD plasma. Surface and Coatings Technology. 98(1-3). 1240–1244. 1 indexed citations
10.
Frach, Peter, et al.. (1997). The double ring magnetron process module —a tool for stationary deposition of metals, insulators and reactive sputtered compounds. Surface and Coatings Technology. 90(1-2). 75–81. 24 indexed citations
11.
Zywitzki, O., et al.. (1996). Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering. Surface and Coatings Technology. 82(1-2). 169–175. 114 indexed citations
12.
Schiller, N., J. Reschke, K. Goedicke, & M. Neumann. (1996). Application of the magnetron activated deposition process (MAD-process) to coat polymer films with alumina in web coaters. Surface and Coatings Technology. 86-87. 776–782. 4 indexed citations
13.
Schiller, S., et al.. (1995). Potenzen des Puls‐Magnetron‐Sputterns (PMS). Vakuum in Forschung und Praxis. 7(4). 286–292. 3 indexed citations
14.
Schiller, S., et al.. (1995). Large-area pretreatment for physical vapor deposition. Surface and Coatings Technology. 76-77. 725–730. 2 indexed citations
15.
Goedicke, K., Bert Scheffel, & S. Schiller. (1994). Plasma-activated high rate electron beam evaporation using a spotless cathodic arc. Surface and Coatings Technology. 68-69. 799–803. 26 indexed citations
16.
Schiller, S., et al.. (1993). Plasma-activated high-rate electron-beam evaporation for coating metal strips. Materials Science and Engineering A. 163(2). 149–156. 5 indexed citations
17.
Schiller, S., U. Heisig, K. Goedicke, H. Bilz, & K. Steinfelder. (1982). Methods and applications of plasmatron high rate sputtering in microelectronics, hybrid microelectronics and electronics. Thin Solid Films. 92(1-2). 81–98. 15 indexed citations
18.
Schiller, S., U. Heisig, & K. Goedicke. (1978). The role of plasmatron/magnetron systems in physical vapor deposition techniques. Thin Solid Films. 54(1). 33–47. 22 indexed citations
19.
Schiller, S., et al.. (1977). Comparison between electron beam evaporation and high rate sputtering with a plasmatron. Thin Solid Films. 45(2). 385–385. 1 indexed citations
20.
Schiller, S., U. Heisig, & K. Goedicke. (1975). Alternating ion plating—A method of high-rate ion vapor deposition. Journal of Vacuum Science and Technology. 12(4). 858–864. 18 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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