Jon Orloff

1.3k total citations
30 papers, 950 citations indexed

About

Jon Orloff is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Computational Mechanics. According to data from OpenAlex, Jon Orloff has authored 30 papers receiving a total of 950 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electrical and Electronic Engineering, 14 papers in Surfaces, Coatings and Films and 10 papers in Computational Mechanics. Recurrent topics in Jon Orloff's work include Electron and X-Ray Spectroscopy Techniques (14 papers), Ion-surface interactions and analysis (10 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). Jon Orloff is often cited by papers focused on Electron and X-Ray Spectroscopy Techniques (14 papers), Ion-surface interactions and analysis (10 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). Jon Orloff collaborates with scholars based in United States, Australia and China. Jon Orloff's co-authors include L. W. Swanson, M. Utlaut, Chandrabhas Narayana, Arthur L. Ruoff, Huan Luo, Jabez J. McClelland, Xuefeng Liu, A. Kutyrev, Samuel H. Moseley and Klaus Edinger and has published in prestigious journals such as Nature, Nano Letters and Review of Scientific Instruments.

In The Last Decade

Jon Orloff

30 papers receiving 900 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Jon Orloff United States 10 395 348 290 244 234 30 950
Ben Torralva United States 17 138 0.3× 272 0.8× 259 0.9× 524 2.1× 174 0.7× 38 1.1k
Mihiro Yanagihara Japan 20 281 0.7× 169 0.5× 337 1.2× 288 1.2× 157 0.7× 98 1.1k
D. Ghose India 19 501 1.3× 703 2.0× 152 0.5× 554 2.3× 112 0.5× 82 1.0k
T. S. Noggle United States 20 294 0.7× 528 1.5× 247 0.9× 429 1.8× 96 0.4× 50 1.1k
Farhad Salmassi United States 19 471 1.2× 148 0.4× 417 1.4× 176 0.7× 173 0.7× 75 1.3k
J. Teichert Germany 18 893 2.3× 369 1.1× 504 1.7× 270 1.1× 358 1.5× 129 1.3k
F. Bonfigli Italy 19 348 0.9× 218 0.6× 163 0.6× 296 1.2× 223 1.0× 107 1.1k
O. Bostanjoglo Germany 18 163 0.4× 257 0.7× 383 1.3× 232 1.0× 160 0.7× 93 974
Heinz Niedrig Germany 13 283 0.7× 135 0.4× 160 0.6× 215 0.9× 69 0.3× 62 719
J. R. A. Cleaver United Kingdom 20 787 2.0× 256 0.7× 561 1.9× 306 1.3× 177 0.8× 91 1.3k

Countries citing papers authored by Jon Orloff

Since Specialization
Citations

This map shows the geographic impact of Jon Orloff's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jon Orloff with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jon Orloff more than expected).

Fields of papers citing papers by Jon Orloff

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jon Orloff. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jon Orloff. The network helps show where Jon Orloff may publish in the future.

Co-authorship network of co-authors of Jon Orloff

This figure shows the co-authorship network connecting the top 25 collaborators of Jon Orloff. A scholar is included among the top collaborators of Jon Orloff based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jon Orloff. Jon Orloff is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Orloff, Jon. (2011). Gertrude Rempfer and the development of high resolution focused ion beam technology. Ultramicroscopy. 119. 5–8. 1 indexed citations
2.
Knuffman, B., et al.. (2010). A Focused Chromium Ion Beam | NIST. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 28(6). 1 indexed citations
3.
Orloff, Jon. (2010). Measuring the beam size of a focused ion beam (FIB) system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7729. 77290C–77290C. 9 indexed citations
4.
Orloff, Jon, et al.. (2008). Magneto-Optical-Trap-Based, High Brightness Ion Source for Use as a Nanoscale Probe. Nano Letters. 8(9). 2844–2850. 47 indexed citations
5.
Orloff, Jon, et al.. (2003). Focused ion beam created periodic structures on tapered optical fibers. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(6). 2711–2714. 2 indexed citations
6.
Stanishevsky, Andrei, et al.. (2003). Testing new chemistries for mask repair with focused ion beam gas assisted etching. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(6). 3067–3071. 9 indexed citations
7.
Dragt, Alex J. & Jon Orloff. (2003). Proceedings of the Sixth International Conference on Charged Particle Optics (CPO-6). Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 519(1-2). v–v. 1 indexed citations
8.
Orloff, Jon, Chandrabhas Narayana, & Arthur L. Ruoff. (2000). Use of focused ion beams for making tiny sample holes in gaskets for diamond anvil cells. Review of Scientific Instruments. 71(1). 216–219. 8 indexed citations
9.
Moseley, Samuel H., et al.. (2000). <title>Fracture tests of etched components using a focused ion beam machine</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4180. 40–48. 9 indexed citations
10.
Moseley, Samuel H., et al.. (1999). <title>Some aspects on the mechanical analysis of microshutters</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3875. 210–220. 11 indexed citations
11.
Moseley, Samuel H., A. Kutyrev, Charles W. Bowers, et al.. (1999). <title>Programmable two-dimensional microshutter arrays</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3878. 392–397. 6 indexed citations
12.
Narayana, Chandrabhas, Huan Luo, Jon Orloff, & Arthur L. Ruoff. (1998). Solid hydrogen at 342 GPa: no evidence for an alkali metal. Nature. 393(6680). 46–49. 202 indexed citations
13.
Ruoff, Arthur L., Jon Orloff, & Chandrabhas Narayana. (1998). The Behavior of Solid Hydrogen at 342GPa.. The Review of High Pressure Science and Technology. 7. 772–774. 1 indexed citations
14.
Brasunas, J. C., et al.. (1998). <title>Thermoelectric infrared detectors with improved mechanical stability for the composite infrared spectrometer (CIRS) far-infrared focal plane</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3435. 126–135. 1 indexed citations
15.
Edinger, Klaus, et al.. (1997). Development of a high brightness gas field ion source. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(6). 2365–2368. 11 indexed citations
16.
Tang, Tiantong, Jon Orloff, & Li Wang. (1996). Modeling and design of space charge lenses/aberration correctors for focused ion beam systems. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(1). 80–84. 3 indexed citations
17.
Orloff, Jon, L. W. Swanson, & M. Utlaut. (1996). Fundamental limits to imaging resolution for focused ion beams. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 3759–3763. 70 indexed citations
18.
Wang, Li, Jon Orloff, & Tiantong Tang. (1995). Study of space-charge devices for focused ion beam systems. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2414–2418. 1 indexed citations
19.
Orloff, Jon, et al.. (1990). Parametric modeling of focused ion beam induced etching. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1814–1819. 5 indexed citations
20.
Orloff, Jon. (1987). An optimized two lens optical column for use with a liquid metal ion source. Microelectronic Engineering. 6(1-4). 327–332. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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