Alexander Efremov

2.4k total citations
163 papers, 2.0k citations indexed

About

Alexander Efremov is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry. According to data from OpenAlex, Alexander Efremov has authored 163 papers receiving a total of 2.0k indexed citations (citations by other indexed papers that have themselves been cited), including 144 papers in Electrical and Electronic Engineering, 99 papers in Mechanics of Materials and 46 papers in Materials Chemistry. Recurrent topics in Alexander Efremov's work include Plasma Diagnostics and Applications (134 papers), Metal and Thin Film Mechanics (92 papers) and Semiconductor materials and devices (67 papers). Alexander Efremov is often cited by papers focused on Plasma Diagnostics and Applications (134 papers), Metal and Thin Film Mechanics (92 papers) and Semiconductor materials and devices (67 papers). Alexander Efremov collaborates with scholars based in Russia, South Korea and United States. Alexander Efremov's co-authors include Kwang‐Ho Kwon, Chang-Il Kim, Giovanni Bruno, Geun Young Yeom, Dong‐Pyo Kim, Nam‐Ki Min, Bryan R. Wheaton, B. Clausen, Daewon Kim and Hyun‐Woo Lee and has published in prestigious journals such as Journal of The Electrochemical Society, Acta Materialia and Carbon.

In The Last Decade

Alexander Efremov

156 papers receiving 1.9k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Alexander Efremov Russia 23 1.5k 967 585 327 207 163 2.0k
C. Gómez‐Aleixandre Spain 15 529 0.4× 350 0.4× 1.0k 1.7× 82 0.3× 39 0.2× 57 1.3k
Vincent Rat France 21 382 0.3× 551 0.6× 677 1.2× 144 0.4× 185 0.9× 55 1.5k
Kungen Teii Japan 20 481 0.3× 503 0.5× 1.0k 1.7× 116 0.4× 18 0.1× 91 1.2k
S. Mukherjee India 22 394 0.3× 719 0.7× 796 1.4× 54 0.2× 33 0.2× 120 1.5k
J.L. Andújar Spain 23 644 0.4× 802 0.8× 1.3k 2.3× 32 0.1× 47 0.2× 89 1.6k
T. Belmonte France 17 337 0.2× 324 0.3× 455 0.8× 174 0.5× 50 0.2× 39 810
M. Gantois France 17 284 0.2× 579 0.6× 583 1.0× 97 0.3× 67 0.3× 48 1.0k
S E Babayan United States 17 2.1k 1.4× 200 0.2× 503 0.9× 2.1k 6.4× 20 0.1× 21 2.7k
Yukio Itô Japan 15 346 0.2× 207 0.2× 565 1.0× 61 0.2× 100 0.5× 93 954
Maxime Darnon France 18 951 0.6× 368 0.4× 234 0.4× 43 0.1× 29 0.1× 98 1.1k

Countries citing papers authored by Alexander Efremov

Since Specialization
Citations

This map shows the geographic impact of Alexander Efremov's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alexander Efremov with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alexander Efremov more than expected).

Fields of papers citing papers by Alexander Efremov

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alexander Efremov. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alexander Efremov. The network helps show where Alexander Efremov may publish in the future.

Co-authorship network of co-authors of Alexander Efremov

This figure shows the co-authorship network connecting the top 25 collaborators of Alexander Efremov. A scholar is included among the top collaborators of Alexander Efremov based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alexander Efremov. Alexander Efremov is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Miakonkikh, Andrey, et al.. (2025). On relationships between gas-phase and heterogeneous process kinetics in CF4 + H2 + Ar plasma. Vacuum. 234. 114044–114044. 1 indexed citations
3.
Miakonkikh, Andrey, et al.. (2025). PLASMA PARAMETERS AND FLUORINE ATOM DENSITY IN SF6 + Ar + He GAS MIXTURE: EFFECTS OF Ar/He MIXING RATIO, PRESSURE AND INPUT POWER. IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENIY KHIMIYA KHIMICHESKAYA TEKHNOLOGIYA. 68(3). 42–49. 1 indexed citations
4.
Efremov, Alexander, et al.. (2024). Gas Phase Composition and Kinetics of Fluorine Atoms in SF6 Plasma. Russian Microelectronics. 53(6). 582–591.
5.
Efremov, Alexander, В. Б. Бетелин, & Kwang‐Ho Kwon. (2024). Plasma Parameters and Etching Kinetics of Si/SiO2 in Mixtures of Fluorocarbon Gases with Argon and Helium. Russian Microelectronics. 53(6). 567–575.
6.
Efremov, Alexander, В. Б. Бетелин, & Kwang‐Ho Kwon. (2023). Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture. Russian Microelectronics. 52(2). 99–106. 1 indexed citations
7.
8.
Miakonkikh, Andrey, et al.. (2022). A comparison of CF4, CBrF3 and C2Br2F4 plasmas: Physical parameters and densities of atomic species. Vacuum. 200. 110991–110991. 6 indexed citations
9.
Efremov, Alexander & Kwang‐Ho Kwon. (2022). Parameters of Gaseous Phase and Kinetics of Reactive Ion Etching of SiO2 in CF4/C4F8/Ar/He Plasma. Russian Microelectronics. 51(6). 480–487. 3 indexed citations
10.
Efremov, Alexander, et al.. (2021). Comparative study of Cl2 + O2 and HBr + O2 plasma chemistries in respect to silicon reactive-ion etching process. Vacuum. 186. 110043–110043. 5 indexed citations
11.
Efremov, Alexander & Kwang‐Ho Kwon. (2021). Kinetics of Reactive Ion Etching of Si, SiO2, and Si3N4 in C4F8 + O2 + Ar Plasma: Effect of the C4F8/O2 Mixing Ratio. Russian Microelectronics. 50(2). 92–101. 2 indexed citations
12.
Efremov, Alexander, et al.. (2018). Peculiarities of Si and SiO2 Etching Kinetics in HBr + Cl2 + O2 Inductively Coupled Plasma. Plasma Chemistry and Plasma Processing. 39(1). 339–358. 19 indexed citations
13.
Efremov, Alexander, et al.. (2017). On the Control of Plasma Parameters and Active Species Kinetics in CF4 + O2 + Ar Gas Mixture by CF4/O2 and O2/Ar Mixing Ratios. Plasma Chemistry and Plasma Processing. 37(5). 1445–1462. 37 indexed citations
14.
Efremov, Alexander. (2016). Kinetics of neutral particles in HCl and HBr plasmas at low pressures and high electron concentrations. Russian Microelectronics. 45(4). 278–284. 1 indexed citations
15.
Efremov, Alexander, et al.. (2013). Degradation and modification of stainless-steel surface using Cl2/Ar inductively coupled plasma. Applied Surface Science. 279. 41–45. 1 indexed citations
16.
Efremov, Alexander, et al.. (2010). The parameters of hydrogen chloride and hydrogen bromide direct-current glow-discharge plasmas. High Energy Chemistry. 44(3). 249–253. 3 indexed citations
17.
Efremov, Alexander, et al.. (2010). Effect of Gas Mixing Ratio on Etch Behavior of Y2O3 Thin Films in Cl2/Ar and BCl3/Ar Inductively Coupled Plasmas. Japanese Journal of Applied Physics. 49(8S1). 08JB04–08JB04. 4 indexed citations
18.
Efremov, Alexander, Nam‐Ki Min, Sun Jin Yun, & Kwang‐Ho Kwon. (2008). Effect of gas mixing ratio on etch behavior of ZrO2 thin films in Cl2-based inductively coupled plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 26(6). 1480–1486. 3 indexed citations
19.
Efremov, Alexander, et al.. (2006). On the applicability of self-consistent global model for the characterization of Cl2/Ar inductively coupled plasma. Microelectronic Engineering. 84(1). 136–143. 46 indexed citations
20.
Efremov, Alexander, et al.. (1995). Plasma emission features in chlorine-argon mixtures. High Energy Chemistry. 29(5). 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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