Chemical Vapor Deposition

1.0k papers receiving 23.2k citations

Peers

Chemical Vapor Deposition
Comparison fields: 5 of 136
  • Materials Chemistry 15.6k
  • Electrical and Electronic Engineering 13.9k
  • Electronic, Optical and Magnetic Materials 4.2k
  • Biomedical Engineering 2.8k
  • Renewable Energy, Sustainability and the Environment 2.4k
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Chemical Vapor Deposition relative to Applied Physics Reviews China Applied Physics Reviews's profile →
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Citations per year

Countries where authors publish in Chemical Vapor Deposition

Since Specialization
Citations

This map shows the geographic impact of research published in Chemical Vapor Deposition. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Chemical Vapor Deposition with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chemical Vapor Deposition more than expected).

Fields of papers published in Chemical Vapor Deposition

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers published in Chemical Vapor Deposition. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Chemical Vapor Deposition.

About Chemical Vapor Deposition

The 1.0k papers published in Chemical Vapor Deposition in the last decades have received a total of 23.8k indexed citations . Papers published in Chemical Vapor Deposition usually cover Materials Chemistry (660 papers), Electronic, Optical and Magnetic Materials (247 papers) and Electrical and Electronic Engineering (668 papers) specifically the topics of Semiconductor materials and devices (468 papers), Electronic and Structural Properties of Oxides (167 papers) and Copper Interconnects and Reliability (161 papers). The most active scholars publishing in Chemical Vapor Deposition are Riikka L. Puurunen, Mikko Ritala, Markku Leskelä, C. Gómez‐Aleixandre, Roberto Muñoz, Ivan P. Parkin, Karen K. Gleason, Anthony C. Jones, Manfred Bochmann and Klaus J. Hüttinger.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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