W. Neff

1.1k total citations
65 papers, 789 citations indexed

About

W. Neff is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Nuclear and High Energy Physics. According to data from OpenAlex, W. Neff has authored 65 papers receiving a total of 789 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 31 papers in Atomic and Molecular Physics, and Optics and 17 papers in Nuclear and High Energy Physics. Recurrent topics in W. Neff's work include Advancements in Photolithography Techniques (18 papers), Plasma Diagnostics and Applications (18 papers) and Atomic and Molecular Physics (17 papers). W. Neff is often cited by papers focused on Advancements in Photolithography Techniques (18 papers), Plasma Diagnostics and Applications (18 papers) and Atomic and Molecular Physics (17 papers). W. Neff collaborates with scholars based in Germany, Romania and Finland. W. Neff's co-authors include R. Lebert, K. Bergmann, M. Heise, Guido Schriever, Peter Muranyi, J. Wunderlich, H. Krompholz, G. Herziger, F. Rühl and A. Engel and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of Physics D Applied Physics.

In The Last Decade

W. Neff

62 papers receiving 739 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
W. Neff Germany 16 496 280 247 195 122 65 789
R. Lebert Germany 15 420 0.8× 342 1.2× 61 0.2× 201 1.0× 175 1.4× 83 749
A. Hershcovitch United States 15 426 0.9× 358 1.3× 56 0.2× 111 0.6× 209 1.7× 105 663
R. Ganter Switzerland 13 462 0.9× 207 0.7× 105 0.4× 90 0.5× 24 0.2× 56 631
G. J. H. Brussaard Netherlands 13 324 0.7× 191 0.7× 57 0.2× 88 0.5× 112 0.9× 33 464
S. P. Bugaev Russia 14 478 1.0× 515 1.8× 91 0.4× 73 0.4× 207 1.7× 63 817
Saeed Mirzanejhad Iran 13 226 0.5× 259 0.9× 111 0.4× 239 1.2× 138 1.1× 58 520
Jiaru Shi China 14 551 1.1× 474 1.7× 35 0.1× 115 0.6× 17 0.1× 116 826
L.L. Hatfield United States 19 821 1.7× 564 2.0× 159 0.6× 58 0.3× 69 0.6× 114 1.1k
A. Dunaevsky Israel 17 830 1.7× 524 1.9× 159 0.6× 85 0.4× 105 0.9× 42 1.1k
Vadim Dudnikov United States 14 568 1.1× 190 0.7× 19 0.1× 262 1.3× 107 0.9× 112 720

Countries citing papers authored by W. Neff

Since Specialization
Citations

This map shows the geographic impact of W. Neff's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. Neff with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. Neff more than expected).

Fields of papers citing papers by W. Neff

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W. Neff. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. Neff. The network helps show where W. Neff may publish in the future.

Co-authorship network of co-authors of W. Neff

This figure shows the co-authorship network connecting the top 25 collaborators of W. Neff. A scholar is included among the top collaborators of W. Neff based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with W. Neff. W. Neff is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lebert, R., et al.. (2004). Status of EUV-lamp development and demonstration of applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 943–943. 10 indexed citations
2.
Lebert, R., Larissa Juschkin, Holger Seitz, et al.. (2004). High-throughput EUV reflectometer for EUV mask blanks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 808–808. 5 indexed citations
3.
Neff, W., et al.. (2001). Pinch Plasma Radiation Sources for the Extreme Ultraviolet. Contributions to Plasma Physics. 41(6). 589–597. 3 indexed citations
4.
Bergmann, K., et al.. (2000). Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency. Applied Optics. 39(22). 3833–3833. 31 indexed citations
5.
Lepperhoff, Gerhard, et al.. (2000). Cold Start Emission Reduction by Barrier Discharge. SAE technical papers on CD-ROM/SAE technical paper series. 3 indexed citations
6.
Bergmann, K., et al.. (2000). Electrode phenomena and lifetime considerations in a radial multichannel pseudospark switch. IEEE Transactions on Plasma Science. 28(5). 1486–1490. 8 indexed citations
7.
Schriever, Guido, et al.. (2000). <title>Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3997. 162–168. 6 indexed citations
8.
Bergmann, K., et al.. (1999). Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma. Applied Optics. 38(25). 5413–5413. 78 indexed citations
9.
Bergmann, K., et al.. (1998). A radial multichannel pseudospark switch for high voltage and high current applications. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 181–184. 2 indexed citations
10.
Bergmann, K., et al.. (1998). Investigation of the electrode phenomena in a radial multichannel pseudospark switch. 296–296. 1 indexed citations
11.
Lebert, R., et al.. (1997). Compact plasma focus devices: Flexible laboratory sources for applications. 291–298. 2 indexed citations
12.
Bergmann, K., et al.. (1997). Triggering a radial multichannel pseudospark switch using electrons emitted from material with high dielectric constant. Applied Physics Letters. 71(14). 1936–1938. 23 indexed citations
13.
Lebert, R., et al.. (1996). Pinch Plasma Source for X-Ray Microscopy with Nanosecond Exposure Time. Journal of X-Ray Science and Technology. 6(2). 107–140. 3 indexed citations
14.
Neff, W., et al.. (1995). Atmospheric pressure gas discharges for surface treatment. Surface and Coatings Technology. 74-75. 394–398. 38 indexed citations
15.
Naweed, Ahmer, et al.. (1995). Requirements for simultaneous ignition of all channels in a high-current radial multichannel pseudospark switch. IEEE Transactions on Plasma Science. 23(3). 347–352. 15 indexed citations
16.
Lebert, R., et al.. (1989). Der Plasmafokus: Eine neue Röntgenquelle für die Röntgenmikroskopie und Röntgenlithographie. Physikalische Blätter. 45(8). 333–339. 2 indexed citations
17.
Lebert, R., et al.. (1989). Investigation Of Soft X-Ray Emission From The Plasma Focus. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1140. 279–279. 1 indexed citations
18.
Neff, W., Reinhard Noll, F. Rühl, et al.. (1989). Monochromatic x-ray emission of a fully ionized hydrogen plasma. Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 285(1-2). 253–257.
19.
Krompholz, H., et al.. (1980). Strong subnanosecond field variations in the dense plasma focus. Physics Letters A. 76(5-6). 388–390. 5 indexed citations
20.
Krompholz, H., et al.. (1980). Formation of the plasma layer in a plasma focus device. Physics Letters A. 77(4). 246–248. 39 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by R. Lebert Breakdown of academic impact, for papers by A. Hershcovitch Breakdown of academic impact, for papers by R. Ganter Breakdown of academic impact, for papers by G. J. H. Brussaard Breakdown of academic impact, for papers by S. P. Bugaev Breakdown of academic impact, for papers by Saeed Mirzanejhad Breakdown of academic impact, for papers by Jiaru Shi Breakdown of academic impact, for papers by L.L. Hatfield Breakdown of academic impact, for papers by A. Dunaevsky Breakdown of academic impact, for papers by Vadim Dudnikov
Rankless by CCL
2026