T.‐M. Lu
Impact in
- Surfaces, Coatings and Films top 10%
- Electron and X-Ray Spectroscopy Techniques
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- Copper Interconnects and Reliability
Papers in ⓘ
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- Semiconductor materials and devices 10
- Integrated Circuits and Semiconductor Failure Analysis 3
- Silicon and Solar Cell Technologies 3
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- Ion-surface interactions and analysis 5
- Co-authors
- W. A. Lanford (4 shared papers)Joseph M. Pimbley (1 shared paper)Jay J. Senkevich (3 shared papers)A. S. Yapsir (3 shared papers)J. F. McDonald (4 shared papers)Guanghui Yang (3 shared papers)Christopher Jezewski (2 shared papers)Fu Tang (1 shared paper)
- Journals
- Applied Physics Letters (5 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (5 papers)Chemical Vapor Deposition (3 papers)Journal of Applied Physics (3 papers)Acta Physiologica (1 paper)
- Partner nations
- United StatesTaiwanChina
In The Last Decade
T.‐M. Lu
25 papers receiving 419 citations
Peers
Comparison fields: 5 of 78
- Surfaces, Coatings and Films 48
- Electronic, Optical and Magnetic Materials 84
- Electrical and Electronic Engineering 239
- Computational Mechanics 68
- Atomic and Molecular Physics, and Optics 90
Countries citing papers authored by T.‐M. Lu
This map shows the geographic impact of T.‐M. Lu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T.‐M. Lu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T.‐M. Lu more than expected).
Fields of papers citing papers by T.‐M. Lu
This network shows the impact of papers produced by T.‐M. Lu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T.‐M. Lu. The network helps show where T.‐M. Lu may publish in the future.
Co-authors
The 25 scholars most cited alongside T.‐M. Lu, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 27 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2003 | 61 | |
| 2 | 1988 | 50 | |
| 3 | 1991 | 36 | |
| 4 | 1991 | 34 | |
| 5 | 2005 | 33 | |
| 6 | 1984 | 32 | |
| 7 | 1987 | 25 | |
| 8 | 1988 | 21 | |
| 9 | 2013 | 20 | |
| 10 | 1993 | 19 | |
| 11 | 2004 | 19 | |
| 12 | 2002 | 16 | |
| 13 | 1999 | 12 | |
| 14 | 1988 | 11 | |
| 15 | 1996 | 9 | |
| 16 | 1990 | 7 | |
| 17 | 1992 | 6 | |
| 18 | 1996 | 4 | |
| 19 | 1992 | 4 | |
| 20 | 1993 | 3 |
About T.‐M. Lu
T.‐M. Lu is a scholar working on Electrical and Electronic Engineering, Computational Mechanics, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Mechanics of Materials, having authored 27 papers that have together received 431 indexed citations. Recurring topics across this work include Semiconductor materials and devices (10 papers), Ion-surface interactions and analysis (5 papers), Metal and Thin Film Mechanics (4 papers), Copper Interconnects and Reliability (4 papers), Electron and X-Ray Spectroscopy Techniques (3 papers), Integrated Circuits and Semiconductor Failure Analysis (3 papers), Semiconductor materials and interfaces (3 papers) and Silicon and Solar Cell Technologies (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (48 citations), Electronic, Optical and Magnetic Materials (84 citations), Electrical and Electronic Engineering (239 citations), Computational Mechanics (68 citations) and Atomic and Molecular Physics, and Optics (90 citations). T.‐M. Lu has collaborated with scholars based in United States, Taiwan and China. Frequent co-authors include W. A. Lanford, Joseph M. Pimbley, Jay J. Senkevich, A. S. Yapsir, J. F. McDonald, Guanghui Yang, Christopher Jezewski, Fu Tang, Jason T. Drotar and David J. Rogers. Their work appears in journals such as Applied Physics Letters, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Chemical Vapor Deposition, Journal of Applied Physics and Acta Physiologica.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.