Tamotsu Abe

704 total citations
62 papers, 524 citations indexed

About

Tamotsu Abe is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Mechanics of Materials. According to data from OpenAlex, Tamotsu Abe has authored 62 papers receiving a total of 524 indexed citations (citations by other indexed papers that have themselves been cited), including 51 papers in Electrical and Electronic Engineering, 37 papers in Atomic and Molecular Physics, and Optics and 28 papers in Mechanics of Materials. Recurrent topics in Tamotsu Abe's work include Laser Design and Applications (43 papers), Laser-induced spectroscopy and plasma (28 papers) and Laser-Matter Interactions and Applications (24 papers). Tamotsu Abe is often cited by papers focused on Laser Design and Applications (43 papers), Laser-induced spectroscopy and plasma (28 papers) and Laser-Matter Interactions and Applications (24 papers). Tamotsu Abe collaborates with scholars based in Japan, Germany and United States. Tamotsu Abe's co-authors include Hakaru Mizoguchi, Hiroaki Nakarai, Tsukasa Hori, Georg Soumagne, Akira Endo, Yukio Watanabe, Takashi Suganuma, Yutaka Shiraishi, Akira Sumitani and T. Kodama and has published in prestigious journals such as Information Sciences, Japanese Journal of Applied Physics and Robotics and Autonomous Systems.

In The Last Decade

Tamotsu Abe

54 papers receiving 372 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Tamotsu Abe Japan 14 312 261 261 132 128 62 524
Hiroaki Nakarai Japan 11 248 0.8× 166 0.6× 184 0.7× 94 0.7× 85 0.7× 52 379
William N. Partlo United States 13 314 1.0× 125 0.5× 164 0.6× 89 0.7× 73 0.6× 46 437
Guido Schriever Germany 12 253 0.8× 117 0.4× 184 0.7× 53 0.4× 78 0.6× 33 400
Vadim Dudnikov United States 14 568 1.8× 107 0.4× 190 0.7× 95 0.7× 262 2.0× 112 720
C. D. Macchietto United States 6 244 0.8× 97 0.4× 273 1.0× 39 0.3× 208 1.6× 9 483
Eric R. Colby United States 8 239 0.8× 36 0.1× 282 1.1× 58 0.4× 200 1.6× 22 464
Jason R. Grenier Canada 15 424 1.4× 54 0.2× 309 1.2× 204 1.5× 79 0.6× 36 630
B. Szapiro United States 10 215 0.7× 167 0.6× 175 0.7× 27 0.2× 87 0.7× 15 331
Yanqi Gao China 11 128 0.4× 49 0.2× 161 0.6× 77 0.6× 96 0.8× 45 297
F. Rühl Germany 12 277 0.9× 97 0.4× 154 0.6× 34 0.3× 142 1.1× 36 428

Countries citing papers authored by Tamotsu Abe

Since Specialization
Citations

This map shows the geographic impact of Tamotsu Abe's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tamotsu Abe with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tamotsu Abe more than expected).

Fields of papers citing papers by Tamotsu Abe

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Tamotsu Abe. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tamotsu Abe. The network helps show where Tamotsu Abe may publish in the future.

Co-authorship network of co-authors of Tamotsu Abe

This figure shows the co-authorship network connecting the top 25 collaborators of Tamotsu Abe. A scholar is included among the top collaborators of Tamotsu Abe based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Tamotsu Abe. Tamotsu Abe is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ueno, Yoshifumi, Hideyuki Hayashi, Takuya Ishii, et al.. (2024). Development progress of Gigaphoton’s LPP EUV light source for inspection systems. 62–62. 1 indexed citations
2.
Ueda, Atsushi, Yoshifumi Ueno, Hideyuki Hayashi, et al.. (2024). Development progress of Gigaphoton’s LPP EUV light source for inspection systems. 57–57.
3.
Ueno, Yoshifumi, Hideyuki Hayashi, Takuya Ishii, et al.. (2023). Development progress of key components for LPP-EUV light sources. 51–51. 2 indexed citations
4.
Nishimura, Yuichi, Yoshifumi Ueno, Hideyuki Hayashi, et al.. (2023). Development progress of Sn-LPP EUV light source for inspection systems. 56–56.
5.
Nishimura, Yuichi, Yoshifumi Ueno, Hideyuki Hayashi, et al.. (2022). Key technology development progress of the high power LPP-EUV light source. 68–68. 6 indexed citations
6.
Mizoguchi, Hakaru, Hiroaki Nakarai, Tamotsu Abe, et al.. (2020). Challenge of >300W high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM. 28–28. 8 indexed citations
7.
Mizoguchi, Hakaru, Hiroaki Nakarai, Tamotsu Abe, et al.. (2019). High-power LPP-EUV source with long collector mirror lifetime for semiconductor high-volume manufacturing. 39–39. 3 indexed citations
8.
Ueno, Yoshifumi, Tsukasa Hori, Georg Soumagne, et al.. (2019). Update of the development progress of the high power LPP-EUV light source using a magnetic field. 45–45. 1 indexed citations
9.
Ueda, Atsushi, Tsukasa Hori, Yutaka Shiraishi, et al.. (2019). Update of the development progress of the high power LPP-EUV light source using a magnetic field. 61–61. 1 indexed citations
10.
Mizoguchi, Hakaru, Hiroaki Nakarai, Tamotsu Abe, et al.. (2019). Challenge of high power LPP-EUV source with long collector mirror lifetime for semiconductor HVM. 3–3. 2 indexed citations
11.
Ueno, Yoshifumi, Tsukasa Hori, Yutaka Shiraishi, et al.. (2018). Key components development progress updates of the 250W high-power LPP-EUV light source. 178. 42–42. 2 indexed citations
12.
Nakarai, Hiroaki, Tamotsu Abe, Krzysztof M. Nowak, et al.. (2017). Development of 250W EUV light source for HVM lithography. 1–4.
13.
Mizoguchi, Hakaru, Hiroaki Nakarai, Tamotsu Abe, et al.. (2017). Development of 250W EUV light source for HVM lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10097. 1009702–1009702. 4 indexed citations
14.
Mizoguchi, Hakaru, Hiroaki Nakarai, Tamotsu Abe, et al.. (2017). Performance of 250W high-power HVM LPP-EUV source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431J–101431J. 10 indexed citations
15.
Mizoguchi, Hakaru, Hiroaki Nakarai, Tamotsu Abe, et al.. (2014). Sub-hundred Watt operation demonstration of HVM LPP-EUV source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90480D–90480D. 17 indexed citations
16.
Mizoguchi, Hakaru, Tamotsu Abe, Yukio Watanabe, et al.. (2011). 100W 1st generation laser-produced plasma light source system for HVM EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 796908–796908. 30 indexed citations
17.
Suganuma, Takashi, et al.. (2009). Evaluation at the intermediate focus for EUV light source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727133–727133. 1 indexed citations
18.
Soumagne, Georg, et al.. (2005). Magnetic field ion mitigation for EUV light sources. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5751. 859–859. 18 indexed citations
19.
Soumagne, Georg, et al.. (2004). Ion damage analysis on EUV collector mirrors. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 839–839. 13 indexed citations
20.
Abe, Tamotsu, Takashi Suganuma, Georg Soumagne, et al.. (2003). Laser-produced-plasma light source development for extreme ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(6). 2843–2847. 20 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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