Chee Won Chung

1.4k total citations
129 papers, 1.0k citations indexed

About

Chee Won Chung is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Chee Won Chung has authored 129 papers receiving a total of 1.0k indexed citations (citations by other indexed papers that have themselves been cited), including 94 papers in Electrical and Electronic Engineering, 72 papers in Materials Chemistry and 46 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Chee Won Chung's work include Semiconductor materials and devices (46 papers), Copper Interconnects and Reliability (41 papers) and Metal and Thin Film Mechanics (35 papers). Chee Won Chung is often cited by papers focused on Semiconductor materials and devices (46 papers), Copper Interconnects and Reliability (41 papers) and Metal and Thin Film Mechanics (35 papers). Chee Won Chung collaborates with scholars based in South Korea, United States and United Kingdom. Chee Won Chung's co-authors include Wan In Lee, Chang Jung Kim, Hanna Cho, Ilsub Chung, Jeffrey W. Eischen, Young Soo Song, Su Min Hwang, Jang Woo Lee, Ji Hoon Kim and Sung Hee Jung and has published in prestigious journals such as Chemistry of Materials, Journal of The Electrochemical Society and Nano Energy.

In The Last Decade

Chee Won Chung

123 papers receiving 973 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Chee Won Chung South Korea 16 695 565 244 210 193 129 1.0k
Soner Özen Türkiye 18 543 0.8× 628 1.1× 162 0.7× 173 0.8× 99 0.5× 81 968
Jeung‐hyun Jeong South Korea 24 943 1.4× 945 1.7× 113 0.5× 183 0.9× 141 0.7× 62 1.2k
V. Sittinger Germany 20 985 1.4× 965 1.7× 165 0.7× 211 1.0× 87 0.5× 53 1.2k
Bocong Zheng China 17 755 1.1× 318 0.6× 215 0.9× 229 1.1× 97 0.5× 54 998
N. Yacoubi Tunisia 17 474 0.7× 394 0.7× 64 0.3× 260 1.2× 188 1.0× 98 860
T. Spila United States 16 821 1.2× 355 0.6× 206 0.8× 167 0.8× 87 0.5× 35 1.1k
Shin-Puu Jeng Taiwan 17 649 0.9× 418 0.7× 161 0.7× 73 0.3× 101 0.5× 58 1.0k
A. K. Kulkarni United States 13 597 0.9× 524 0.9× 196 0.8× 67 0.3× 210 1.1× 32 874
André Van Calster Belgium 18 684 1.0× 331 0.6× 156 0.6× 92 0.4× 215 1.1× 140 960
Gülnur Aygün Türkiye 19 882 1.3× 684 1.2× 133 0.5× 46 0.2× 139 0.7× 48 1.1k

Countries citing papers authored by Chee Won Chung

Since Specialization
Citations

This map shows the geographic impact of Chee Won Chung's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Chee Won Chung with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Chee Won Chung more than expected).

Fields of papers citing papers by Chee Won Chung

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Chee Won Chung. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Chee Won Chung. The network helps show where Chee Won Chung may publish in the future.

Co-authorship network of co-authors of Chee Won Chung

This figure shows the co-authorship network connecting the top 25 collaborators of Chee Won Chung. A scholar is included among the top collaborators of Chee Won Chung based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Chee Won Chung. Chee Won Chung is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Chung, Chee Won, et al.. (2024). Influence of an etch mask on the etch profile of copper thin films in propanol/Ar gas mixture. Materials Science in Semiconductor Processing. 185. 108880–108880.
2.
Chung, Chee Won, et al.. (2024). Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture. Microelectronic Engineering. 294. 112260–112260.
3.
Chung, Chee Won, et al.. (2024). Etch characteristics of cobalt thin films using high density plasma of halogen gas. Thin Solid Films. 796. 140341–140341. 2 indexed citations
4.
Park, Sung Yong, et al.. (2023). High-density plasma etching of cobalt thin films using C2H5OH/O2/Ar gas mixture. Materials Science and Engineering B. 293. 116494–116494. 3 indexed citations
5.
Kim, Seung‐Hyun, et al.. (2023). Two-Step Cyclic Etching of Copper Thin Films Using Acetylacetone/O2 Gases. ECS Journal of Solid State Science and Technology. 12(7). 74010–74010. 1 indexed citations
6.
Lee, Ji Soo, et al.. (2021). Etch Characteristics of Copper Thin Films in Inductively Coupled Plasma of Piperidine/Ethanol/Ar Gas Mixture. ECS Journal of Solid State Science and Technology. 10(5). 54006–54006. 1 indexed citations
7.
Chung, Chee Won, et al.. (2019). Evolution of etch profile of copper thin films in high density plasmas of alcohol-based gases. Vacuum. 167. 145–151. 12 indexed citations
8.
Chung, Chee Won, et al.. (2018). Dry etching of copper thin films in high density plasma of CH3COOH/Ar. Thin Solid Films. 672. 55–61. 19 indexed citations
9.
10.
Hwang, Su Min, et al.. (2014). Dry etching of Co 2 MnSi magnetic thin films using a CH 3 OH/Ar based inductively coupled plasma. Vacuum. 111. 19–24. 9 indexed citations
11.
Kim, Y., Sechang Oh, W. C. Lim, et al.. (2011). Integration of 28nm MJT for 8∼16Gb level MRAM with full investigation of thermal stability. Symposium on VLSI Technology. 210–211. 3 indexed citations
12.
Chung, Chee Won, et al.. (2011). Investigation on Etch Characteristics of Nanometer-Sized Magnetic Tunnel Junction Stacks Using a HBr/Ar Plasma. Journal of Nanoscience and Nanotechnology. 11(7). 6616–6620. 8 indexed citations
13.
Chung, Chee Won, et al.. (2009). Effect of Indium Zinc Oxide Transparent Electrode on Power Conversion Efficiency of Flexible Dye-Sensitized Solar Cells. Korean Journal of Chemical Engineering. 47(1). 105–110. 2 indexed citations
14.
Chung, Chee Won, et al.. (2008). Effect of Deposition Parameters on the Properties of TiN Thin Films Deposited by rf Magnetron Sputtering. Korean Journal of Chemical Engineering. 46(4). 676–680. 1 indexed citations
15.
Cho, Hanna, et al.. (2008). Inductively Coupled Plasma Etching of Indium Zinc Oxide Thin Films with HBr∕Ar Discharges. Journal of The Electrochemical Society. 155(11). D683–D683. 6 indexed citations
16.
Cho, Hanna, et al.. (2007). High Density Plasma Etching of Nickel Thin Films Using a Cl2/Ar Plasma. Journal of Industrial and Engineering Chemistry. 13(6). 939–943. 12 indexed citations
17.
Cho, Hanna, et al.. (2007). Inductively coupled plasma reactive ion etching of ZnO films in HBr/Ar plasma. Thin Solid Films. 516(11). 3521–3529. 15 indexed citations
18.
Lee, Jang Woo, et al.. (2005). Formation of Silicon Nanodot Arrays by Reactive Ion Etching Using Self-Assembled Tantalum Oxide Mask. Journal of Industrial and Engineering Chemistry. 11(4). 590–593. 3 indexed citations
19.
Lee, Jang Woo, et al.. (2005). High density plasma etching of amorphous CoZrNb films for thin film magnetic devices. Thin Solid Films. 496(2). 631–635. 11 indexed citations
20.
Song, Young Soo, et al.. (2004). Wet Etch Characteristics of NiFe and CoFe Magnetic Thin Films. Journal of Industrial and Engineering Chemistry. 10(2). 215–219. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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