T. Ohkubo
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- Plasma Applications and Diagnostics 20
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- Aerosol Filtration and Electrostatic Precipitation 23
- Integrated Circuits and Semiconductor Failure Analysis 13
- Electrohydrodynamics and Fluid Dynamics 12
- Materials Chemistry top 10%
- High voltage insulation and dielectric phenomena 10
- Surfaces, Coatings and Films top 10%
- Radiation top 10%
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- Near-Field Optical Microscopy 26
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- Adhesion, Friction, and Surface Interactions 17
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- Tribology and Lubrication Engineering 8
- Co-authors
- Y. NomotoSeiji KanazawaTakahiro ADACHIJ. KishigamiJ.S. ChangYoshitomo UwaminoT. NakamuraKeping Yan
- Cited by
- Radiology, Nuclear Medicine and ImagingElectrical and Electronic EngineeringMaterials Chemistry
In The Last Decade
T. Ohkubo
99 papers receiving 1.0k citations
Peers
Comparison fields: 5 of 82
- Radiology, Nuclear Medicine and Imaging 405
- Electrical and Electronic Engineering 631
- Materials Chemistry 403
- Surfaces, Coatings and Films 59
- Radiation 67
Countries citing papers authored by T. Ohkubo
This map shows the geographic impact of T. Ohkubo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Ohkubo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Ohkubo more than expected).
Fields of papers citing papers by T. Ohkubo
This network shows the impact of papers produced by T. Ohkubo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Ohkubo. The network helps show where T. Ohkubo may publish in the future.
Co-authorship network
The 25 scholars most cited alongside T. Ohkubo, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | Observation of liquid-gas phase dynamics from pre-breakdown to postdischarge in a single-shot underwater pulsed discharge | 2012 | 4 |
| 2 | 2008 | 13 | |
| 3 | 2003 | 23 | |
| 4 | Emissivity measurement of silicon semiconductor wafer near room temperature | 2003 | 2 |
| 5 | 2003 | 3 | |
| 6 | 2003 | 13 | |
| 7 | 2002 | 2 | |
| 8 | 2002 | 0 | |
| 9 | 2001 | 15 | |
| 10 | 2001 | 8 | |
| 11 | Decomposition of toluene by a dielectric barrier discharge reactor with a catalyst coating electrode | 2000 | 2 |
| 12 | 1999 | 4 | |
| 13 | Streamer Corona Characteristics of a Corona Radical Shower System During NOx Removal Operation | 1997 | 4 |
| 14 | 1997 | 34 | |
| 15 | 1996 | 3 | |
| 16 | Point Magnetic Recording Using a Force Microscope Tip on Co-Cr Perpendicular Media with Compositionally Separated Microstructures | 1995 | 3 |
| 17 | 1990 | 5 | |
| 18 | 1987 | 57 | |
| 19 | 1987 | 4 | |
| 20 | 1986 | 34 |
About T. Ohkubo
T. Ohkubo is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Radiology, Nuclear Medicine and Imaging, having authored 107 papers that have together received 1.1k indexed citations. Recurring topics across this work include Near-Field Optical Microscopy (26 papers), Aerosol Filtration and Electrostatic Precipitation (23 papers), Plasma Applications and Diagnostics (20 papers), Adhesion, Friction, and Surface Interactions (17 papers), Integrated Circuits and Semiconductor Failure Analysis (13 papers), Electrohydrodynamics and Fluid Dynamics (12 papers), High voltage insulation and dielectric phenomena (10 papers) and Tribology and Lubrication Engineering (8 papers). The work is most often cited by research in Radiology, Nuclear Medicine and Imaging (405 citations), Electrical and Electronic Engineering (631 citations) and Materials Chemistry (403 citations). T. Ohkubo has collaborated with scholars based in Japan, Canada and Poland. Frequent co-authors include Y. Nomoto, Seiji Kanazawa, Takahiro ADACHI, J. Kishigami, J.S. Chang, Yoshitomo Uwamino, T. Nakamura, Keping Yan, Jen-Shih Chang and R. Kaneko. Their work appears in journals such as Applied Physics Letters, Optics Letters and IEEE Transactions on Industry Applications.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.