Mark Gesley

573 total citations
42 papers, 452 citations indexed

About

Mark Gesley is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Mark Gesley has authored 42 papers receiving a total of 452 indexed citations (citations by other indexed papers that have themselves been cited), including 26 papers in Electrical and Electronic Engineering, 20 papers in Surfaces, Coatings and Films and 13 papers in Biomedical Engineering. Recurrent topics in Mark Gesley's work include Advancements in Photolithography Techniques (24 papers), Electron and X-Ray Spectroscopy Techniques (19 papers) and Integrated Circuits and Semiconductor Failure Analysis (10 papers). Mark Gesley is often cited by papers focused on Advancements in Photolithography Techniques (24 papers), Electron and X-Ray Spectroscopy Techniques (19 papers) and Integrated Circuits and Semiconductor Failure Analysis (10 papers). Mark Gesley collaborates with scholars based in United States, Hungary and Canada. Mark Gesley's co-authors include L. W. Swanson, P.R. Davis, G. A. Schwind, A. D. Wilson, R. Viswanathan, Juan R. Maldonado, P. Pianetta, Ming L. Yu, Scott A. Chambers and Mingzhu Yu and has published in prestigious journals such as Physical review. B, Condensed matter, Journal of Applied Physics and Applied Surface Science.

In The Last Decade

Mark Gesley

39 papers receiving 414 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Mark Gesley United States 9 170 157 156 146 127 42 452
K. Shirasawa Japan 14 300 1.8× 198 1.3× 108 0.7× 103 0.7× 180 1.4× 45 610
Victor Soltwisch Germany 14 249 1.5× 86 0.5× 127 0.8× 266 1.8× 111 0.9× 72 734
F. Eggenstein Germany 11 141 0.8× 79 0.5× 50 0.3× 40 0.3× 102 0.8× 22 394
Brian Borovsky United States 14 245 1.4× 126 0.8× 158 1.0× 27 0.2× 495 3.9× 19 641
Takashi Imazono Japan 13 86 0.5× 117 0.7× 108 0.7× 51 0.3× 74 0.6× 54 458
A. Mizobuchi Japan 14 160 0.9× 87 0.6× 80 0.5× 56 0.4× 228 1.8× 64 579
R. Noer United States 13 193 1.1× 134 0.9× 53 0.3× 227 1.6× 223 1.8× 35 520
J. Zhang United Kingdom 15 373 2.2× 248 1.6× 125 0.8× 163 1.1× 540 4.3× 35 789
J. L. Shaw United States 15 365 2.1× 251 1.6× 127 0.8× 26 0.2× 369 2.9× 67 649
D. Grigoriev Germany 12 166 1.0× 164 1.0× 101 0.6× 78 0.5× 252 2.0× 26 438

Countries citing papers authored by Mark Gesley

Since Specialization
Citations

This map shows the geographic impact of Mark Gesley's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mark Gesley with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mark Gesley more than expected).

Fields of papers citing papers by Mark Gesley

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mark Gesley. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mark Gesley. The network helps show where Mark Gesley may publish in the future.

Co-authorship network of co-authors of Mark Gesley

This figure shows the co-authorship network connecting the top 25 collaborators of Mark Gesley. A scholar is included among the top collaborators of Mark Gesley based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Mark Gesley. Mark Gesley is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Gesley, Mark, et al.. (2019). Spectral image microscopy for label-free blood and cancer cell identification. 472. 17–17. 1 indexed citations
2.
Gesley, Mark, et al.. (2018). A high throughput spectral image microscopy system. Review of Scientific Instruments. 89(1). 13705–13705. 3 indexed citations
3.
Yu, Mingzhu, et al.. (2004). Progress toward a raster multibeam lithography tool. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(2). 501–505. 18 indexed citations
4.
Maldonado, Juan R., et al.. (2003). A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5220. 46–46. 5 indexed citations
5.
Thomas, Timothy A., et al.. (2002). Prototype raster multibeam lithography tool. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(6). 2657–2661. 5 indexed citations
6.
Newman, Thomas H., et al.. (2002). Evaluation of OPC mask printing with a raster scan pattern generator. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 1320–1320. 4 indexed citations
7.
Baik, Ki‐Ho, et al.. (2002). Raster scan patterning solution for 100- and 70-nm OPC masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4754. 705–705. 3 indexed citations
8.
Newman, Thomas H., et al.. (2002). Raster Shaped Beam Pattern Generation for 70 nm Photomask Production. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 168–168. 3 indexed citations
9.
Gesley, Mark. (1998). Mask patterning challenges for device fabrication below 100 nm. Microelectronic Engineering. 41-42. 7–14. 1 indexed citations
10.
Gesley, Mark. (1998). Mask Patterning Challenges Beyond 150 nm. Japanese Journal of Applied Physics. 37(12S). 6675–6675. 1 indexed citations
11.
Gesley, Mark, et al.. (1997). Multipass gray printing for the new MEBES 4500S mask lithography system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3096. 116–116. 1 indexed citations
12.
Muray, A., et al.. (1995). Experimental evaluation of an electron-beam pulse modulated blanker (160 MHz) for next-generation electron-beam raster scan systems. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2488–2492. 3 indexed citations
13.
Gesley, Mark. (1993). An electron optical theory of beam blanking. Review of Scientific Instruments. 64(11). 3169–3190. 5 indexed citations
14.
Gesley, Mark, et al.. (1992). Electron beam lithography using MEBES IV. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2734–2742. 4 indexed citations
15.
Swanson, L. W., Nicholas A. Martin, Mark Gesley, et al.. (1991). 100 kV Schottky electron gun. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 9(6). 2925–2928. 8 indexed citations
16.
Gesley, Mark, et al.. (1988). Emission distribution, brightness, and mechanical stability of the LaB6 triode electron gun. Journal of Applied Physics. 64(7). 3380–3392. 6 indexed citations
17.
Gesley, Mark & L. W. Swanson. (1985). Nature of diffusion coefficients and their relation to field emission noise. Surface Science Letters. 159(2-3). A471–A471. 3 indexed citations
18.
Gesley, Mark & L. W. Swanson. (1984). A determination of the low work function planes of LaB6. Surface Science. 146(2-3). 583–599. 88 indexed citations
19.
Gesley, Mark & L. W. Swanson. (1984). ANALYSIS OF ENERGY BROADENING IN CHARGED PARTICLE BEAMS. Le Journal de Physique Colloques. 45(C9). C9–167. 2 indexed citations
20.
Swanson, L. W., Mark Gesley, & P.R. Davis. (1981). Crystallographic dependence of the work function and volatility of LaB6. Surface Science. 107(1). 263–289. 79 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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