Joon-Min Park

435 total citations
13 papers, 66 citations indexed

About

Joon-Min Park is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Automotive Engineering. According to data from OpenAlex, Joon-Min Park has authored 13 papers receiving a total of 66 indexed citations (citations by other indexed papers that have themselves been cited), including 11 papers in Electrical and Electronic Engineering, 5 papers in Biomedical Engineering and 1 paper in Automotive Engineering. Recurrent topics in Joon-Min Park's work include Advancements in Photolithography Techniques (9 papers), 3D IC and TSV technologies (5 papers) and Advanced Surface Polishing Techniques (4 papers). Joon-Min Park is often cited by papers focused on Advancements in Photolithography Techniques (9 papers), 3D IC and TSV technologies (5 papers) and Advanced Surface Polishing Techniques (4 papers). Joon-Min Park collaborates with scholars based in South Korea. Joon-Min Park's co-authors include Hye-Keun Oh, Kwon‐Shik Park, Hoon Jeong, Junho Lee, Jooyoo Hong, Yong‐Kee Hwang, Junho Cho, Ilsin An, Eun‐jin Kim and Kwanjung Yee and has published in prestigious journals such as Japanese Journal of Applied Physics, Current Nanoscience and SAE International Journal of Passenger Cars - Mechanical Systems.

In The Last Decade

Joon-Min Park

12 papers receiving 63 citations

Peers

Joon-Min Park
Blair Unger United States
J. Florkey United States
Ned Ferraro United States
Junhao Hu China
Joon-Min Park
Citations per year, relative to Joon-Min Park Joon-Min Park (= 1×) peers Kelly L. Stinson-Bagby

Countries citing papers authored by Joon-Min Park

Since Specialization
Citations

This map shows the geographic impact of Joon-Min Park's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Joon-Min Park with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Joon-Min Park more than expected).

Fields of papers citing papers by Joon-Min Park

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Joon-Min Park. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Joon-Min Park. The network helps show where Joon-Min Park may publish in the future.

Co-authorship network of co-authors of Joon-Min Park

This figure shows the co-authorship network connecting the top 25 collaborators of Joon-Min Park. A scholar is included among the top collaborators of Joon-Min Park based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Joon-Min Park. Joon-Min Park is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

13 of 13 papers shown
1.
Cho, Junho, et al.. (2018). Comparison of Various Drag Reduction Devices and Their Aerodynamic Effects on the DrivAer Model. SAE International Journal of Passenger Cars - Mechanical Systems. 11(3). 225–238. 9 indexed citations
2.
Park, Joon-Min, et al.. (2014). Effect of Micro Ti and TiO<sub>2</sub> P-25 Nano Powder Addition on Mechanical Properties of TiO<sub>2</sub> Nanopowders. Current Nanoscience. 10(1). 3–6. 1 indexed citations
3.
Lee, Junho, et al.. (2012). 58.2: Distinguished Paper : Implementation of 240Hz 55‐inch Ultra Definition LCD Driven by a‐IGZO Semiconductor TFT with Copper Signal Lines. SID Symposium Digest of Technical Papers. 43(1). 784–787. 33 indexed citations
4.
Park, Joon-Min, et al.. (2009). Reduction of line width and edge roughness by resist reflow process for extreme ultra-violet lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72732D–72732D. 1 indexed citations
5.
Park, Joon-Min, et al.. (2009). Position Shift Analysis in Resist Reflow Process for Sub-50 nm Contact Hole. Japanese Journal of Applied Physics. 48(9). 96502–96502. 2 indexed citations
6.
Park, Joon-Min, et al.. (2009). 32 nm half pitch formation with high numerical aperture single exposure. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72741Z–72741Z. 2 indexed citations
7.
Park, Joon-Min, et al.. (2009). Temperature and critical dimension variation in a single wafer on hot plate due to non-uniform heat source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72732Z–72732Z.
8.
Park, Joon-Min, et al.. (2009). 32 nm Half Pitch Formation with High-Numerical-Aperture Single Exposure. Japanese Journal of Applied Physics. 48(10). 106501–106501. 2 indexed citations
9.
Park, Joon-Min, Young‐Min Kang, Jooyoo Hong, & Hye-Keun Oh. (2008). Critical Dimension Control for 32 nm Node Random Contact Hole Array Using Resist Reflow Process. Japanese Journal of Applied Physics. 47(2R). 1158–1158. 1 indexed citations
10.
Park, Joon-Min, Young-Sang Kim, Heejun Jeong, Ilsin An, & Hye-Keun Oh. (2008). Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process. Japanese Journal of Applied Physics. 47(11R). 8611–8611. 1 indexed citations
11.
Park, Joon-Min, et al.. (2008). Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes. Japanese Journal of Applied Physics. 47(6S). 4940–4940. 1 indexed citations
12.
Park, Joon-Min, Eun‐jin Kim, Jooyoo Hong, Ilsin An, & Hye-Keun Oh. (2007). Photoresist Adhesion Effect of Resist Reflow Process. Japanese Journal of Applied Physics. 46(9R). 5738–5738. 10 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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