Jun Choi
Impact in
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- Plasma Applications and Diagnostics
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- Plasma Diagnostics and Applications
- Electrohydrodynamics and Fluid Dynamics
- Aerosol Filtration and Electrostatic Precipitation
Papers in
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- Plasma Diagnostics and Applications 10
- Electrostatic Discharge in Electronics 3
- Aerosol Filtration and Electrostatic Precipitation 3
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- Plasma Applications and Diagnostics 10
- Co-authors
- Felipe Iza (2 shared papers)Jae Koo Lee (4 shared papers)Kyong‐Tai Kim (3 shared papers)Chang‐Mo Ryu (1 shared paper)Kyung Chul Woo (2 shared papers)Abdel‐Aleam H. Mohamed (2 shared papers)Hyeok‐jin Kwon (1 shared paper)Sangmoon Lee (1 shared paper)
- Journals
- IEEE Transactions on Plasma Science (4 papers)Japanese Journal of Applied Physics (2 papers)Fibers and Polymers (1 paper)Physics of Plasmas (1 paper)Plasma Sources Science and Technology (1 paper)
- Partner nations
- South KoreaSaudi ArabiaUnited Kingdom
In The Last Decade
Jun Choi
17 papers receiving 401 citations
Peers
Comparison fields: 5 of 63
- Radiology, Nuclear Medicine and Imaging 321
- Electrical and Electronic Engineering 317
- Surfaces, Coatings and Films 36
- Atomic and Molecular Physics, and Optics 46
- Computer Networks and Communications 32
Countries citing papers authored by Jun Choi
This map shows the geographic impact of Jun Choi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jun Choi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jun Choi more than expected).
Fields of papers citing papers by Jun Choi
This network shows the impact of papers produced by Jun Choi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jun Choi. The network helps show where Jun Choi may publish in the future.
Co-authors
The 25 scholars most cited alongside Jun Choi, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2009 | 121 | |
| 2 | 2007 | 77 | |
| 3 | 2010 | 67 | |
| 4 | 2010 | 45 | |
| 5 | 2010 | 27 | |
| 6 | 2017 | 17 | |
| 7 | 2009 | 16 | |
| 8 | 2021 | 11 | |
| 9 | 2016 | 8 | |
| 10 | 2024 | 6 | |
| 11 | 2022 | 5 | |
| 12 | 2018 | 3 | |
| 13 | IRON-PHOSPHATE GLASS FOR IMMOBILIZATION OF RADIOACTIVE TECHNETIUM | 2012 | 3 |
| 14 | 2020 | 2 | |
| 15 | Sintering and properties of high carbon and Mo-alloyed P/M steel | 1991 | 2 |
| 16 | 2021 | 2 | |
| 17 | 2023 | 1 | |
| 18 | 2025 | 0 | |
| 19 | 2023 | 0 |
About Jun Choi
Jun Choi is a scholar working on Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging, Biomedical Engineering, Materials Chemistry and Control and Systems Engineering, having authored 19 papers that have together received 413 indexed citations. Recurring topics across this work include Plasma Applications and Diagnostics (10 papers), Plasma Diagnostics and Applications (10 papers), Electrostatic Discharge in Electronics (3 papers), Aerosol Filtration and Electrostatic Precipitation (3 papers), Advanced Sensor and Energy Harvesting Materials (2 papers), Tribology and Wear Analysis (2 papers), Luminescence and Fluorescent Materials (1 paper) and Metal Alloys Wear and Properties (1 paper). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (321 citations), Electrical and Electronic Engineering (317 citations), Surfaces, Coatings and Films (36 citations), Atomic and Molecular Physics, and Optics (46 citations) and Computer Networks and Communications (32 citations). Jun Choi has collaborated with scholars based in South Korea, Saudi Arabia and United Kingdom. Frequent co-authors include Felipe Iza, Jae Koo Lee, Kyong‐Tai Kim, Chang‐Mo Ryu, Kyung Chul Woo, Abdel‐Aleam H. Mohamed, Hyeok‐jin Kwon, Sangmoon Lee, Hyun Wook Lee and Sung Hyun Kim. Their work appears in journals such as IEEE Transactions on Plasma Science, Japanese Journal of Applied Physics, Fibers and Polymers, Physics of Plasmas and Plasma Sources Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.