Fengliang Dong
- Electronic, Optical and Magnetic Materials top 2%
- Aerospace Engineering top 1%
- Biomedical Engineering top 5%
- Atomic and Molecular Physics, and Optics top 5%
- Electrical and Electronic Engineering top 10%
- Co-authors
- Weiguo ChuZhiwei SongLihua XuYan LiBo WangQihuang GongDong YangQitong Li
- Topics
- Metamaterials and Metasurfaces Applications (17 papers)Plasmonic and Surface Plasmon Research (9 papers)Infrared Target Detection Methodologies (9 papers)
- Partner nations
- ChinaUnited StatesGermany
In The Last Decade
Fengliang Dong
59 papers receiving 1.8k citations
Hit Papers
Peers
Comparison fields: 5 of 70
- Electronic, Optical and Magnetic Materials 1.2k
- Aerospace Engineering 796
- Biomedical Engineering 683
- Atomic and Molecular Physics, and Optics 610
- Electrical and Electronic Engineering 528
Countries citing papers authored by Fengliang Dong
This map shows the geographic impact of Fengliang Dong's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Fengliang Dong with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Fengliang Dong more than expected).
Fields of papers citing papers by Fengliang Dong
This network shows the impact of papers produced by Fengliang Dong. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Fengliang Dong. The network helps show where Fengliang Dong may publish in the future.
Co-authorship network of co-authors of Fengliang Dong
This figure shows the co-authorship network connecting the top 25 collaborators of Fengliang Dong. A scholar is included among the top collaborators of Fengliang Dong based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Fengliang Dong. Fengliang Dong is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 0 | |
| 2 | 2 | |
| 3 | 1 | |
| 4 | 22 | |
| 5 | 33 | |
| 6 | 23 | |
| 7 | 59 | |
| 8 | 12 | |
| 9 | 1 | |
| 10 | 7 | |
| 11 | 22 | |
| 12 | 1 | |
| 13 | 16 | |
| 14 | 13 | |
| 15 | 16 | |
| 16 | 2 | |
| 17 | A MEMS Based Focus Plane Array for Infrared Imaging | 3 |
| 18 | 23 | |
| 19 | 32 | |
| 20 | 20 |
About Fengliang Dong
Fengliang Dong is a scholar working on Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films and Biomedical Engineering, having authored 60 papers that have together received 1.9k indexed citations. Recurring topics across this work include Metamaterials and Metasurfaces Applications (17 papers), Plasmonic and Surface Plasmon Research (9 papers) and Infrared Target Detection Methodologies (9 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (1.2k citations), Acoustics and Ultrasonics (37 citations) and Aerospace Engineering (796 citations). Fengliang Dong has collaborated with scholars based in China, United States and Germany. Frequent co-authors include Weiguo Chu, Zhiwei Song, Lihua Xu, Yan Li, Bo Wang, Qihuang Gong, Dong Yang, Qitong Li, Yun‐Feng Xiao and Chengwei Sun. Their work appears in journals such as Advanced Materials, Nano Letters and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.