Ting C. Huang
- Materials Chemistry
- Electrical and Electronic Engineering
- Mechanics of Materials top 10%
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Topics
- Metal and Thin Film Mechanics (5 papers)Advanced Surface Polishing Techniques (5 papers)X-ray Spectroscopy and Fluorescence Analysis (5 papers)
- Journals
- Applied Physics LettersJournal of Applied PhysicsJournal of materials research/Pratt's guide to venture capital sources
- Partner nations
- United StatesChinaUnited Kingdom
In The Last Decade
Ting C. Huang
22 papers receiving 490 citations
Peers
Comparison fields: 5 of 55
- Materials Chemistry 225
- Electrical and Electronic Engineering 159
- Mechanics of Materials 140
- Electronic, Optical and Magnetic Materials 114
- Atomic and Molecular Physics, and Optics 110
Countries citing papers authored by Ting C. Huang
This map shows the geographic impact of Ting C. Huang's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ting C. Huang with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ting C. Huang more than expected).
Fields of papers citing papers by Ting C. Huang
This network shows the impact of papers produced by Ting C. Huang. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ting C. Huang. The network helps show where Ting C. Huang may publish in the future.
Co-authorship network of co-authors of Ting C. Huang
This figure shows the co-authorship network connecting the top 25 collaborators of Ting C. Huang. A scholar is included among the top collaborators of Ting C. Huang based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ting C. Huang. Ting C. Huang is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 0 | |
| 2 | 0 | |
| 3 | 11 | |
| 4 | 1 | |
| 5 | GRAZING-INCIDENCE X-RAY TECHNIQUE FOR SURFACE, INTERFACE, AND THIN-FILM ANALYSIS | 3 |
| 6 | 199 | |
| 7 | 2 | |
| 8 | 18 | |
| 9 | 19 | |
| 10 | 33 | |
| 11 | 12 | |
| 12 | 8 | |
| 13 | 21 | |
| 14 | 74 | |
| 15 | 11 | |
| 16 | 9 | |
| 17 | 19 | |
| 18 | 18 | |
| 19 | 19 | |
| 20 | 8 |
About Ting C. Huang
Ting C. Huang is a scholar working on Surfaces, Coatings and Films, Radiation and General Materials Science, having authored 24 papers that have together received 527 indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (5 papers), Advanced Surface Polishing Techniques (5 papers) and X-ray Spectroscopy and Fluorescence Analysis (5 papers). The work is most often cited by research in Radiation (61 citations), Surfaces, Coatings and Films (48 citations) and Electronic, Optical and Magnetic Materials (114 citations). Ting C. Huang has collaborated with scholars based in United States, China and United Kingdom. Frequent co-authors include I. C. Noyan, Brian York, Michael F. Toney, S. Brennan, W. Parrish, W. K. Tice, G. Gorman, T. Suzuki, Federico Sequeda and Hoa Do. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Journal of materials research/Pratt's guide to venture capital sources.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.