V. Sittinger
- Materials Chemistry top 5%
- ZnO doping and properties 27
- Copper-based nanomaterials and applications 10
- Diamond and Carbon-based Materials Research 5
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- Thin-Film Transistor Technologies 17
- Silicon and Solar Cell Technologies 11
- Semiconductor materials and devices 10
- Chalcogenide Semiconductor Thin Films 6
- Mechanics of Materials top 5%
- Metal and Thin Film Mechanics 16
- Co-authors
- Bernd SzyszkaWolfgang WernerFlorian RuskeAndreas PflugRuijiang HongXin JiangChristopher B. JacobsB. Rech
- Cited by
- Materials ChemistryElectrical and Electronic EngineeringElectronic, Optical and Magnetic Materials
- Journals
- Thin Solid Films (16 papers)Surface and Coatings Technology (8 papers)Plasma Processes and Polymers (2 papers)
- Partner nations
- GermanyUnited StatesBelgium
In The Last Decade
V. Sittinger
50 papers receiving 1.2k citations
Peers
Comparison fields: 5 of 43
- Materials Chemistry 965
- Electrical and Electronic Engineering 985
- Electronic, Optical and Magnetic Materials 165
- Mechanics of Materials 211
- Polymers and Plastics 93
Countries citing papers authored by V. Sittinger
This map shows the geographic impact of V. Sittinger's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by V. Sittinger with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites V. Sittinger more than expected).
Fields of papers citing papers by V. Sittinger
This network shows the impact of papers produced by V. Sittinger. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by V. Sittinger. The network helps show where V. Sittinger may publish in the future.
Co-authorship network
The 25 scholars most cited alongside V. Sittinger, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2023 | 8 | |
| 2 | 2023 | 53 | |
| 3 | 2023 | 14 | |
| 4 | 2023 | 9 | |
| 5 | 2022 | 14 | |
| 6 | 2021 | 1 | |
| 7 | 2019 | 1 | |
| 8 | 2018 | 1 | |
| 9 | 2014 | 1 | |
| 10 | 2014 | 5 | |
| 11 | 2013 | 42 | |
| 12 | 2012 | 62 | |
| 13 | 2010 | 1 | |
| 14 | 2007 | 5 | |
| 15 | 2005 | 10 | |
| 16 | 2005 | 13 | |
| 17 | 2004 | 57 | |
| 18 | New cost effective ZnO:Al films deposited by large area reactive magnetron sputtering | 2003 | 0 |
| 19 | 2003 | 36 | |
| 20 | 1999 | 12 |
About V. Sittinger
V. Sittinger is a scholar working on Materials Chemistry, Mechanics of Materials, Electrical and Electronic Engineering, Surfaces, Coatings and Films and Electronic, Optical and Magnetic Materials, having authored 53 papers that have together received 1.2k indexed citations. Recurring topics across this work include ZnO doping and properties (27 papers), Thin-Film Transistor Technologies (17 papers), Metal and Thin Film Mechanics (16 papers), Silicon and Solar Cell Technologies (11 papers), Copper-based nanomaterials and applications (10 papers), Semiconductor materials and devices (10 papers), Chalcogenide Semiconductor Thin Films (6 papers) and Diamond and Carbon-based Materials Research (5 papers). The work is most often cited by research in Materials Chemistry (965 citations), Electrical and Electronic Engineering (985 citations), Electronic, Optical and Magnetic Materials (165 citations), Mechanics of Materials (211 citations) and Polymers and Plastics (93 citations). V. Sittinger has collaborated with scholars based in Germany, United States and Belgium. Frequent co-authors include Bernd Szyszka, Wolfgang Werner, Florian Ruske, Andreas Pflug, Ruijiang Hong, Xin Jiang, Christopher B. Jacobs, B. Rech, D.J. Christie and Stephan Ulrich. Their work appears in journals such as Thin Solid Films, Surface and Coatings Technology, Plasma Processes and Polymers, Progress in Photovoltaics Research and Applications and Journal of Crystal Growth.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.