E. Scheid

1.8k total citations
110 papers, 1.3k citations indexed

About

E. Scheid is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Computational Mechanics. According to data from OpenAlex, E. Scheid has authored 110 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 102 papers in Electrical and Electronic Engineering, 50 papers in Materials Chemistry and 18 papers in Computational Mechanics. Recurrent topics in E. Scheid's work include Semiconductor materials and devices (52 papers), Silicon and Solar Cell Technologies (40 papers) and Thin-Film Transistor Technologies (39 papers). E. Scheid is often cited by papers focused on Semiconductor materials and devices (52 papers), Silicon and Solar Cell Technologies (40 papers) and Thin-Film Transistor Technologies (39 papers). E. Scheid collaborates with scholars based in France, Spain and Algeria. E. Scheid's co-authors include P. Temple‐Boyer, Carole Rossi, Brigitte Caussat, Hugues Vergnes, J.L. Regolini, J. Mercier, D. Bensahel, F. Cristiano, Constantin Vahlas and Andreas G. Boudouvis and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

E. Scheid

109 papers receiving 1.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
E. Scheid France 20 1.1k 572 295 270 121 110 1.3k
A. Rahim Forouhi United States 8 673 0.6× 669 1.2× 221 0.7× 206 0.8× 91 0.8× 18 1.1k
W. R. Fahrner Germany 20 970 0.9× 739 1.3× 292 1.0× 250 0.9× 108 0.9× 127 1.4k
R. J. Jaccodine United States 17 1.1k 1.0× 613 1.1× 443 1.5× 381 1.4× 207 1.7× 68 1.6k
H. Schmidt Germany 18 1.1k 1.0× 536 0.9× 188 0.6× 206 0.8× 47 0.4× 44 1.4k
Amal Chabli France 17 639 0.6× 415 0.7× 255 0.9× 363 1.3× 69 0.6× 105 1.1k
G.M. Crean Ireland 15 609 0.6× 474 0.8× 192 0.7× 235 0.9× 136 1.1× 108 1.0k
Jörgen Olsson Sweden 19 1.2k 1.1× 686 1.2× 200 0.7× 185 0.7× 138 1.1× 125 1.8k
J. L. Davidson United States 23 597 0.5× 1.2k 2.1× 394 1.3× 438 1.6× 242 2.0× 106 1.6k
W. Pamler Germany 16 601 0.6× 323 0.6× 265 0.9× 303 1.1× 162 1.3× 50 951
Michael D. Whitfield United Kingdom 19 351 0.3× 592 1.0× 141 0.5× 188 0.7× 225 1.9× 64 784

Countries citing papers authored by E. Scheid

Since Specialization
Citations

This map shows the geographic impact of E. Scheid's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Scheid with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Scheid more than expected).

Fields of papers citing papers by E. Scheid

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Scheid. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Scheid. The network helps show where E. Scheid may publish in the future.

Co-authorship network of co-authors of E. Scheid

This figure shows the co-authorship network connecting the top 25 collaborators of E. Scheid. A scholar is included among the top collaborators of E. Scheid based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. Scheid. E. Scheid is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kerdilès, S., Damiano Ricciarelli, Jean‐Michel Hartmann, et al.. (2024). Evolution of the liquid/solid interface roughness in Si1-xGex layers processed by nanosecond laser annealing. Applied Surface Science. 684. 161982–161982. 3 indexed citations
2.
Gakis, Georgios P., Hugues Vergnes, F. Cristiano, et al.. (2019). Ιn situ N2-NH3 plasma pre-treatment of silicon substrate enhances the initial growth and restricts the substrate oxidation during alumina ALD. Journal of Applied Physics. 126(12). 9 indexed citations
3.
4.
Temple‐Boyer, Pierre, et al.. (2011). Influence of the annealing condition on the BN bonds intensity detected by FTIR characterization. International Conference on Electrical and Electronics Engineering. 3 indexed citations
5.
Temple‐Boyer, Pierre, et al.. (2010). Nitrogen doped silicon films heavily boron implanted for MOS structures: Simulation and characterization. Materials Science in Semiconductor Processing. 13(5-6). 383–388. 1 indexed citations
6.
Bazizi, El Mehdi, E. Scheid, Olivier Marcelot, et al.. (2008). Study of silicon–germanium interdiffusion from pure germanium deposited layers. Materials Science and Engineering B. 154-155. 110–113. 3 indexed citations
7.
Scheid, E., et al.. (2007). 850nm wavelength range nanoscale resonant optical filter fabrication using standard microelectronics techniques. Microelectronic Engineering. 84(4). 673–677. 8 indexed citations
8.
García-Beltrán, Cristina, B. Garrido, P. Pellegrino, et al.. (2004). Low loss silica waveguides containing Si nanocrystals. MRS Proceedings. 817. 2 indexed citations
9.
Temple‐Boyer, P., et al.. (2003). A Monte Carlo simulation study of boron profiles as-implanted into LPCVD–NiDoS polycrystalline thin films. Solid State Communications. 125(9). 485–491. 1 indexed citations
10.
Claverie, A., F. Cristiano, B. Colombeau, E. Scheid, & B. de Mauduit. (2002). Thermal evolution of interstitial defects in implanted silicon. 538–543. 3 indexed citations
11.
Scheid, E., et al.. (1998). Silicon Oxynitride Membrane for Chemical Sensor Application. MRS Proceedings. 518. 2 indexed citations
12.
Duverneuil, P., et al.. (1996). Dépôt chimique CVD de silicium dopé in situ au phosphore. Partie 2: Analyse théorique et modélisation. The Canadian Journal of Chemical Engineering. 74(6). 950–959. 2 indexed citations
13.
Scheid, E., et al.. (1993). Polysilicon Thin Film Transistor : a Study of some Techniques of Realisation of the Channel Region and of the Gate. European Solid-State Device Research Conference. 57–60. 1 indexed citations
14.
Scheid, E., et al.. (1993). A Comprehensive Study of Thin Rapid Thermal Oxide Films. Japanese Journal of Applied Physics. 32(12R). 5805–5805. 7 indexed citations
15.
Scheid, E., et al.. (1993). Silicon nitride elaborated by low pressure chemical vapour deposition from Si2H6 and NH3 at low temperature. Materials Science and Engineering B. 17(1-3). 185–189. 6 indexed citations
16.
Mauduit, B. de, et al.. (1993). Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates. Journal of Materials Science Letters. 12(12). 910–912. 7 indexed citations
17.
Sarrabayrouse, G., et al.. (1990). Apid Thermal Oxidation of Silicon: Aspects of the Initial Regime Kinetics. MRS Proceedings. 204. 1 indexed citations
18.
Scheid, E., et al.. (1990). Super Large Grain Polycrystalline Silicon Obtained from Pyrolysis of Si2H6 and Annealing. Japanese Journal of Applied Physics. 29(11A). L2105–L2105. 18 indexed citations
19.
Regolini, J.L., D. Bensahel, J. Mercier, & E. Scheid. (1989). EPITAXIAL SILICON GROWTH IN A REDUCED PRESSURE AND TEMPERATURE CVD REACTOR. Le Journal de Physique Colloques. 50(C5). C5–519. 1 indexed citations
20.
Mercier, J., J.L. Regolini, D. Bensahel, & E. Scheid. (1989). Kinetic aspects of selective epitaxial growth using a rapid thermal processing system. Journal of Crystal Growth. 94(4). 885–894. 17 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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