Hideo Aida

1.8k total citations · 1 hit paper
66 papers, 1.5k citations indexed

About

Hideo Aida is a scholar working on Biomedical Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, Hideo Aida has authored 66 papers receiving a total of 1.5k indexed citations (citations by other indexed papers that have themselves been cited), including 36 papers in Biomedical Engineering, 32 papers in Materials Chemistry and 28 papers in Mechanics of Materials. Recurrent topics in Hideo Aida's work include Advanced Surface Polishing Techniques (31 papers), Metal and Thin Film Mechanics (25 papers) and GaN-based semiconductor devices and materials (23 papers). Hideo Aida is often cited by papers focused on Advanced Surface Polishing Techniques (31 papers), Metal and Thin Film Mechanics (25 papers) and GaN-based semiconductor devices and materials (23 papers). Hideo Aida collaborates with scholars based in Japan, United States and United Kingdom. Hideo Aida's co-authors include Hidetoshi Takeda, Natsuko Aota, Kazuhiko Sunakawa, Toshiro Doi, Koji Koyama, Tsutomu Yamazaki, Michio Uneda, Seong‐Woo Kim, Seong‐Woo Kim and Toshimasa Suzuki and has published in prestigious journals such as SHILAP Revista de lepidopterología, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Hideo Aida

61 papers receiving 1.4k citations

Hit Papers

Growth of β-Ga2O3 Single Crystals by the Edge-Defined, Fi... 2008 2026 2014 2020 2008 100 200 300 400 500

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Hideo Aida Japan 16 1.1k 673 529 471 317 66 1.5k
Jacob H. Leach United States 26 1.1k 1.0× 897 1.3× 201 0.4× 952 2.0× 208 0.7× 112 2.1k
Ming‐Hua Shiao Taiwan 16 379 0.3× 211 0.3× 199 0.4× 282 0.6× 373 1.2× 64 881
Kexin Jin China 22 1.4k 1.3× 874 1.3× 137 0.3× 686 1.5× 44 0.1× 167 1.7k
Boris N. Feigelson United States 18 613 0.6× 411 0.6× 100 0.2× 739 1.6× 223 0.7× 71 1.4k
Sean Wu Taiwan 18 486 0.4× 146 0.2× 440 0.8× 556 1.2× 242 0.8× 100 1.1k
Bowan Tao China 18 643 0.6× 347 0.5× 152 0.3× 320 0.7× 114 0.4× 118 1.0k
K. Goedicke Germany 19 732 0.7× 116 0.2× 183 0.3× 695 1.5× 717 2.3× 39 1.3k
D. Eyidi France 19 603 0.5× 111 0.2× 132 0.2× 252 0.5× 281 0.9× 58 1.1k
Danping Zhuang United States 11 458 0.4× 378 0.6× 388 0.7× 540 1.1× 289 0.9× 19 1.2k
Nong‐Moon Hwang South Korea 19 1.2k 1.1× 358 0.5× 182 0.3× 450 1.0× 191 0.6× 56 1.5k

Countries citing papers authored by Hideo Aida

Since Specialization
Citations

This map shows the geographic impact of Hideo Aida's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hideo Aida with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hideo Aida more than expected).

Fields of papers citing papers by Hideo Aida

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hideo Aida. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hideo Aida. The network helps show where Hideo Aida may publish in the future.

Co-authorship network of co-authors of Hideo Aida

This figure shows the co-authorship network connecting the top 25 collaborators of Hideo Aida. A scholar is included among the top collaborators of Hideo Aida based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hideo Aida. Hideo Aida is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Aida, Hideo, et al.. (2024). Analysis of Subsurface Damage Structures of Gallium Nitride Substrates Induced by Mechanical Polishing with Diamond Abrasives. physica status solidi (b). 261(11). 2 indexed citations
2.
Aida, Hideo, et al.. (2023). Analysis of external surface and internal lattice curvatures of freestanding heteroepitaxial diamond grown on an Ir (001)/MgO (001) substrate. Diamond and Related Materials. 136. 110026–110026. 5 indexed citations
3.
Kimura, Yutaka, et al.. (2023). Physical bending of heteroepitaxial diamond grown on an Ir/MgO substrate. Diamond and Related Materials. 137. 110055–110055. 5 indexed citations
4.
Takeda, Hidetoshi, Toshiro Doi, Seong‐Woo Kim, Hideo Aida, & Masaharu Shiratani. (2017). High efficiency processing and its processing mechanism of large area diamond substrate due to plasma fusion CMP. IEICE Technical Report; IEICE Tech. Rep.. 117(334). 1–6. 1 indexed citations
5.
Aida, Hideo, et al.. (2017). Effect of back-surface roughness of sapphire substrate on growth of GaN thin films. Precision Engineering. 50. 142–147. 3 indexed citations
6.
Uneda, Michio, et al.. (2016). Chemical Mechanical Polishing Mechanism of Hard-to-Process Materials Using Suede Type Polishing Pad. Journal of the Japan Society for Precision Engineering. 82(7). 703–708. 1 indexed citations
7.
Uneda, Michio, et al.. (2016). Analysis of sapphire- chemical mechanical polishing using digital image processing. SHILAP Revista de lepidopterología. 3(1). 15–509. 6 indexed citations
8.
KUROKAWA, Syuhei, Toshiro Doi, Yasuhisa Sano, et al.. (2015). Consideration of Femtosecond Laser-Induced Effect on Semiconductor Material SiC Substrate for CMP Processing. Applied Mechanics and Materials. 799-800. 458–462. 4 indexed citations
11.
KUROKAWA, Syuhei, et al.. (2014). (Invited) Approach to High Efficient CMP for Power Device Substrates. ECS Transactions. 60(1). 641–646. 14 indexed citations
13.
Aida, Hideo, Seong‐Woo Kim, Toshiro Doi, et al.. (2014). Precise mechanical polishing of brittle materials with free diamond abrasives dispersed in micro–nano-bubble water. Precision Engineering. 40. 81–86. 18 indexed citations
14.
Koyama, Koji, Hideo Aida, Michio Uneda, et al.. (2014). Effects of N-Face Finishing on Geometry of Double-Side Polished GaN Substrate. International Journal of Automation Technology. 8(1). 121–127. 3 indexed citations
15.
Aida, Hideo, Toshimasa Suzuki, Koji Koyama, et al.. (2014). Surface Planarization of GaN-on-Sapphire Template by Chemical Mechanical Polishing for Subsequent GaN Homoepitaxy. ECS Journal of Solid State Science and Technology. 3(5). P163–P168. 28 indexed citations
16.
Aida, Hideo, et al.. (2013). Surface Treatment for GaN Substrate -Comparison of Chemical Mechanical Polishing and Inductively Coupled Plasma Dry Etching -. Sensors and Materials. 189–189. 2 indexed citations
17.
Aida, Hideo, et al.. (2013). Effect of internally focused laser processing of sapphire substrate on bowing management for III-nitride epitaxy. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8625. 862507–862507. 1 indexed citations
18.
Yamazaki, Tsutomu, Toshiro Doi, Syuhei KUROKAWA, et al.. (2012). Polishing Characteristics of Glass Substrate Using New Atmosphere Control Sealed CMP Machine (Bell-jar Shaped CMP Machine). Journal of the Japan Society for Precision Engineering. 78(2). 149–154.
19.
Yamazaki, Tsutomu, Toshiro Doi, Syuhei KUROKAWA, et al.. (2012). Development of Novel Groove Patterns for CMP Pad. Advanced materials research. 497. 264–267. 2 indexed citations
20.
Yamazaki, Tsutomu, Toshiro Doi, Michio Uneda, et al.. (2012). Effect of Groove Pattern of Chemical Mechanical Polishing Pad on Slurry Flow Behavior. Japanese Journal of Applied Physics. 51(5S). 05EF03–05EF03. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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