Patrick Schiavone

1.2k total citations
77 papers, 878 citations indexed

About

Patrick Schiavone is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Patrick Schiavone has authored 77 papers receiving a total of 878 indexed citations (citations by other indexed papers that have themselves been cited), including 60 papers in Electrical and Electronic Engineering, 38 papers in Surfaces, Coatings and Films and 23 papers in Biomedical Engineering. Recurrent topics in Patrick Schiavone's work include Advancements in Photolithography Techniques (49 papers), Electron and X-Ray Spectroscopy Techniques (22 papers) and Optical Coatings and Gratings (22 papers). Patrick Schiavone is often cited by papers focused on Advancements in Photolithography Techniques (49 papers), Electron and X-Ray Spectroscopy Techniques (22 papers) and Optical Coatings and Gratings (22 papers). Patrick Schiavone collaborates with scholars based in France, Switzerland and United States. Patrick Schiavone's co-authors include D. Fuard, Tzvetelina Tzvetkova‐Chevolleau, Philippe Tracqui, S. Decossas, Jacques Ohayon, Anastasis Stephanou, C. Gourgon, C. Perret, Yohan Payan and Thomas Boudou and has published in prestigious journals such as Applied Physics Letters, Biomaterials and Japanese Journal of Applied Physics.

In The Last Decade

Patrick Schiavone

69 papers receiving 832 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Patrick Schiavone France 11 530 354 197 148 108 77 878
D. Fuard France 10 444 0.8× 232 0.7× 118 0.6× 169 1.1× 72 0.7× 25 702
Kristen L. Mills United States 11 587 1.1× 102 0.3× 85 0.4× 121 0.8× 69 0.6× 20 731
Salvatore Surdo Italy 18 600 1.1× 405 1.1× 184 0.9× 26 0.2× 208 1.9× 51 900
Yinning Zhou Macao 22 1.2k 2.4× 356 1.0× 82 0.4× 55 0.4× 62 0.6× 43 1.5k
Paul G. Charette Canada 21 742 1.4× 452 1.3× 62 0.3× 32 0.2× 222 2.1× 87 1.3k
Sang-Mo Koo South Korea 12 540 1.0× 240 0.7× 39 0.2× 106 0.7× 76 0.7× 27 849
Guoguang Yang China 21 326 0.6× 432 1.2× 52 0.3× 237 1.6× 272 2.5× 82 1.7k
Víctor J. Cadarso Switzerland 22 782 1.5× 586 1.7× 87 0.4× 55 0.4× 261 2.4× 93 1.4k
S. Decossas France 7 328 0.6× 166 0.5× 55 0.3× 50 0.3× 148 1.4× 15 631
Oliver Paul Germany 16 320 0.6× 643 1.8× 45 0.2× 73 0.5× 309 2.9× 55 1.1k

Countries citing papers authored by Patrick Schiavone

Since Specialization
Citations

This map shows the geographic impact of Patrick Schiavone's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Patrick Schiavone with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Patrick Schiavone more than expected).

Fields of papers citing papers by Patrick Schiavone

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Patrick Schiavone. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Patrick Schiavone. The network helps show where Patrick Schiavone may publish in the future.

Co-authorship network of co-authors of Patrick Schiavone

This figure shows the co-authorship network connecting the top 25 collaborators of Patrick Schiavone. A scholar is included among the top collaborators of Patrick Schiavone based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Patrick Schiavone. Patrick Schiavone is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Schiavone, Patrick, et al.. (2021). Pattern placement and shape distortion control using contour-based metrology. HAL (Le Centre pour la Communication Scientifique Directe). 29–29. 1 indexed citations
2.
Dillon, Brian, et al.. (2015). Mask process matching using a model based data preparation solution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9635. 96350T–96350T. 2 indexed citations
3.
Tortai, J.H., et al.. (2015). Application of cubic spline models in electron-beam lithography. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 33(4). 1 indexed citations
4.
Choi, Kang‐Hoon, et al.. (2014). Effective corner rounding correction in the data preparation for electron beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9235. 92350U–92350U. 2 indexed citations
5.
Vannuffel, C., et al.. (2013). Extreme long range process effects characterization and compensation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8886. 88860F–88860F. 5 indexed citations
6.
Schiavone, Patrick, et al.. (2013). Shot count reduction for non-Manhattan geometries: concurrent optimization of data fracture and mask writer design. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8880. 88801F–88801F. 5 indexed citations
7.
Schiavone, Patrick, et al.. (2012). Improved electron backscattering representation using a new class of distribution: application to EUV masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8323. 83232F–83232F. 4 indexed citations
8.
Choi, Kang‐Hoon, et al.. (2012). Advanced module for model parameter extraction using global optimization and sensitivity analysis for electron beam proximity effect correction. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8522. 852212–852212. 2 indexed citations
9.
Schiavone, Patrick, et al.. (2009). In vivo measurement of human brain elasticity using a light aspiration device. Medical Image Analysis. 13(4). 673–678. 48 indexed citations
10.
Fuard, D., et al.. (2009). Outliers detection by fuzzy classification method for model building. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7272. 72721G–72721G. 2 indexed citations
11.
Tortai, J.H., et al.. (2009). Inverse problem solving and optical index determination of resist films by ellipsometry. Microelectronic Engineering. 87(5-8). 893–898.
12.
Tzvetkova‐Chevolleau, Tzvetelina, Anastasis Stephanou, D. Fuard, et al.. (2008). The motility of normal and cancer cells in response to the combined influence of the substrate rigidity and anisotropic microstructure. Biomaterials. 29(10). 1541–1551. 138 indexed citations
13.
Lucas, Kevin, et al.. (2006). Process window OPC verification: dry versus immersion lithography for the 65nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6154. 61544D–61544D.
14.
Peyrade, D., K. Berton, C. Perret, et al.. (2005). Replication of sub-40nm gap nanoelectrodes over an 8-in. substrate by nanoimprint lithography. Microelectronic Engineering. 78-79. 676–681. 8 indexed citations
15.
Schiavone, Patrick, et al.. (2004). Shadowing effect minimization in EUV mask by modeling. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5446. 849–849. 13 indexed citations
16.
Fuard, D. & Patrick Schiavone. (2004). Comparison of various lithography strategies for the 65- and 45-nm half pitch using simulation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 1360–1360. 1 indexed citations
17.
Buffet, N., et al.. (1998). 0.12 µm Optical Lithography Performances Using an Alternating Deep UV Phase Shift Mask. Japanese Journal of Applied Physics. 37(12S). 6714–6714. 1 indexed citations
18.
Buffet, N., et al.. (1998). 0.12 μm optical lithography performances using an alternating DUV phase shift mask. Microelectronic Engineering. 41-42. 61–64. 2 indexed citations
19.
Buffet, N., et al.. (1998). 0.18-μm optical lithography performances using an alternating DUV phase-shift mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 25–25.
20.
Schiavone, Patrick, et al.. (1994). Application of Alternating-Type Phase Shift Mask to Polysilicon Level for Random Logic Circuits. Japanese Journal of Applied Physics. 33(12S). 6779–6779. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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