William N. Partlo

579 total citations
46 papers, 437 citations indexed

About

William N. Partlo is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Computational Mechanics. According to data from OpenAlex, William N. Partlo has authored 46 papers receiving a total of 437 indexed citations (citations by other indexed papers that have themselves been cited), including 41 papers in Electrical and Electronic Engineering, 15 papers in Mechanics of Materials and 15 papers in Computational Mechanics. Recurrent topics in William N. Partlo's work include Advancements in Photolithography Techniques (20 papers), Laser Design and Applications (19 papers) and Laser-induced spectroscopy and plasma (14 papers). William N. Partlo is often cited by papers focused on Advancements in Photolithography Techniques (20 papers), Laser Design and Applications (19 papers) and Laser-induced spectroscopy and plasma (14 papers). William N. Partlo collaborates with scholars based in United States, Germany and Japan. William N. Partlo's co-authors include Igor V. Fomenkov, N. Böwering, M. Martins, Richard Ness, D.L. Birx, David C. Brandt, W.G. Oldham, Alex I. Ershov, G. Vaschenko and C. L. Rettig and has published in prestigious journals such as Journal of Applied Physics, Journal of Physics D Applied Physics and IEEE Transactions on Plasma Science.

In The Last Decade

William N. Partlo

43 papers receiving 347 citations

Peers

William N. Partlo

EEE

AMPO

NHEP

Guido Schriever Germany

Tamotsu Abe Japan

Vadim Dudnikov United States

Eric R. Colby United States

B. Henrist Switzerland

C. D. Macchietto United States

John Breuer Germany

Jason R. Grenier Canada

R. T. Jones United States

C. Haefner United States

Guido Schriever Germany

William N. Partlo

253 ×0.8

EEE

184 ×1.1

AMPO

117 ×0.9

53 ×0.6

78 ×1.1

NHEP

Citations per year, relative to William N. Partlo William N. Partlo (= 1×) peers Guido Schriever

Countries citing papers authored by William N. Partlo

Since Specialization

Citations

This map shows the geographic impact of William N. Partlo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by William N. Partlo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites William N. Partlo more than expected).

Fields of papers citing papers by William N. Partlo

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by William N. Partlo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by William N. Partlo. The network helps show where William N. Partlo may publish in the future.

Co-authorship network of co-authors of William N. Partlo

This figure shows the co-authorship network connecting the top 25 collaborators of William N. Partlo. A scholar is included among the top collaborators of William N. Partlo based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with William N. Partlo. William N. Partlo is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Fomenkov, Igor V., Alex I. Ershov, William N. Partlo, et al.. (2010). Laser-produced plasma light source for EUVL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 763639–763639. 12 indexed citations

Fomenkov, Igor V., David C. Brandt, Alex I. Ershov, et al.. (2009). Laser-produced plasma light source for EUVL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727138–727138. 11 indexed citations

Brown, Daniel J., Patrick O’Keeffe, Igor V. Fomenkov, et al.. (2007). XLR 500i: recirculating ring ArF light source for immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 652020–652020. 5 indexed citations

Brandt, David C., Igor V. Fomenkov, Alex I. Ershov, et al.. (2007). LPP EUV source development for HVM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 65170Q–65170Q. 28 indexed citations

Hansson, Björn, Igor V. Fomenkov, N. Böwering, et al.. (2006). LPP EUV source development for HVM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6151. 61510R–61510R. 19 indexed citations

Rettig, C. L., et al.. (2005). Protection of collector optics in an LPP based EUV source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5751. 910–910. 5 indexed citations

Fomenkov, Igor V., et al.. (2004). EUV discharge light source based on a dense plasma focus operated with positive and negative polarity. Journal of Physics D Applied Physics. 37(23). 3266–3276. 41 indexed citations

Partlo, William N., et al.. (2004). Verification of compaction and rarefaction models for fused silica with 40 billion pulses of 193-nm excimer laser exposure and their effects on projection lens imaging performance. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 1815–1815. 5 indexed citations

Böwering, N., M. Martins, William N. Partlo, & Igor V. Fomenkov. (2003). Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations. Journal of Applied Physics. 95(1). 16–23. 59 indexed citations

10.

Fomenkov, Igor V., et al.. (2002). Optimization of a dense plasma focus device as a light source for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 634–634. 12 indexed citations

11.

Ness, Richard & William N. Partlo. (2001). Solid-state pulsed power module (SSPPM) design for a dense plasma focus (DPF) device for semiconductor lithography applications. 4343?25. 1268–1271 vol.2. 3 indexed citations

12.

Partlo, William N., et al.. (2001). <title>Progress toward use of a dense plamsa focus as a light source for production EUV lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 232–248. 13 indexed citations

13.

Partlo, William N., et al.. (2000). <title>Development of an EUV (13.5 nm) light source employing a dense plasma focus in lithium vapor</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3997. 136–156. 23 indexed citations

14.

Partlo, William N., et al.. (1998). ArF lasers for production of semiconductor devices with CD<0.15 μm. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 1014–1014. 5 indexed citations

15.

Fomenkov, Igor V., et al.. (1996). <title>Design considerations and performance of 1-kHz KrF excimer lasers for DUV lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2726. 900–909. 2 indexed citations

16.

Partlo, William N., et al.. (1995). <title>Low cost of ownership KrF excimer laser using a novel pulse power and chamber configuration</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2440. 90–100. 23 indexed citations

17.

Partlo, William N., et al.. (1994). <title>Aerial image measurements on a commercial stepper</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2197. 585–595. 4 indexed citations

18.

Partlo, William N., et al.. (1993). Direct aerial image measurement as a method of testing high numerical aperture microlithographic lenses. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2686–2691. 8 indexed citations

19.

Yen, Anthony, et al.. (1993). 0.25μm lithography using a deep-UV stepper with annular illumination. Microelectronic Engineering. 21(1-4). 37–42. 1 indexed citations

20.

Partlo, William N.. (1992). Issues in Deep-Uv Lithography Using Pulsed Laser Light Sources. PhDT. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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