Shinji Tarutani

687 total citations
50 papers, 573 citations indexed

About

Shinji Tarutani is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Shinji Tarutani has authored 50 papers receiving a total of 573 indexed citations (citations by other indexed papers that have themselves been cited), including 41 papers in Electrical and Electronic Engineering, 18 papers in Surfaces, Coatings and Films and 14 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Shinji Tarutani's work include Advancements in Photolithography Techniques (34 papers), Integrated Circuits and Semiconductor Failure Analysis (20 papers) and Electron and X-Ray Spectroscopy Techniques (13 papers). Shinji Tarutani is often cited by papers focused on Advancements in Photolithography Techniques (34 papers), Integrated Circuits and Semiconductor Failure Analysis (20 papers) and Electron and X-Ray Spectroscopy Techniques (13 papers). Shinji Tarutani collaborates with scholars based in Japan, Belgium and Germany. Shinji Tarutani's co-authors include Kazuko Takahashi, Takahiro Goto, Takayasu Nihira, Jean‐Pierre Launay, Charles W. Spangler, Anne‐Cécile Ribou, N. Inoue, Hidenori Takahashi, T. Takahashi and Kei Yamamoto and has published in prestigious journals such as Advanced Materials, Chemical Communications and Inorganic Chemistry.

In The Last Decade

Shinji Tarutani

49 papers receiving 520 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Shinji Tarutani Japan 13 456 207 135 97 93 50 573
Takanori Kudo United States 9 201 0.4× 93 0.4× 77 0.6× 21 0.2× 64 0.7× 57 314
Wataru Sotoyama Japan 12 464 1.0× 80 0.4× 20 0.1× 103 1.1× 299 3.2× 21 617
Pushkara R. Varanasi United States 10 185 0.4× 183 0.9× 15 0.1× 215 2.2× 161 1.7× 39 467
Johannes Ostermann Germany 18 411 0.9× 102 0.5× 122 0.9× 46 0.5× 235 2.5× 48 809
Dirk Pfeiffer United States 10 147 0.3× 70 0.3× 18 0.1× 94 1.0× 138 1.5× 27 396
Tobias Bocksrocker Germany 10 343 0.8× 180 0.9× 11 0.1× 77 0.8× 398 4.3× 15 591
K. Sarveswaran United States 11 227 0.5× 189 0.9× 39 0.3× 33 0.3× 42 0.5× 18 481
Doris Kang United States 7 206 0.5× 68 0.3× 32 0.2× 237 2.4× 155 1.7× 27 473
Horst Berneth Germany 11 145 0.3× 33 0.2× 27 0.2× 65 0.7× 74 0.8× 17 345
Peter K. B. Palomaki United States 12 261 0.6× 125 0.6× 16 0.1× 75 0.8× 363 3.9× 16 488

Countries citing papers authored by Shinji Tarutani

Since Specialization
Citations

This map shows the geographic impact of Shinji Tarutani's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Shinji Tarutani with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Shinji Tarutani more than expected).

Fields of papers citing papers by Shinji Tarutani

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Shinji Tarutani. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Shinji Tarutani. The network helps show where Shinji Tarutani may publish in the future.

Co-authorship network of co-authors of Shinji Tarutani

This figure shows the co-authorship network connecting the top 25 collaborators of Shinji Tarutani. A scholar is included among the top collaborators of Shinji Tarutani based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Shinji Tarutani. Shinji Tarutani is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Miyamoto, Yoshihiro, et al.. (2015). Advanced shrink material for NTD process with lower Y/X shrinkage bias of elongated patterns. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 942520–942520. 2 indexed citations
2.
Tarutani, Shinji, et al.. (2014). Novel EUV resist materials design for 14nm half pitch and below. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90481E–90481E. 6 indexed citations
3.
Tarutani, Shinji, et al.. (2013). Negative tone imaging process and materials for EUV lighography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8682. 868214–868214. 5 indexed citations
4.
Tarutani, Shinji, et al.. (2013). EUV Resist Materials Design for 15 nm Half Pitch and Below. Journal of Photopolymer Science and Technology. 26(5). 649–657. 18 indexed citations
5.
Tarutani, Shinji, et al.. (2013). LWR study on resist formulation parameters. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8682. 868217–868217. 3 indexed citations
6.
Tarutani, Shinji, et al.. (2012). EUV Resist Materials for 16 nm And below Half Pitch Applications. Journal of Photopolymer Science and Technology. 25(5). 597–602. 10 indexed citations
7.
Tarutani, Shinji, et al.. (2012). Functional Resist Materials for Negative Tone Development in Advanced Lithography. Journal of Photopolymer Science and Technology. 25(1). 109–114. 4 indexed citations
8.
Tarutani, Shinji, et al.. (2010). Process parameter influence to negative tone development process for double patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7639. 76391Q–76391Q. 7 indexed citations
9.
Tarutani, Shinji, et al.. (2010). Resist material for negative tone development process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7639. 763904–763904. 11 indexed citations
10.
Tarutani, Shinji, et al.. (2009). Materials and Processes of Negative Tone Development for Double Patterning Process. Journal of Photopolymer Science and Technology. 22(5). 635–640. 10 indexed citations
11.
Tarutani, Shinji, et al.. (2009). Development of materials and processes for negative tone development toward 32-nm node 193-nm immersion double-patterning process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72730C–72730C. 20 indexed citations
12.
Yamamoto, Kei, et al.. (2006). Materials and process parameters on ArF immersion defectivity study. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615308–615308. 10 indexed citations
13.
Tarutani, Shinji, et al.. (2003). Advanced RELACS Technology for ArF Resist. Journal of Photopolymer Science and Technology. 16(4). 507–510. 5 indexed citations
14.
Yamaura, J., R. Kato, Shinji Tarutani, & Kazuyuki Takahashi. (2003). High pressure X-ray study on CPDT-TCNQ anion radical salts. Synthetic Metals. 133-134. 411–413. 1 indexed citations
15.
Yasuda, Naoki, et al.. (2002). Below 100-nm Hole Pattern Formation Using Resolution Enhancement Lithography Assisted by Chemical Shrink (RELACS).. Journal of Photopolymer Science and Technology. 15(3). 377–378. 1 indexed citations
16.
Yamaura, Jun‐ichi, Reìzo Kato, Hiroyuki Tajima, Shinji Tarutani, & Kazuko Takahashi. (1999). Low temperature X-ray study of purely one-dimensional electronic system Me4X(CPDT-TCNQ)2(X=AS, N). Synthetic Metals. 103(1-3). 2212–2213. 4 indexed citations
17.
18.
Takahashi, Kazuko, Takayasu Nihira, Shinji Tarutani, & Kahei Takase. (1995). Synthesis and Properties of Thienyl and Oligothienyl Substituted Tropylium Ions. Heterocycles. 41(10). 2169–2169. 6 indexed citations
19.
20.
Takahashi, Kazuko & Shinji Tarutani. (1994). Novel electron acceptors for organic conductors: 1,2-bis(p-benzoquino)-3-[2-(dicyanomethylene)-2,5-thienoquino]cyclopropane derivatives. Journal of the Chemical Society Chemical Communications. 519–519. 14 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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