Walter R. Buchwald

79 papers receiving 1.8k citations

Peers

Walter R. Buchwald
Comparison fields: 5 of 57
  • Electrical and Electronic Engineering 1.3k
  • Atomic and Molecular Physics, and Optics 851
  • Biomedical Engineering 741
  • Electronic, Optical and Magnetic Materials 458
  • Surfaces, Coatings and Films 244
Replace T. V. Teperik with:
T. V. Teperik Russia
Shaimaa I. Azzam United States
A. K. Samusev Russia
Sang Soon Oh United Kingdom
Joel R. Wendt United States
V. A. Kotov Russia
Carl B. Poitras United States
Eyal Feigenbaum United States
Yongkang Gong China
J. R. Wendt United States
Walter R. Buchwald relative to T. V. Teperik Russia T. V. Teperik's profile →
Citations per field
00.5×2.6×
T. V. Teperik · 1×
Citations per year

Countries citing papers authored by Walter R. Buchwald

Since Specialization
Citations

This map shows the geographic impact of Walter R. Buchwald's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Walter R. Buchwald with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Walter R. Buchwald more than expected).

Fields of papers citing papers by Walter R. Buchwald

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Walter R. Buchwald. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Walter R. Buchwald. The network helps show where Walter R. Buchwald may publish in the future.

Co-authorship network of co-authors of Walter R. Buchwald

This figure shows the co-authorship network connecting the top 25 collaborators of Walter R. Buchwald. A scholar is included among the top collaborators of Walter R. Buchwald based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Walter R. Buchwald. Walter R. Buchwald is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
#WorkIndexed citations
1 0
2 14
3 1
4 17
5 203
6 79
7 24
8 3
9 6
10 123
11 22
12 4
13 100
14 2
15 7
16 46
17 41
18 7
19 22
20 27

About Walter R. Buchwald

Walter R. Buchwald is a scholar working on Surfaces, Coatings and Films, Atomic and Molecular Physics, and Optics and Electrical and Electronic Engineering, having authored 85 papers that have together received 1.9k indexed citations. Recurring topics across this work include Plasmonic and Surface Plasmon Research (27 papers), Semiconductor materials and devices (23 papers) and Photonic and Optical Devices (21 papers). The work is most often cited by research in Surfaces, Coatings and Films (244 citations), Atomic and Molecular Physics, and Optics (851 citations) and Electronic, Optical and Magnetic Materials (458 citations). Walter R. Buchwald has collaborated with scholars based in United States, Sweden and Germany. Frequent co-authors include Richard Soref, Robert E. Peale, Joshua R. Hendrickson, Junpeng Guo, Ivan Avrutsky, N. M. Johnson, Edward H. Poindexter, Jaeyoun Kim, F. C. Rong and D. J. Keeble. Their work appears in journals such as Physical review. B, Condensed matter, ACS Nano and Applied Physics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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