T. H. Chung
- Electrical and Electronic Engineering top 5%
- Radiology, Nuclear Medicine and Imaging top 1%
- Materials Chemistry
- Mechanics of Materials top 5%
- Atomic and Molecular Physics, and Optics top 10%
- Co-authors
- Sun Ja KimHea Min JohSun-Hee LeemSun Hyoung BaeHyun Jin YoonAra JoJin Woong ChungTae‐Hong Kang
- Topics
- Plasma Diagnostics and Applications (57 papers)Plasma Applications and Diagnostics (43 papers)Electrohydrodynamics and Fluid Dynamics (18 papers)
- Cited by
- Radiology, Nuclear Medicine and ImagingSurfaces, Coatings and FilmsElectrical and Electronic Engineering
- Partner nations
- South KoreaUnited StatesChina
In The Last Decade
T. H. Chung
83 papers receiving 2.0k citations
Peers
Comparison fields: 5 of 99
- Electrical and Electronic Engineering 1.4k
- Radiology, Nuclear Medicine and Imaging 1.3k
- Materials Chemistry 295
- Mechanics of Materials 266
- Atomic and Molecular Physics, and Optics 234
Countries citing papers authored by T. H. Chung
This map shows the geographic impact of T. H. Chung's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. H. Chung with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. H. Chung more than expected).
Fields of papers citing papers by T. H. Chung
This network shows the impact of papers produced by T. H. Chung. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. H. Chung. The network helps show where T. H. Chung may publish in the future.
Co-authorship network of co-authors of T. H. Chung
This figure shows the co-authorship network connecting the top 25 collaborators of T. H. Chung. A scholar is included among the top collaborators of T. H. Chung based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. H. Chung. T. H. Chung is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 2 | |
| 2 | 8 | |
| 3 | 73 | |
| 4 | 19 | |
| 5 | 28 | |
| 6 | 196 | |
| 7 | 26 | |
| 8 | 52 | |
| 9 | 19 | |
| 10 | 37 | |
| 11 | 7 | |
| 12 | 5 | |
| 13 | Electrical and Optical Properties of Nitrogen-Incorporated Silicon-Oxide Films by Using Plasma-Enhanced Chemical-Vapor Deposition with Tetramethoxysilane /N2O/NH3 Gas | 3 |
| 14 | 1 | |
| 15 | 21 | |
| 16 | 12 | |
| 17 | Electrical and structural properties of Si nanocrystals prepared by ion-beam-assisted electron beam deposition | 1 |
| 18 | 5 | |
| 19 | 9 | |
| 20 | 4 |
About T. H. Chung
T. H. Chung is a scholar working on Radiology, Nuclear Medicine and Imaging, Electrical and Electronic Engineering and Mechanics of Materials, having authored 85 papers that have together received 2.0k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (57 papers), Plasma Applications and Diagnostics (43 papers) and Electrohydrodynamics and Fluid Dynamics (18 papers). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (1.3k citations), Surfaces, Coatings and Films (189 citations) and Electrical and Electronic Engineering (1.4k citations). T. H. Chung has collaborated with scholars based in South Korea, United States and China. Frequent co-authors include Sun Ja Kim, Hea Min Joh, Sun-Hee Leem, Sun Hyoung Bae, Hyun Jin Yoon, Ara Jo, Jin Woong Chung, Tae‐Hong Kang, D. C. Seo and Miaojia Song. Their work appears in journals such as Applied Physics Letters, PLoS ONE and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.