Jon F. Ihlefeld

7.8k citations
168 papers · 5.3k indexed · h-index 38

Jon F. Ihlefeld

156 papers receiving 5.1k citations

Peers

Jon F. Ihlefeld
Comparison fields: 5 of 73
  • Electronic, Optical and Magnetic Materials 2.3k
  • Materials Chemistry 3.8k
  • Electrical and Electronic Engineering 2.3k
  • Biomedical Engineering 1.2k
  • Condensed Matter Physics 279
Replace Massimiliano Stengel with:
Massimiliano Stengel Spain
Markus R. Wagner Germany
Jiawang Hong China
Duhee Yoon South Korea
Toshihide Nabatame Japan
Pavlo Zubko Switzerland
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Sean W. King United States
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Citations per field
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Citations per year

Countries citing papers authored by Jon F. Ihlefeld

Since Specialization
Citations

This map shows the geographic impact of Jon F. Ihlefeld's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jon F. Ihlefeld with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jon F. Ihlefeld more than expected).

Fields of papers citing papers by Jon F. Ihlefeld

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jon F. Ihlefeld. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jon F. Ihlefeld. The network helps show where Jon F. Ihlefeld may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Jon F. Ihlefeld, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Jon F. Ihlefeld Line = papers co-authored together Jon F. Ihlefeld links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
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1 20250
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14 202128
15 20215
16 202134
17 202022
18 20184
19 201416
20
Synthesis and Properties of Barium Titanate Solid Solution Thin Films on Copper Substrates
20067

About Jon F. Ihlefeld

Jon F. Ihlefeld is a scholar working on Materials Chemistry, Electronic, Optical and Magnetic Materials and Electrical and Electronic Engineering, having authored 168 papers that have together received 5.3k indexed citations. Recurring topics across this work include Ferroelectric and Piezoelectric Materials (79 papers), Semiconductor materials and devices (46 papers), Ferroelectric and Negative Capacitance Devices (43 papers), Electronic and Structural Properties of Oxides (29 papers), Thermal properties of materials (23 papers), Acoustic Wave Resonator Technologies (21 papers), MXene and MAX Phase Materials (21 papers) and Multiferroics and related materials (21 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (2.3k citations), Materials Chemistry (3.8k citations) and Electrical and Electronic Engineering (2.3k citations). Jon F. Ihlefeld has collaborated with scholars based in United States, Germany and Australia. Frequent co-authors include Jon‐Paul Maria, Patrick E. Hopkins, Darrell G. Schlom, Paul G. Clem, R. Ramesh, William Borland, J. L. Musfeldt, Samantha T. Jaszewski, Shelby S. Fields and Geoff L. Brennecka. Their work appears in journals such as Nature, Physical Review Letters and Advanced Materials.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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