Esther Kim

25 papers receiving 787 citations

Hit Papers

Atomic Layer Deposition of Hafnium and Zirconium Oxides U...20022026201020182002100200300400

Peers

Esther Kim
Comparison fields: 5 of 95
  • Electrical and Electronic Engineering 509
  • Materials Chemistry 423
  • Electronic, Optical and Magnetic Materials 102
  • Health, Toxicology and Mutagenesis 78
  • Organic Chemistry 70
Replace Nik Reeves‐McLaren with:
Nik Reeves‐McLaren United Kingdom
Shanshan Du China
Engin Çiftyürek Germany
Yan Luo China
Julie L. Bitter United States
Chong Han China
Riadh Ternane Tunisia
Brian J. Schultz United States
Takashi Yokoyama Japan
Sameh I. Ahmed Egypt
Esther Kim relative to Nik Reeves‐McLaren United Kingdom Nik Reeves‐McLaren's profile →
Citations per field
00.5×1.5×2.3×
Nik Reeves‐McLaren · 1×
Citations per year

Countries citing papers authored by Esther Kim

Since Specialization
Citations

This map shows the geographic impact of Esther Kim's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Esther Kim with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Esther Kim more than expected).

Fields of papers citing papers by Esther Kim

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Esther Kim. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Esther Kim. The network helps show where Esther Kim may publish in the future.

Co-authorship network of co-authors of Esther Kim

This figure shows the co-authorship network connecting the top 25 collaborators of Esther Kim. A scholar is included among the top collaborators of Esther Kim based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Esther Kim. Esther Kim is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
#WorkIndexed citations
1 1
2 2
3 13
4 24
5 5
6 3
7 1
8 3
9 70
10 13
11 1
12 2
13 91
14
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursorsbreakdown →
449
15 5
16 0
17 14
18 1
19 1
20 4

About Esther Kim

Esther Kim is a scholar working on Condensed Matter Physics, Bioengineering and Health, Toxicology and Mutagenesis, having authored 26 papers that have together received 816 indexed citations. Recurring topics across this work include GaN-based semiconductor devices and materials (5 papers), Metal and Thin Film Mechanics (4 papers) and Semiconductor materials and devices (4 papers). The work is most often cited by research in Materials Chemistry (423 citations), Electrical and Electronic Engineering (509 citations) and Health, Toxicology and Mutagenesis (78 citations). Esther Kim has collaborated with scholars based in United States, South Korea and Canada. Frequent co-authors include Jill Becker, Roy G. Gordon, Dennis M. Hausmann, Woo Jin Kim, Sun‐Young Kim, Seth A. Miller, Douglas L. Gin, David Gray, Rajkumar Patel and Jeeyoung Kim. Their work appears in journals such as Angewandte Chemie International Edition, Applied Physics Letters and PLoS ONE.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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