Akira Sumitani

572 total citations
47 papers, 416 citations indexed

About

Akira Sumitani is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Akira Sumitani has authored 47 papers receiving a total of 416 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 18 papers in Mechanics of Materials and 18 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Akira Sumitani's work include Laser Design and Applications (32 papers), Laser-induced spectroscopy and plasma (16 papers) and Laser Material Processing Techniques (13 papers). Akira Sumitani is often cited by papers focused on Laser Design and Applications (32 papers), Laser-induced spectroscopy and plasma (16 papers) and Laser Material Processing Techniques (13 papers). Akira Sumitani collaborates with scholars based in Japan, Germany and Russia. Akira Sumitani's co-authors include Akira Endo, Georg Soumagne, Yoshifumi Ueno, Takeshi Higashiguchi, Hakaru Mizoguchi, Takashi Suganuma, Tamotsu Abe, Junichi Fujimoto, T. Ohta and Tsukasa Hori and has published in prestigious journals such as Applied Physics Letters, Optics Letters and Japanese Journal of Applied Physics.

In The Last Decade

Akira Sumitani

44 papers receiving 280 citations

Peers

Akira Sumitani
F.A. van Goor Netherlands
John Sheil Netherlands
Ruben Schupp Netherlands
Z. Q. Xie United States
Francesco Torretti Netherlands
M. Grisham United States
Randy A. Meijer Netherlands
Akira Sumitani
Citations per year, relative to Akira Sumitani Akira Sumitani (= 1×) peers Yoshifumi Ueno

Countries citing papers authored by Akira Sumitani

Since Specialization
Citations

This map shows the geographic impact of Akira Sumitani's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Akira Sumitani with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Akira Sumitani more than expected).

Fields of papers citing papers by Akira Sumitani

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Akira Sumitani. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Akira Sumitani. The network helps show where Akira Sumitani may publish in the future.

Co-authorship network of co-authors of Akira Sumitani

This figure shows the co-authorship network connecting the top 25 collaborators of Akira Sumitani. A scholar is included among the top collaborators of Akira Sumitani based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Akira Sumitani. Akira Sumitani is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Nowak, Krzysztof M., T. Ohta, Takashi Suganuma, et al.. (2014). Efficient multiline nanosecond pulse amplification in planar waveguide CO_2 amplifier for extreme UV laser-produced plasma source. Optics Letters. 39(7). 1953–1953. 1 indexed citations
2.
Mizoguchi, Hakaru, Tamotsu Abe, Yukio Watanabe, et al.. (2011). 100W 1st generation laser-produced plasma light source system for HVM EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 796908–796908. 30 indexed citations
3.
Nagano, Hitoshi, Georg Soumagne, Tsukasa Hori, et al.. (2011). Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 79692T–79692T. 18 indexed citations
4.
Nagano, Hitoshi, Tamotsu Abe, Masaki Nakano, et al.. (2010). Present status of laser-produced plasma EUV light source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76363C–76363C. 1 indexed citations
5.
Suganuma, Takashi, et al.. (2009). Evaluation at the intermediate focus for EUV light source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727133–727133. 1 indexed citations
6.
Endo, Akira, Takashi Suganuma, Krzysztof M. Nowak, et al.. (2008). CO 2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6921. 69210T–69210T. 4 indexed citations
7.
Nakano, Masaki, et al.. (2008). Sn droplet target development for laser produced plasma EUV light source. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6921. 692130–692130. 7 indexed citations
8.
Ueno, Yoshifumi, Georg Soumagne, Takashi Suganuma, et al.. (2008). Magnetic debris mitigation of a CO 2 laser-produced Sn plasma. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6921. 69212Z–69212Z. 8 indexed citations
9.
Ueno, Yoshifumi, Taisuke Miura, Masaki Nakano, et al.. (2007). Characterization of various Sn targets with respect to debris and fast ion generation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 65173B–65173B. 12 indexed citations
10.
Endo, Akira, Tamotsu Abe, Yoshifumi Ueno, et al.. (2007). CO 2 laser-produced Sn plasma as the solution for high-volume manufacturing EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6703. 670309–670309. 9 indexed citations
11.
Fujii, Kiyoshi, et al.. (2006). Sub-40nm pattern fabrication in 157nm interferometric immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6154. 61544H–61544H. 1 indexed citations
12.
Sumitani, Akira, et al.. (2006). Investigation of a Step-Like Output Energy Decrease Observed in an ArF Excimer Laser for Microlithography. Japanese Journal of Applied Physics. 45(10L). L1030–L1030. 1 indexed citations
13.
Fujii, Kiyoshi, et al.. (2005). Liquid immersion lithography at 157 nm. 75–75. 1 indexed citations
14.
Kakizaki, Kouji, Junichi Fujimoto, Taku Yamazaki, et al.. (2004). Development of high-power ArF/F 2 laser platform for VUV microlithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 1805–1805. 3 indexed citations
15.
Saitō, Takashi, et al.. (2004). Highly durable 4-kHz ArF excimer laser G42A for sub-90-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 1727–1727. 2 indexed citations
16.
Fujii, Kiyoshi, et al.. (2004). Evaluation of outgassing from a fluorinated resist for 157-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 226–226. 1 indexed citations
17.
Sumitani, Akira, et al.. (2003). Study of resist outgassing by F 2 laser irradiation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 524–524. 2 indexed citations
18.
Sumitani, Akira, et al.. (2002). In-situ measurements of VUV optical materials for F2 laser. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 1686–1686. 1 indexed citations
19.
Sumitani, Akira, et al.. (1997). Effects of Design Parameters on Root Stresses of Thin-Rimmed Helical Internal Gears with Asymmetric Web Arrangement in Mesh.. TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C. 63(613). 3223–3228. 1 indexed citations
20.
Matsuoka, Masakuni & Akira Sumitani. (1988). Rate of composition changes of organic solid solution crystals in sweating operations.. JOURNAL OF CHEMICAL ENGINEERING OF JAPAN. 21(1). 6–10. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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