Wilfried Lerch

446 total citations
43 papers, 332 citations indexed

About

Wilfried Lerch is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry. According to data from OpenAlex, Wilfried Lerch has authored 43 papers receiving a total of 332 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 18 papers in Atomic and Molecular Physics, and Optics and 7 papers in Materials Chemistry. Recurrent topics in Wilfried Lerch's work include Silicon and Solar Cell Technologies (33 papers), Integrated Circuits and Semiconductor Failure Analysis (19 papers) and Semiconductor materials and interfaces (15 papers). Wilfried Lerch is often cited by papers focused on Silicon and Solar Cell Technologies (33 papers), Integrated Circuits and Semiconductor Failure Analysis (19 papers) and Semiconductor materials and interfaces (15 papers). Wilfried Lerch collaborates with scholars based in Germany, France and United States. Wilfried Lerch's co-authors include Daniel F. Downey, Jonas Schön, Frank Feldmann, Martin Hermle, W. Skorupa, T. Gebel, R.A. Yankov, F. Cristiano, S. McCoy and S. Marcus and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and AIChE Journal.

In The Last Decade

Wilfried Lerch

40 papers receiving 319 citations

Peers

Wilfried Lerch

EEE

AMPO

Pablo Acosta-Alba France

Nathan Stoddard United States

R. Monna France

S. Morris United States

Bartek Pawlak Belgium

R. G. Mazur United States

R. García-Hernansanz Spain

Daniel F. Downey United States

Z. Alexieva Bulgaria

Deepak A. Ramappa United States

Pablo Acosta-Alba France

Wilfried Lerch

177 ×0.6

EEE

61 ×0.5

AMPO

68 ×0.7

43 ×0.9

45 ×1.2

Citations per year, relative to Wilfried Lerch Wilfried Lerch (= 1×) peers Pablo Acosta-Alba

Countries citing papers authored by Wilfried Lerch

Since Specialization

Citations

This map shows the geographic impact of Wilfried Lerch's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Wilfried Lerch with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Wilfried Lerch more than expected).

Fields of papers citing papers by Wilfried Lerch

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Wilfried Lerch. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Wilfried Lerch. The network helps show where Wilfried Lerch may publish in the future.

Co-authorship network of co-authors of Wilfried Lerch

This figure shows the co-authorship network connecting the top 25 collaborators of Wilfried Lerch. A scholar is included among the top collaborators of Wilfried Lerch based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Wilfried Lerch. Wilfried Lerch is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Eisele, I., et al.. (2023). Aluminum Josephson Junction Formation on 200mm Wafers Using Different Oxidation Techniques. ECS Transactions. 111(1). 41–52.

Felch, Susan B., Wilfried Lerch, Larry L. Larson, et al.. (2020). MRS volume 45 issue 6 Cover and Front matter. MRS Bulletin. 45(6). f1–f6. 1 indexed citations

Lerch, Wilfried, et al.. (2016). (Invited) Low-Temperature Microwave-Based Plasma Oxidation of Ge and Oxidation of Silicon Followed by Plasma Nitridation. ECS Transactions. 72(4). 101–114. 2 indexed citations

Derakhshandeh, Jaber, Daniel W. Schmid, John Slabbekoorn, et al.. (2014). Reflow process optimization for micro-bumps applications in 3D technology. 1–5. 13 indexed citations

Koffel, S., P. Pichler, Jaap van den Berg, et al.. (2012). Precipitation of Antimony Implanted into Silicon. ECS Transactions. 41(34). 9–17.

Pichler, P., et al.. (2008). Modeling and Simulation of Advanced Annealing Processes. Materials science forum. 573-574. 279–293. 3 indexed citations

Bazizi, El Mehdi, E. Scheid, F. Cristiano, et al.. (2008). Detailed investigation of Ge–Si interdiffusion in the full range of Si1−xGex(≤x≤1) composition. Journal of Applied Physics. 104(11). 26 indexed citations

Zechner, Christoph, et al.. (2008). Simulation of dopant diffusion and activation during flash lamp annealing. Materials Science and Engineering B. 154-155. 20–23. 1 indexed citations

Stolwijk, Nicolaas, et al.. (2008). Fast Diffusion in Germanium and Silicon Investigated by Lamp-Based Rapid Thermal Annealing. Materials science forum. 573-574. 35–43. 6 indexed citations

10.

Pichler, P., et al.. (2007). On a computationally efficient approach to boron-interstitial clustering. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 469. 342–345. 1 indexed citations

11.

Pichler, P., C.J. Ortiz, B. Colombeau, et al.. (2006). Diffusion and activation of dopants in silicon and advanced silicon-based materials. HAL (Le Centre pour la Communication Scientifique Directe). 3 indexed citations

12.

McCoy, S., et al.. (2006). Flash Annealing Technology for USJ: Modeling and Metrology. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 103–110. 2 indexed citations

13.

Pichler, P., A. Burenkov, Wilfried Lerch, et al.. (2006). Process-Induced Diffusion Phenomena in Advanced CMOS Technologies. Defect and diffusion forum/Diffusion and defect data, solid state data. Part A, Defect and diffusion forum. 258-260. 510–521. 2 indexed citations

14.

Skorupa, W., et al.. (2005). Advanced Thermal Processing of Ultrashallow Implanted Junctions Using Flash Lamp Annealing. Journal of The Electrochemical Society. 152(6). G436–G436. 69 indexed citations

15.

Skorupa, W., D. Panknin, M. Voelskow, et al.. (2004). Advanced Thermal Processing of Semiconductor Materials by Flash Lamp Annealing. MRS Proceedings. 810. 7 indexed citations

16.

Lerch, Wilfried, et al.. (2004). Activation, Diffusion and Defect Analysis of a Spike Anneal Thermal Cycle. MRS Proceedings. 810. 10 indexed citations

17.

Bearda, Twan, et al.. (2001). Impact of Hydrogen on Oxygen Precipitation and Gate Oxide Integrity after RTA Processing. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 82-84. 127–132.

18.

Lerch, Wilfried, et al.. (1998). New methods of metrology data analysis during semiconductor processing and application to rapid thermal processing. Materials Science in Semiconductor Processing. 1(3-4). 195–200. 3 indexed citations

19.

Marcus, S., et al.. (1998). RTP requirements to yield uniform and repeatable ultra-shallow junctions with low energy boron and BF2 ion implants. Journal of Electronic Materials. 27(12). 1291–1295. 6 indexed citations

20.

Stolwijk, Nicolaas, H. Bracht, Wilfried Lerch, et al.. (1994). Defect Injection and Diffusion in Semiconductors. Materials science forum. 155-156. 475–492. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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