L. Holland
- Electrical and Electronic Engineering top 5%
- Materials Chemistry top 5%
- Mechanics of Materials top 1%
- Atomic and Molecular Physics, and Optics top 5%
- Computational Mechanics top 2%
- Co-authors
- S.M. OjhaL LaurensonHynek BiedermanGillian SiddallW SteckelmacherC.V. DeshpandeyP. D. TownsendMark Baker
- Topics
- Plasma Diagnostics and Applications (33 papers)Metal and Thin Film Mechanics (33 papers)Ion-surface interactions and analysis (18 papers)
- Journals
- NatureSHILAP Revista de lepidopterologíaJournal of Applied Physics
- Partner nations
- United KingdomGermanyUnited States
In The Last Decade
L. Holland
122 papers receiving 2.4k citations
Hit Papers
Peers
Comparison fields: 5 of 104
- Electrical and Electronic Engineering 1.3k
- Materials Chemistry 1.1k
- Mechanics of Materials 871
- Atomic and Molecular Physics, and Optics 505
- Computational Mechanics 503
Countries citing papers authored by L. Holland
This map shows the geographic impact of L. Holland's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by L. Holland with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites L. Holland more than expected).
Fields of papers citing papers by L. Holland
This network shows the impact of papers produced by L. Holland. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by L. Holland. The network helps show where L. Holland may publish in the future.
Co-authorship network of co-authors of L. Holland
This figure shows the co-authorship network connecting the top 25 collaborators of L. Holland. A scholar is included among the top collaborators of L. Holland based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with L. Holland. L. Holland is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 1 | |
| 2 | 3 | |
| 3 | 6 | |
| 4 | 1 | |
| 5 | 4 | |
| 6 | 0 | |
| 7 | 24 | |
| 8 | 0 | |
| 9 | 4 | |
| 10 | 71 | |
| 11 | 11 | |
| 12 | 37 | |
| 13 | 31 | |
| 14 | 21 | |
| 15 | Vacuum deposition of thin films | 164 |
| 16 | 5 | |
| 17 | 9 | |
| 18 | 16 | |
| 19 | 29 | |
| 20 | 8 |
About L. Holland
L. Holland is a scholar working on Surfaces, Coatings and Films, Mechanics of Materials and Statistics, Probability and Uncertainty, having authored 130 papers that have together received 2.7k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (33 papers), Metal and Thin Film Mechanics (33 papers) and Ion-surface interactions and analysis (18 papers). The work is most often cited by research in Surfaces, Coatings and Films (339 citations), Mechanics of Materials (871 citations) and Computational Mechanics (503 citations). L. Holland has collaborated with scholars based in United Kingdom, Germany and United States. Frequent co-authors include S.M. Ojha, L Laurenson, Hynek Biederman, Gillian Siddall, W Steckelmacher, C.V. Deshpandey, P. D. Townsend, Mark Baker, R.E. Hurley and Sameh A. Rizk. Their work appears in journals such as Nature, SHILAP Revista de lepidopterología and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.