Takeshi Kitajima

604 total citations
41 papers, 513 citations indexed

About

Takeshi Kitajima is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Takeshi Kitajima has authored 41 papers receiving a total of 513 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 10 papers in Mechanics of Materials and 10 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Takeshi Kitajima's work include Plasma Diagnostics and Applications (16 papers), Semiconductor materials and devices (12 papers) and Plasma Applications and Diagnostics (7 papers). Takeshi Kitajima is often cited by papers focused on Plasma Diagnostics and Applications (16 papers), Semiconductor materials and devices (12 papers) and Plasma Applications and Diagnostics (7 papers). Takeshi Kitajima collaborates with scholars based in Japan, United States and India. Takeshi Kitajima's co-authors include Toshiaki Makabe, Yukari H. Takeo, Toshiki Nakano, Nobuhiko Nakano, Bing Liu, Takeshi Ohmori, Shuichi Ueno, Masaru Izawa, Masakazu Iwasaka and Stephen R. Leone and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and The Journal of Physical Chemistry C.

In The Last Decade

Takeshi Kitajima

40 papers receiving 485 citations

Peers

Takeshi Kitajima
R. Hugon France
B. Felker United States
O. Leroy France
E. V. Barnat United States
Jacob Schmidt United States
C. Pomot France
R. Hugon France
Takeshi Kitajima
Citations per year, relative to Takeshi Kitajima Takeshi Kitajima (= 1×) peers R. Hugon

Countries citing papers authored by Takeshi Kitajima

Since Specialization
Citations

This map shows the geographic impact of Takeshi Kitajima's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Takeshi Kitajima with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Takeshi Kitajima more than expected).

Fields of papers citing papers by Takeshi Kitajima

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Takeshi Kitajima. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Takeshi Kitajima. The network helps show where Takeshi Kitajima may publish in the future.

Co-authorship network of co-authors of Takeshi Kitajima

This figure shows the co-authorship network connecting the top 25 collaborators of Takeshi Kitajima. A scholar is included among the top collaborators of Takeshi Kitajima based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Takeshi Kitajima. Takeshi Kitajima is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kitajima, Takeshi, et al.. (2020). Plasmonic nitriding of graphene on a graphite substrate via gold nanoparticles and NH3/Ar plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 38(6). 2 indexed citations
2.
Kitajima, Takeshi, et al.. (2020). Plasmonic nitridation of SiO2/Si(100) surface covered with gold nanoparticles via nitrogen plasma-produced radicals and light. Journal of Applied Physics. 127(24). 2 indexed citations
3.
Kitajima, Takeshi, et al.. (2018). Titanium coverage for plasma-induced uniform HfSiON film from Hf nanoscale islands on SiO2/Si. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 36(6). 4 indexed citations
4.
Kitajima, Takeshi, et al.. (2018). Nitrogen plasma-induced HfSiON film growth from Hf nanoscale islands on SiO2/Si. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 36(5). 5 indexed citations
6.
Kitajima, Takeshi, et al.. (2010). An optical, electrical and ultrasonic layered single sensor for ingredient measurement in liquid. Measurement Science and Technology. 21(3). 35204–35204. 5 indexed citations
7.
Kitajima, Takeshi, et al.. (2008). Nitrogen Atom Densities in Rare Gas Diluted N2 Plasmas with Capacitive and Inductive Coupling. IEEJ Transactions on Fundamentals and Materials. 128(10). 615–618. 1 indexed citations
8.
Kitajima, Takeshi, Toshiki Nakano, & Toshiaki Makabe. (2006). Increased O(D1) metastable density in highly Ar-diluted oxygen plasmas. Applied Physics Letters. 88(9). 46 indexed citations
9.
Ohmori, Takeshi, et al.. (2005). Time-Resolved Measurement of Charging on Hole Bottoms of SiO2 Wafer Exposed to Plasma Etching in a Pulsed Two-Frequency Capacitively Coupled Plasma. Japanese Journal of Applied Physics. 44(8L). L1105–L1105. 8 indexed citations
10.
Nishida, Kiwamu, Yoshio Fukao, Shingo Watada, et al.. (2005). Array observation of background atmospheric waves in the seismic band from 1 mHz to 0.5 Hz. Geophysical Journal International. 162(3). 824–840. 19 indexed citations
11.
Ohmori, Takeshi, et al.. (2003). Negative charge injection to a positively charged SiO2 hole exposed to plasma etching in a pulsed two-frequency capacitively coupled plasma in CF4/Ar. Applied Physics Letters. 83(22). 4637–4639. 35 indexed citations
12.
Liu, Bing, Cindy L. Berrie, Takeshi Kitajima, John Bright, & Stephen R. Leone. (2002). Atomic force microscopy study of the growth and annealing of Ge islands on Si(100). Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(2). 678–684. 4 indexed citations
13.
Liu, Bing, Cindy L. Berrie, Takeshi Kitajima, & Stephen R. Leone. (2002). Arsenic-induced Ge island morphology changes during molecular beam epitaxy of Ge on Si(001). Journal of Crystal Growth. 241(3). 271–276. 5 indexed citations
14.
Suzuki, Hiroshi, et al.. (1999). ULTRA-PRECISION GRINDING OF MICRO FRESNEL SHAPE. 59–64. 4 indexed citations
15.
Kitajima, Takeshi, Yukari H. Takeo, Nobuhiko Nakano, & Toshiaki Makabe. (1998). Effects of frequency on the two-dimensional structure of capacitively coupled plasma in Ar. Journal of Applied Physics. 84(11). 5928–5936. 57 indexed citations
16.
Kitajima, Takeshi, Masaru Izawa, Nobuhiko Nakano, & Toshiaki Makabe. (1997). The time-resolved two-dimensional profile of a radiofrequency capacitively coupled plasma. Journal of Physics D Applied Physics. 30(12). 1783–1789. 24 indexed citations
17.
Kitajima, Takeshi, et al.. (1995). Modeling and Measurement of Submicron Particles in RF Plasmas in Ar. Australian Journal of Physics. 48(3). 439–452. 3 indexed citations
18.
Ueno, Shuichi, Masakazu Iwasaka, & Takeshi Kitajima. (1994). Behavior of Dissolved Oxygen under Strong Magnetic Fields.. Journal of the Magnetics Society of Japan. 18(2). 683–686. 2 indexed citations
19.
Ueno, Shuichi, et al.. (1993). Dynamic behavior of gas flow in gradient magnetic fields. IEEE Transactions on Magnetics. 29(6). 3264–3266. 11 indexed citations
20.
Hirose, Takashi, et al.. (1990). Age difference of human nail components and morphology.. Journal of Society of Cosmetic Chemists of Japan. 24(2). 98–105. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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