Jarmo Skarp

931 total citations
20 papers, 780 citations indexed

About

Jarmo Skarp is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Jarmo Skarp has authored 20 papers receiving a total of 780 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 9 papers in Materials Chemistry and 3 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Jarmo Skarp's work include Semiconductor materials and devices (8 papers), Chalcogenide Semiconductor Thin Films (7 papers) and Quantum Dots Synthesis And Properties (5 papers). Jarmo Skarp is often cited by papers focused on Semiconductor materials and devices (8 papers), Chalcogenide Semiconductor Thin Films (7 papers) and Quantum Dots Synthesis And Properties (5 papers). Jarmo Skarp collaborates with scholars based in Finland, Sweden and United States. Jarmo Skarp's co-authors include Markku Leskelä, P. Soininen, Mikko Ritala, Tuomo Suntola, C.A.H.A. Mutsaers, Markku Tammenmaa, Sun Jin Yun, Hye Rim Kim, Kyungho Lee and Stefan Bengtsson and has published in prestigious journals such as Journal of Applied Physics, Applied Surface Science and IEEE Transactions on Electron Devices.

In The Last Decade

Jarmo Skarp

20 papers receiving 752 citations

Peers

Countries citing papers authored by Jarmo Skarp

Since Specialization

Citations

This map shows the geographic impact of Jarmo Skarp's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jarmo Skarp with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jarmo Skarp more than expected).

Fields of papers citing papers by Jarmo Skarp

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jarmo Skarp. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jarmo Skarp. The network helps show where Jarmo Skarp may publish in the future.

Co-authorship network of co-authors of Jarmo Skarp

This figure shows the co-authorship network connecting the top 25 collaborators of Jarmo Skarp. A scholar is included among the top collaborators of Jarmo Skarp based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jarmo Skarp. Jarmo Skarp is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Excellent passivation and low reflectivity with atomic layer deposited bilayer coatings for n-type silicon solar cells 2013 ·Thin Solid Films ·Benjamin G. Lee, Shuo Li, Guillaume von Gastrow, Marko Yli‐Koski, Hele Savin, (unknown), Jarmo Skarp, Sukgeun Choi, Howard M. Branz	9
2	Excellent passivation and low reflectivity Al<inf>2</inf>O<inf>3</inf> /TiO<inf>2</inf> bilayer coatings for n-wafer silicon solar cells 2012 ·Benjamin G. Lee, Jarmo Skarp, (unknown), Shuo Li, Sukgeun Choi, Howard M. Branz	18
3	Silicon Surface Passivation by Al2O3: Effect of ALD Reactants 2011 ·Energy Procedia ·Päivikki Repo, H. Talvitie, Shuo Li, Jarmo Skarp, Hele Savin	36
4	Application of ZnO<inf>1−x</inf>S<inf>x</inf> as window layer in cadmium telluride solar cells 2010 ·DORA Empa (Swiss Federal Laboratories for Materials Science and Technology (Empa)) ·J. Perrenoud, Stephan Buecheler, Lukas Kranz, Carolin M. Sutter‐Fella, Jarmo Skarp, Ayodhya N. Tiwari	6
5	High Throughput ALD Production Systems for Cadmium Free CIGS and Enhanced Efficiency c-Si Solar Cells 2010 ·ECS Transactions ·Jarmo Skarp	5
6	CIS solar cells with ZnO windows deposited by ALE 2002 ·Lars Stolt, Jonas Hedström, Jarmo Skarp	4
7	Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition 1999 ·Chemical Vapor Deposition ·Mikko Ritala, Markku Leskelä, (unknown), C.A.H.A. Mutsaers, P. Soininen, Jarmo Skarp	263
8	Bonded Al2O3-covered Si-wafers for highly thermally conductive SOI-materials 1998 ·Chalmers Research (Chalmers University of Technology) ·Per Ericsson, Stefan Bengtsson, Jarmo Skarp, Tapio Kanniainen	1
9	Dependence of atomic layer-deposited Al2O3 films characteristics on growth temperature and Al precursors of Al(CH3)3 and AlCl3 1997 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Sun Jin Yun, Kyungho Lee, Jarmo Skarp, Hye Rim Kim, (unknown)	111
10	ALE-reactor for large area depositions 1997 ·Applied Surface Science ·Jarmo Skarp, P. Soininen, (unknown)	21
11	Properties of Al2O3-films deposited on silicon by atomic layer epitaxy 1997 ·Microelectronic Engineering ·Per Ericsson, Stefan Bengtsson, Jarmo Skarp	40
12	The Characterization of Al₂O₃ Films Grown by Atomic Layer Deposition Using Al(CH₃)₃ and H₂O 1997 ·MRS Proceedings ·Sun Jin Yun, Kyungho Lee, Jarmo Skarp, Hye Rim Kim, (unknown)	2
13	Small- and large-area CIGS modules by co-evaporation 1996 ·Esko Niemi, Jonas Hedström, T. Martinsson, Karin Granath, Lars Stolt, Jarmo Skarp, Dimitrios Hariskos, M. Ruckh, Hans‐Werner Schock	6
14	Ale Growth of Transparent Conductors 1996 ·MRS Proceedings ·(unknown), Timo Asikainen, Markku Leskelä, Jarmo Skarp	31
15	Use of Kramers–Kronig transforms for the treatment of admittance spectroscopy data of p-n junctions containing traps 1996 ·Journal of Applied Physics ·(unknown), J.M. Encinar, J. Santamarı́a, Jarmo Skarp, G. González-Dı́az, F. Sánchez-Quesada	13
16	Atomic layer epitaxy growth of doped zinc oxide thin films from organometals 1994 ·Applied Surface Science ·(unknown), Jarmo Skarp, Markku Tammenmaa, Tuomo Suntola	164
17	ALE-CdS/CdTe-PV-CELLS 1992 ·International Journal of Solar Energy ·Jarmo Skarp, (unknown), (unknown), Tuomo Suntola	13
18	Cadmium Sulphide Thin Films Grown By Atomic Layer Epitaxy 1991 ·MRS Proceedings ·(unknown), (unknown), Jarmo Skarp, (unknown)	7
19	Cadmium Telluride Thin Films Grown By Atomic Layer Epitaxy 1991 ·MRS Proceedings ·Arla Kytökivi, (unknown), (unknown), Jarmo Skarp	6
20	How the ZnS:Mn layer thickness contributes to the performance of AC thin-film EL devices grown by atomic layer epitaxy (ALE) 1983 ·IEEE Transactions on Electron Devices ·(unknown), (unknown), Jarmo Skarp, (unknown)	24

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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