R. Lebert

1.0k total citations
83 papers, 749 citations indexed

About

R. Lebert is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Surfaces, Coatings and Films. According to data from OpenAlex, R. Lebert has authored 83 papers receiving a total of 749 indexed citations (citations by other indexed papers that have themselves been cited), including 58 papers in Electrical and Electronic Engineering, 34 papers in Atomic and Molecular Physics, and Optics and 27 papers in Surfaces, Coatings and Films. Recurrent topics in R. Lebert's work include Advancements in Photolithography Techniques (38 papers), Electron and X-Ray Spectroscopy Techniques (26 papers) and Atomic and Molecular Physics (22 papers). R. Lebert is often cited by papers focused on Advancements in Photolithography Techniques (38 papers), Electron and X-Ray Spectroscopy Techniques (26 papers) and Atomic and Molecular Physics (22 papers). R. Lebert collaborates with scholars based in Germany, Romania and Netherlands. R. Lebert's co-authors include W. Neff, K. Bergmann, Guido Schriever, Larissa Juschkin, A. Engel, Ahmer Naweed, G. Ulm, K. Gäbel, Frank Scholze and Reinhart Poprawe and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Physics D Applied Physics.

In The Last Decade

R. Lebert

75 papers receiving 696 citations

Peers

R. Lebert
W. Neff Germany
M. Pivi United States
C. M. Dozier United States
P. Krejcik United States
B. Cowan United States
K. Haupt Germany
W.J. Brown United States
W. Neff Germany
R. Lebert
Citations per year, relative to R. Lebert R. Lebert (= 1×) peers W. Neff

Countries citing papers authored by R. Lebert

Since Specialization
Citations

This map shows the geographic impact of R. Lebert's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Lebert with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Lebert more than expected).

Fields of papers citing papers by R. Lebert

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. Lebert. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Lebert. The network helps show where R. Lebert may publish in the future.

Co-authorship network of co-authors of R. Lebert

This figure shows the co-authorship network connecting the top 25 collaborators of R. Lebert. A scholar is included among the top collaborators of R. Lebert based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. Lebert. R. Lebert is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Mißalla, T., et al.. (2019). EUV pellicle qualification on transmission and reflectance. 10143. 21–21. 1 indexed citations
2.
Lebert, R., K. N. Koshelev, A Yu Vinokhodov, et al.. (2018). Debris-free high-brightness light source based on LPP for actinic EUV microscopy and metrology applications. 61–61. 4 indexed citations
3.
Juschkin, Larissa, Stefan Herbert, Anke Aretz, et al.. (2011). EUV Dark-Field Microscopy for Defect Inspection. AIP conference proceedings. 265–268. 7 indexed citations
4.
Lebert, R., et al.. (2005). High speed reflectometer for EUV mask-blanks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5835. 252–252. 1 indexed citations
5.
Lebert, R., et al.. (2004). Status of EUV-lamp development and demonstration of applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 943–943. 10 indexed citations
6.
Kleinschmidt, J., et al.. (2003). Extreme ultraviolet sources and measurement tools for EUV-lithography and system development. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5063. 256–256. 3 indexed citations
7.
Bergmann, K., et al.. (2000). Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency. Applied Optics. 39(22). 3833–3833. 31 indexed citations
8.
Bergmann, K., et al.. (1999). Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma. Applied Optics. 38(25). 5413–5413. 78 indexed citations
9.
Bergmann, K., et al.. (1998). A radial multichannel pseudospark switch for high voltage and high current applications. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 181–184. 2 indexed citations
10.
Lebert, R., Guido Schriever, Thomas Wilhein, & B. Niemann. (1998). Soft x-ray emission of laser-produced plasmas using a low-debris cryogenic nitrogen target. Journal of Applied Physics. 84(6). 3419–3421. 15 indexed citations
11.
Bergmann, K., et al.. (1998). Investigation of the electrode phenomena in a radial multichannel pseudospark switch. 296–296. 1 indexed citations
12.
Lebert, R., et al.. (1997). Compact plasma focus devices: Flexible laboratory sources for applications. 291–298. 2 indexed citations
13.
Bergmann, K., et al.. (1997). Triggering a radial multichannel pseudospark switch using electrons emitted from material with high dielectric constant. Applied Physics Letters. 71(14). 1936–1938. 23 indexed citations
14.
Lebert, R., et al.. (1996). Pinch Plasma Source for X-Ray Microscopy with Nanosecond Exposure Time. Journal of X-Ray Science and Technology. 6(2). 107–140. 3 indexed citations
15.
Neff, W., et al.. (1995). Atmospheric pressure gas discharges for surface treatment. Surface and Coatings Technology. 74-75. 394–398. 38 indexed citations
16.
Naweed, Ahmer, et al.. (1995). Requirements for simultaneous ignition of all channels in a high-current radial multichannel pseudospark switch. IEEE Transactions on Plasma Science. 23(3). 347–352. 15 indexed citations
17.
Lebert, R., et al.. (1989). Der Plasmafokus: Eine neue Röntgenquelle für die Röntgenmikroskopie und Röntgenlithographie. Physikalische Blätter. 45(8). 333–339. 2 indexed citations
18.
Lebert, R., et al.. (1989). Investigation Of Soft X-Ray Emission From The Plasma Focus. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1140. 279–279. 1 indexed citations
19.
Neff, W., Reinhard Noll, F. Rühl, et al.. (1989). Monochromatic x-ray emission of a fully ionized hydrogen plasma. Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 285(1-2). 253–257.
20.
Haas, C. R., G. Herziger, R. Lebert, & Reinhard Noll. (1983). Dynamics of microstructures. 87–90. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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