Chemical Vapor Deposition

1.0k papers and 23.4k indexed citations i.

About

The 1.0k papers published in Chemical Vapor Deposition in the last decades have received a total of 23.4k indexed citations. Papers published in Chemical Vapor Deposition usually cover Electrical and Electronic Engineering (677 papers), Materials Chemistry (670 papers) and Electronic, Optical and Magnetic Materials (251 papers) specifically the topics of Semiconductor materials and devices (474 papers), Electronic and Structural Properties of Oxides (168 papers) and Copper Interconnects and Reliability (163 papers). The most active scholars publishing in Chemical Vapor Deposition are Riikka L. Puurunen, Mikko Ritala, Markku Leskelä, C. Gómez‐Aleixandre, Roberto Muñoz, Ivan P. Parkin, Karen K. Gleason, Anthony C. Jones, Manfred Bochmann and Klaus J. Hüttinger.

In The Last Decade

Fields of papers published in Chemical Vapor Deposition

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers published in Chemical Vapor Deposition. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Chemical Vapor Deposition.

Countries where authors publish in Chemical Vapor Deposition

Since Specialization
Citations

This map shows the geographic impact of research published in Chemical Vapor Deposition. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Chemical Vapor Deposition with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chemical Vapor Deposition more than expected).

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar’s output or impact.

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