Daisuke Kosemura

708 total citations
72 papers, 602 citations indexed

About

Daisuke Kosemura is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, Daisuke Kosemura has authored 72 papers receiving a total of 602 indexed citations (citations by other indexed papers that have themselves been cited), including 69 papers in Electrical and Electronic Engineering, 35 papers in Biomedical Engineering and 15 papers in Materials Chemistry. Recurrent topics in Daisuke Kosemura's work include Integrated Circuits and Semiconductor Failure Analysis (33 papers), Advancements in Semiconductor Devices and Circuit Design (27 papers) and Semiconductor materials and devices (27 papers). Daisuke Kosemura is often cited by papers focused on Integrated Circuits and Semiconductor Failure Analysis (33 papers), Advancements in Semiconductor Devices and Circuit Design (27 papers) and Semiconductor materials and devices (27 papers). Daisuke Kosemura collaborates with scholars based in Japan, Belgium and United States. Daisuke Kosemura's co-authors include Atsushi Ogura, Koji Usuda, Ingrid De Wolf, Motohiro Tomita, Satoshi Tanaka, Hitoshi Wakabayashi, T. Yoshida, Ichiro Hirosawa, Yasushi Sugiura and Hiroki Hashiguchi and has published in prestigious journals such as SHILAP Revista de lepidopterología, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Daisuke Kosemura

70 papers receiving 595 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Daisuke Kosemura Japan 14 522 268 168 110 38 72 602
K. Pinardi Sweden 10 318 0.6× 125 0.5× 119 0.7× 169 1.5× 30 0.8× 26 463
H. Wang Singapore 12 266 0.5× 177 0.7× 54 0.3× 237 2.2× 96 2.5× 29 479
Reza Sanatinia Sweden 12 228 0.4× 237 0.9× 118 0.7× 182 1.7× 49 1.3× 20 392
Pradeep Senanayake United States 15 434 0.8× 497 1.9× 191 1.1× 323 2.9× 69 1.8× 21 646
S. Senkader United Kingdom 13 485 0.9× 115 0.4× 303 1.8× 177 1.6× 44 1.2× 30 566
Neil F. Baril United States 12 820 1.6× 212 0.8× 137 0.8× 291 2.6× 17 0.4× 32 892
Moritz Seyfried Germany 8 166 0.3× 101 0.4× 113 0.7× 145 1.3× 43 1.1× 19 361
Sylvain Hudlet France 11 317 0.6× 352 1.3× 120 0.7× 476 4.3× 17 0.4× 15 637
Cornel Bozdog United States 10 192 0.4× 80 0.3× 75 0.4× 64 0.6× 98 2.6× 36 333

Countries citing papers authored by Daisuke Kosemura

Since Specialization
Citations

This map shows the geographic impact of Daisuke Kosemura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Daisuke Kosemura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Daisuke Kosemura more than expected).

Fields of papers citing papers by Daisuke Kosemura

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Daisuke Kosemura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Daisuke Kosemura. The network helps show where Daisuke Kosemura may publish in the future.

Co-authorship network of co-authors of Daisuke Kosemura

This figure shows the co-authorship network connecting the top 25 collaborators of Daisuke Kosemura. A scholar is included among the top collaborators of Daisuke Kosemura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Daisuke Kosemura. Daisuke Kosemura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Koike, M., Masumi Saitoh, Naomi Sawamoto, et al.. (2017). Probing spatial heterogeneity in silicon thin films by Raman spectroscopy. Scientific Reports. 7(1). 16549–16549. 4 indexed citations
2.
Kosemura, Daisuke, et al.. (2017). Pattern-dependent anisotropic stress evaluation in SiGe epitaxially grown on a Si substrate with selective Ar+ion implantation using oil-immersion Raman spectroscopy. Japanese Journal of Applied Physics. 56(5). 51301–51301. 1 indexed citations
3.
Inoue, Fumihiro, Anne Jourdain, Lan Peng, et al.. (2016). Edge trimming for wafer-to-wafer 3D integration. 83–84. 2 indexed citations
4.
Kosemura, Daisuke, et al.. (2016). Examination of phonon deformation potentials for accurate strain measurements in silicon–germanium alloys with the whole composition range by Raman spectroscopy. Japanese Journal of Applied Physics. 55(2). 26602–26602. 8 indexed citations
5.
Kosemura, Daisuke, Steve Stoffels, Herman Oprins, et al.. (2016). Experimental Benchmarking of Electrical Methods and <inline-formula> <tex-math notation="LaTeX">$\mu $ </tex-math> </inline-formula>-Raman Spectroscopy for Channel Temperature Detection in AlGaN/GaN HEMTs. IEEE Transactions on Electron Devices. 63(6). 2321–2327. 17 indexed citations
6.
7.
Ogura, Atsushi & Daisuke Kosemura. (2014). (Invited) Anisotropoic Strain Evaluation in the Finite Si Area by Surface Plasmon Enhanced Raman Spectroscopy. ECS Transactions. 64(6). 67–77. 2 indexed citations
8.
Kosemura, Daisuke, Motohiro Tomita, Koji Usuda, Tsutomu Tezuka, & Atsushi Ogura. (2013). Measurement of Anisotropic Biaxial Stresses in Si1-xGex/Si Mesa Structures by Oil-Immersion Raman Spectroscopy. Japanese Journal of Applied Physics. 52(4S). 04CA05–04CA05. 4 indexed citations
9.
10.
Kosemura, Daisuke, et al.. (2011). Improvement of Spatial Resolution in Raman Spectroscopy Selecting Measurement Area by Opaque Material Deposition. Japanese Journal of Applied Physics. 50(6R). 61301–61301. 14 indexed citations
11.
Tomita, Motohiro, et al.. (2011). Evaluation of Strained-Silicon by Electron Backscattering Pattern Measurement: Comparison Study with UV-Raman Measurement and Edge Force Model Calculation. Japanese Journal of Applied Physics. 50(1R). 10111–10111. 15 indexed citations
12.
Tomita, Motohiro, et al.. (2011). Evaluation of Strained Silicon by Electron Back Scattering Pattern Compared with Raman Measurement and Edge Force Model Calculation. Key engineering materials. 470. 123–128. 2 indexed citations
13.
Kosemura, Daisuke & Atsushi Ogura. (2011). Quantitative Analysis of Stress Relaxation in Transmission Electron Microscopy Samples by Raman Spectroscopy with a High-Numerical Aperture Lens. Japanese Journal of Applied Physics. 50(4S). 04DA06–04DA06. 9 indexed citations
14.
Ogura, Atsushi, Daisuke Kosemura, & Shingo Kinoshita. (2010). Suppression of SiC surface roughening during high-temperature annealing by atmospheric control using purified Ar gas. Journal of materials research/Pratt's guide to venture capital sources. 25(4). 708–710. 1 indexed citations
15.
16.
Kosemura, Daisuke, T. Yoshida, Atsushi Ogura, et al.. (2009). Improvement of CVD SiO2 by Post Deposition Microwave Plasma Treatment. ECS Transactions. 19(9). 45–51. 7 indexed citations
17.
Kosemura, Daisuke, et al.. (2009). Channel-Stress Enhancement Characteristics for Scaled pMOSFETs by Using Damascene Gate With Top-Cut Compressive Stress Liner and eSiGe. IEEE Transactions on Electron Devices. 56(11). 2778–2784. 15 indexed citations
18.
Kosemura, Daisuke, et al.. (2009). Study of Strain Induction for Metal–Oxide–Semiconductor Field-Effect Transistors using Transparent Dummy Gates and Stress Liners. Japanese Journal of Applied Physics. 48(6R). 66508–66508. 11 indexed citations
19.
Ogura, Atsushi, Hiroyuki Saitoh, Daisuke Kosemura, et al.. (2009). Evaluation and Control of Strain in Si Induced by Patterned SiN Stressor. Electrochemical and Solid-State Letters. 12(4). H117–H117. 9 indexed citations
20.
Kosemura, Daisuke, Masahiro Takei, Kengo Nagata, et al.. (2006). Comparative study between Si (110) and (100) substrates on mobility and velocity enhancements for short-channel highly-strained PFETs. Symposium on VLSI Technology. 14–15. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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