B.J. Cho

668 total citations
24 papers, 547 citations indexed

About

B.J. Cho is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering. According to data from OpenAlex, B.J. Cho has authored 24 papers receiving a total of 547 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 6 papers in Atomic and Molecular Physics, and Optics and 4 papers in Biomedical Engineering. Recurrent topics in B.J. Cho's work include Semiconductor materials and devices (21 papers), Advancements in Semiconductor Devices and Circuit Design (18 papers) and Semiconductor materials and interfaces (5 papers). B.J. Cho is often cited by papers focused on Semiconductor materials and devices (21 papers), Advancements in Semiconductor Devices and Circuit Design (18 papers) and Semiconductor materials and interfaces (5 papers). B.J. Cho collaborates with scholars based in Singapore, United States and Taiwan. B.J. Cho's co-authors include Won Kook Choi, W. K. Chim, Dim‐Lee Kwong, Albert Chin, Yihong Wu, Jianrong Dong, L.J. Tang, Chunxiang Zhu, D. L. Kwong and W. D. Song and has published in prestigious journals such as Journal of Applied Physics, Applied Surface Science and IEEE Transactions on Electron Devices.

In The Last Decade

B.J. Cho

24 papers receiving 528 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
B.J. Cho Singapore	13	525	228	98	92	36	24	547
Nicolas Baboux France	13	347 0.7×	304 1.3×	81 0.8×	75 0.8×	82 2.3×	50	460
S. T. Chang Taiwan	10	445 0.8×	186 0.8×	79 0.8×	119 1.3×	18 0.5×	20	480
C. D’Emic United States	11	605 1.2×	197 0.9×	49 0.5×	115 1.3×	39 1.1×	15	630
A. Chou United States	11	657 1.3×	114 0.5×	71 0.7×	80 0.9×	24 0.7×	24	684
I.N. Osiyuk Ukraine	10	303 0.6×	163 0.7×	69 0.7×	101 1.1×	19 0.5×	28	318
T. Lauinger Germany	8	509 1.0×	238 1.0×	53 0.5×	137 1.5×	13 0.4×	11	530
P. Sana United States	7	309 0.6×	140 0.6×	50 0.5×	95 1.0×	14 0.4×	15	348
Hiroaki Arimura Belgium	15	620 1.2×	95 0.4×	95 1.0×	82 0.9×	20 0.6×	96	651
T. Çolakoğlu Türkiye	11	309 0.6×	251 1.1×	99 1.0×	132 1.4×	27 0.8×	22	390
Kathy Barla Belgium	13	485 0.9×	128 0.6×	107 1.1×	279 3.0×	23 0.6×	26	551

Countries citing papers authored by B.J. Cho

Since Specialization

Citations

This map shows the geographic impact of B.J. Cho's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by B.J. Cho with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites B.J. Cho more than expected).

Fields of papers citing papers by B.J. Cho

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by B.J. Cho. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by B.J. Cho. The network helps show where B.J. Cho may publish in the future.

Co-authorship network of co-authors of B.J. Cho

This figure shows the co-authorship network connecting the top 25 collaborators of B.J. Cho. A scholar is included among the top collaborators of B.J. Cho based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with B.J. Cho. B.J. Cho is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Lee, S.J., W.Y. Loh, Mingbin Yu, et al.. (2008). Dark-Current Suppression in Metal–Germanium–Metal Photodetectors Through Dopant-Segregation in NiGe—Schottky Barrier. IEEE Electron Device Letters. 29(2). 161–164. 21 indexed citations

Majhi, P., Guangyu Sun, H. R. Harris, et al.. (2007). High Performance pMOSFETs Using Si/Si<inf>1-x</inf>Ge<inf>x</inf>/Si Quantum Wells with High-k/Metal Gate Stacks and Additive Uniaxial Strain for 22 nm Technology Node. National University of Singapore. 727–730. 12 indexed citations

Loh, W.Y., Mingbin Yu, Jian Dong Ye, et al.. (2007). Integration of Tensile-Strained Ge p-i-n Photodetector on Advanced CMOS Platform. 60. 1–3. 7 indexed citations

Lu, Yonghai, et al.. (2006). Correlation between optical properties and Si nanocrystal formation of Si-rich Si oxide films prepared by plasma-enhanced chemical vapor deposition. Applied Surface Science. 253(5). 2718–2726. 8 indexed citations

Yeo, Chia Ching, B.J. Cho, Fei Gao, et al.. (2005). Electron mobility enhancement using ultrathin pure Ge on Si substrate. IEEE Electron Device Letters. 26(10). 761–763. 44 indexed citations

Park, Chang Seo & B.J. Cho. (2005). Dopant-free FUSI Pt/sub x/Si metal gate for high work function and reduced Fermi-level pinning. IEEE Electron Device Letters. 26(11). 796–798. 3 indexed citations

Cho, B.J., et al.. (2004). MOS Characteristics of Synthesized HfAlON–HfO<tex>$_2$</tex>Stack Using AlN–HfO<tex>$_2$</tex>. IEEE Electron Device Letters. 25(9). 619–621. 2 indexed citations

Yu, Decai, Ching-Ying Huang, Albert Chin, et al.. (2004). <tex>$hbox Al_2hbox O_3$</tex>–Ge-On-Insulator n- and p-MOSFETs With Fully NiSi and NiGe Dual Gates. IEEE Electron Device Letters. 25(3). 138–140. 43 indexed citations

Cho, B.J., et al.. (2004). MOS Characteristics of Substituted Al Gate on High-<tex>$kappa$</tex>Dielectric. IEEE Electron Device Letters. 25(11). 725–727. 1 indexed citations

10.

Lu, Yu, L.J. Tang, Yihong Wu, et al.. (2004). Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition. Journal of Applied Physics. 97(1). 99 indexed citations

11.

Joo, M. S., B.J. Cho, N. Balasubramanian, & Dim‐Lee Kwong. (2004). Thermal Instability of Effective Work Function in Metal/High-<tex>$kappa$</tex>Stack and Its Material Dependence. IEEE Electron Device Letters. 25(11). 716–718. 30 indexed citations

12.

Loh, Wei Yip, B.J. Cho, M. S. Joo, et al.. (2004). Charge Trapping and Breakdown Mechanism in HfAlO/TaN Gate Stack Analyzed Using Carrier Separation. IEEE Transactions on Device and Materials Reliability. 4(4). 696–703. 13 indexed citations

13.

Balasubramanian, M., et al.. (2004). Wet etching characteristics and surface morphology evaluation of MOCVD grown HfO2 film. Thin Solid Films. 462-463. 101–105. 8 indexed citations

14.

Chim, W. K., et al.. (2004). Over-Erase Phenomenon in SONOS-Type Flash Memory and its Minimization Using a Hafnium Oxide Charge Storage Layer. IEEE Transactions on Electron Devices. 51(7). 1143–1147. 108 indexed citations

15.

Huang, Ching-Ying, Albert Chin, Chunxiang Zhu, et al.. (2004). Very low defects and high performance Ge-on-insulator p-MOSFETs with Al/sub 2/O/sub 3/ gate dielectrics. 119–120. 22 indexed citations

16.

Ding, Shi‐Jin, Hang Hu, Chunxiang Zhu, et al.. (2004). Evidence and Understanding of ALD<tex>$hbox HfO_2hbox --hbox Al_2hbox O_3$</tex>Laminate MIM Capacitors Outperforming Sandwich Counterparts. IEEE Electron Device Letters. 25(10). 681–683. 33 indexed citations

17.

Cho, B.J., et al.. (2004). Thermally Stable Fully Silicided Hf-Silicide Metal-Gate Electrode. IEEE Electron Device Letters. 25(6). 372–374. 20 indexed citations

18.

Lu, Yongfeng, et al.. (2003). Silicon Nanostructured Films Formed by Pulsed-Laser Deposition in Inert Gas and Reactive Gas. MRS Proceedings. 762. 1 indexed citations

19.

Chin, Albert, et al.. (2003). Very high density RF MIM capacitors (17 fF/μm/sup 2/) using high-/spl kappa/ Al/sub 2/O₃ doped Ta/sub 2/O/sub 5/ dielectrics. IEEE Microwave and Wireless Components Letters. 13(10). 431–433. 34 indexed citations

20.

Cho, B.J., Eng Fong Chor, C. H. Ang, et al.. (2000). Does short wavelength lithography process degrade the integrity of thin gate oxide?. Microelectronics Reliability. 40(8-10). 1609–1613. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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