R. Hrach

693 total citations
114 papers, 575 citations indexed

About

R. Hrach is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry. According to data from OpenAlex, R. Hrach has authored 114 papers receiving a total of 575 indexed citations (citations by other indexed papers that have themselves been cited), including 72 papers in Electrical and Electronic Engineering, 42 papers in Atomic and Molecular Physics, and Optics and 33 papers in Materials Chemistry. Recurrent topics in R. Hrach's work include Plasma Diagnostics and Applications (53 papers), Metal and Thin Film Mechanics (20 papers) and Semiconductor materials and devices (20 papers). R. Hrach is often cited by papers focused on Plasma Diagnostics and Applications (53 papers), Metal and Thin Film Mechanics (20 papers) and Semiconductor materials and devices (20 papers). R. Hrach collaborates with scholars based in Czechia, South Korea and France. R. Hrach's co-authors include A. M. Diamy, Jacques Legrand, J Šimek, Martin Švec, Petr Bartoš, J. Legrand, P. Jelínek, Jaroslav Pavlı́k, V. Starý and Jiřı́ Adámek and has published in prestigious journals such as Applied Surface Science, Computer Physics Communications and Thin Solid Films.

In The Last Decade

R. Hrach

105 papers receiving 553 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
R. Hrach Czechia 12 344 240 151 119 95 114 575
Gilles Cunge France 17 750 2.2× 323 1.3× 124 0.8× 195 1.6× 297 3.1× 30 915
Gilles Cartry France 22 756 2.2× 460 1.9× 226 1.5× 241 2.0× 259 2.7× 52 1.1k
T. Kajiwara Japan 14 196 0.6× 169 0.7× 230 1.5× 38 0.3× 169 1.8× 52 526
Jerel A. Smith United States 13 125 0.4× 209 0.9× 203 1.3× 78 0.7× 158 1.7× 21 696
Hubertus M.J. Bastiaens Netherlands 12 239 0.7× 106 0.4× 163 1.1× 38 0.3× 97 1.0× 59 484
Ch. Steinbrüchel United States 17 425 1.2× 207 0.9× 248 1.6× 19 0.2× 158 1.7× 40 677
A. Manenschijn Netherlands 9 223 0.6× 268 1.1× 137 0.9× 33 0.3× 96 1.0× 15 538
David R. Kingham United Kingdom 15 265 0.8× 490 2.0× 222 1.5× 30 0.3× 98 1.0× 44 967
A. S. Kovalev Russia 17 673 2.0× 140 0.6× 92 0.6× 250 2.1× 281 3.0× 41 750
E. Wagenaars United Kingdom 18 604 1.8× 185 0.8× 187 1.2× 459 3.9× 230 2.4× 68 997

Countries citing papers authored by R. Hrach

Since Specialization
Citations

This map shows the geographic impact of R. Hrach's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Hrach with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Hrach more than expected).

Fields of papers citing papers by R. Hrach

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. Hrach. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Hrach. The network helps show where R. Hrach may publish in the future.

Co-authorship network of co-authors of R. Hrach

This figure shows the co-authorship network connecting the top 25 collaborators of R. Hrach. A scholar is included among the top collaborators of R. Hrach based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. Hrach. R. Hrach is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Matoušek, Jindřich, et al.. (2011). Experimental and computational study of morphological and electrical properties of tin/plasma polymer nanocomposites. Surface and Coatings Technology. 205. S63–S66. 1 indexed citations
2.
Švec, Martin, et al.. (2009). Metal/dielectric composite films — particle shapes and transport properties. Thin Solid Films. 518(16). 4590–4592. 1 indexed citations
3.
Havlíčková, E., Ondřej Maršálek, & R. Hrach. (2009). Computational study of plasma-solid interaction in argon plasma with inclusion of magnetic field. The European Physical Journal D. 54(2). 313–318. 2 indexed citations
4.
Bartoš, Petr, R. Hrach, & P. Jelínek. (2008). Computer Simulations of Probe Measurements in Argon Plasma: Effects of Finite Dimensions of the Probe. Contributions to Plasma Physics. 48(5-7). 406–411. 5 indexed citations
5.
Šimek, J, R. Hrach, & P. Jelínek. (2007). Computational study of negative ions influence on plasma sheath formation. Computer Physics Communications. 177(1-2). 137–137. 1 indexed citations
6.
Hrach, R.. (2006). A Comparison of Advanced Poisson Equation Solvers Applied to the Particle-In-Cell Plasma Model. 2 indexed citations
7.
Hrach, R., et al.. (2006). Correlation between morphology and transport properties of composite films: Charge transport in composites. Applied Surface Science. 252(15). 5516–5520. 9 indexed citations
8.
Hrach, R., et al.. (2006). Study of plasma—solid interaction in electronegative gas mixtures. Czechoslovak Journal of Physics. 56(12). 1437–1444. 1 indexed citations
9.
Diamy, A. M., et al.. (2001). Influence of C atom concentration for acetylene production in a CH4/N2 afterglow. Vacuum. 61(2-4). 403–407. 23 indexed citations
10.
Pavlı́k, Jaroslav & R. Hrach. (1999). Study of argon/oxygen plasma used for creation of aluminium oxide thin films. Superficies y Vacío. 131–134. 4 indexed citations
11.
Hrach, R., et al.. (1998). Computer simulation of semicontinuous and continuous metal film morphology. Vacuum. 50(3-4). 289–292. 2 indexed citations
12.
Diamy, A. M., et al.. (1998). Kinetics of reactions in CH4\N2 afterglow plasma : a simplified model. Vacuum. 50(3-4). 491–495. 26 indexed citations
13.
Hrach, R., et al.. (1995). Study of secondary electron emission from plasma polymerized materials†. International Journal of Electronics. 78(1). 139–142. 1 indexed citations
14.
Hrach, R., et al.. (1994). Electrical and optical properties of very thin gold films †. International Journal of Electronics. 77(6). 989–991. 2 indexed citations
15.
Hrach, R.. (1992). Electron emission from MIM systems and discontinuous metal films. International Journal of Electronics. 73(5). 841–847. 5 indexed citations
16.
Hrach, R., et al.. (1992). Study of 3D island film morphology. International Journal of Electronics. 73(5). 969–971. 1 indexed citations
17.
Hrach, R., et al.. (1991). Study of collision processes in positive column of glow discharge by means of computer experiment. 41. 345–353.
18.
Hrach, R. & V. Starý. (1978). Computer model of middle stage of thin film growth. Czechoslovak Journal of Physics. 28(12). 1382–1394. 3 indexed citations
19.
Hrach, R., Zdeněk Hubička, & Jan Boháč. (1974). The influence of technological conditions on electrical properties of MIM systems. Czechoslovak Journal of Physics. 24(12). 1369–1378. 2 indexed citations
20.
Hrach, R.. (1968). The influence of dielectric properties on the emission of a metal-dielectric-metal system: Energy distributions; summary. Czechoslovak Journal of Physics. 18(12). 1591–1601. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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